Electropen lithography
    1.
    发明申请
    Electropen lithography 审中-公开
    电纺光刻

    公开(公告)号:US20060222869A1

    公开(公告)日:2006-10-05

    申请号:US11097917

    申请日:2005-04-04

    IPC分类号: B32B27/00 B32B9/04 C23C26/00

    摘要: The present invention relates to methods for producing a patterned surface having nanoscale features. The present invention more particularly relates to tip-induced nanoelectrochemical oxidation methods for nanoscale patterning. The invention also relates to the nanoscale patterns produced thereby.

    摘要翻译: 本发明涉及制备具有纳米尺度特征的图案化表面的方法。 本发明更具体地涉及用于纳米尺度图案化的尖端诱导纳米电化学氧化方法。 本发明还涉及由此产生的纳米尺度图案。