公开(公告)号：US08823936B2

公开(公告)日：2014-09-02

申请号：US13667363

申请日：2012-11-02

申请人： Yunqing Dai ,  Jian Wang ,  Zhibiao Mao

发明人： Yunqing Dai ,  Jian Wang ,  Zhibiao Mao

IPC分类号： G01B11/00 ,  G01B11/14 ,  G01B11/28 ,  G03F7/20

CPC分类号： G03F7/70625 ,  G03F7/70633

摘要： The invention provides a structure for critical dimension and overlay measurement including a measuring unit, a first measurement pattern for measuring overlay and a second measurement pattern for measuring linewidth, line density and/or line semi-density. The first target pattern includes an outer bar structure disposed on a first layer and an inner bar structure disposed on a second layer; the outer bar structure and/or the inner bar structure has a same shared pattern structure with the second target pattern. The pattern structure includes four bars with the same shape positioned orthogonally and closely to each other, and at least two orthogonally positioned bars include N equally spaced rectangular lines of the same width, wherein, N is an odd number; the N rectangular lines include one central rectangular line and N−1 auxiliary rectangular lines.

摘要翻译： 本发明提供了一种关键尺寸和重叠测量的结构，包括测量单元，用于测量覆盖层的第一测量图案和用于测量线宽，线密度和/或线半密度的第二测量图案。 第一目标图案包括设置在第一层上的外部杆结构和设置在第二层上的内部杆结构; 外杆结构和/或内杆结构具有与第二目标图案相同的共享图案结构。 图案结构包括具有彼此正交和紧密定位的相同形状的四个条，并且至少两个正交定位的条包括相同宽度的N个等间隔的矩形线，其中N是奇数; N条矩形线包括一个中心矩形线和N-1条辅助矩形线。

公开(公告)号：US20130120739A1

公开(公告)日：2013-05-16

申请号：US13667363

申请日：2012-11-02

申请人： Yunqing DAI ,  Jian WANG ,  Zhibiao MAO

发明人： Yunqing DAI ,  Jian WANG ,  Zhibiao MAO

IPC分类号： G01B11/02 ,  G01B15/00

CPC分类号： G03F7/70625 ,  G03F7/70633

摘要： The invention provides a structure for critical dimension and overlay measurement including a measuring unit, a first measurement pattern for measuring overlay and a second measurement pattern for measuring linewidth, line density and/or line semi-density. The first target pattern includes an outer bar structure disposed on a first layer and an inner bar structure disposed on a second layer; the outer bar structure and/or the inner bar structure has a same shared pattern structure with the second target pattern. The pattern structure includes four bars with the same shape positioned orthogonally and closely to each other, and at least two orthogonally positioned bars include N equally spaced rectangular lines of the same width, wherein, N is an odd number; the N rectangular lines include one central rectangular line and N−1 auxiliary rectangular lines.

摘要翻译： 本发明提供了一种关键尺寸和重叠测量的结构，包括测量单元，用于测量覆盖层的第一测量图案和用于测量线宽，线密度和/或线半密度的第二测量图案。 第一目标图案包括设置在第一层上的外部杆结构和设置在第二层上的内部杆结构; 外杆结构和/或内杆结构具有与第二目标图案相同的共享图案结构。 图案结构包括具有彼此正交和紧密定位的相同形状的四个条，并且至少两个正交定位的条包括相同宽度的N个等间隔的矩形线，其中N是奇数; N条矩形线包括一个中心矩形线和N-1条辅助矩形线。