公开(公告)号：US20180294200A1

公开(公告)日：2018-10-11

申请号：US15480337

申请日：2017-04-05

Applicant: APPLIED MATERIALS, INC.

Inventor： Leonard TEDESCHI ,  Benjamin SCHWARZ ,  Changhun LEE ,  Ping Han Hsieh ,  Adauto DIAZ ,  Daniel T. McCormick

IPC: H01L21/66

Abstract: Embodiments may also include a residual chemical reaction diagnostic device. The residual chemical reaction diagnostic device may include a substrate and a residual chemical reaction sensor formed on the substrate. In an embodiment, the residual chemical reaction sensor provides electrical outputs in response to the presence of residual chemical reactions. In an embodiment, the substrate is a device substrate, and the sensor is formed in a scribe line of the device substrate. In an alternative embodiment, the substrate is a process development substrate. In some embodiments, the residual chemical reaction sensor includes, a first probe pad, wherein a plurality of first arms extend out from the first probe pad, and a second probe pad, wherein a plurality of second arms extend out from the second probe pad and are interdigitated with the first arms.