公开(公告)号：US12275748B2

公开(公告)日：2025-04-15

申请号：US17917671

申请日：2021-03-31

Applicant: ADEKA CORPORATION

Inventor： Tomoharu Yoshino ,  Yoshiki Ooe ,  Keisuke Takeda ,  Ryota Fukushima ,  Chiaki Mitsui ,  Atsushi Yamashita

IPC: C07F15/06 ,  C01B33/027 ,  C07F5/00 ,  C07F7/02 ,  C07F7/22 ,  C07F13/00 ,  C07F15/04 ,  C23C16/18 ,  C23C16/40 ,  C23C16/455

Abstract: The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material: where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.

公开(公告)号：US12276022B2

公开(公告)日：2025-04-15

申请号：US18014371

申请日：2021-06-25

Applicant: ADEKA CORPORATION

Inventor： Atsushi Sakurai ,  Masako Hatase ,  Nana Okada ,  Ryota Fukushima

IPC: C23C16/455 ,  C23C16/18

Abstract: A method for producing a thin-film containing a metal atom or a semimetal atom on the surface of a substrate, comprising the steps of vaporizing a thin-film forming raw material comprising an alkoxide compound represented by the following general formula (1), introducing the vaporized compound into a treatment atmosphere, and subjecting the vaporized compound to decomposition and/or a chemical reaction, to thereby form the thin-film containing a metal atom or a semimetal atom on the surface of the substrate: where R1 to R6, M and n are defined herein.

公开(公告)号：US12104245B2

公开(公告)日：2024-10-01

申请号：US17771181

申请日：2020-10-19

Applicant: ADEKA CORPORATION

Inventor： Atsushi Sakurai ,  Masako Hatase ,  Masaki Enzu ,  Keisuke Takeda ,  Ryota Fukushima ,  Atsushi Yamashita

IPC: C23C16/18 ,  C07D487/10 ,  C07F1/00 ,  C07F3/00 ,  C07F7/22 ,  C07F13/00 ,  C07F15/04 ,  C07F15/06 ,  C23C16/455

CPC classification number: C23C16/18 ,  C07D487/10 ,  C07F1/005 ,  C07F3/003 ,  C07F7/2284 ,  C07F13/005 ,  C07F15/045 ,  C07F15/065 ,  C23C16/45553

Abstract: Provided is a thin-film forming raw material containing a compound represented by the following formula (1):




in the formula (1), R1 to R5 each independently represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a group containing a fluorine atom, M represents a metal atom, and “n” represents a valence of the metal atom represented by M, provided that at least one of R2, R3, and R4 represents the group containing a fluorine atom.