公开(公告)号：US20140106576A1

公开(公告)日：2014-04-17

申请号：US14113305

申请日：2012-04-09

申请人： Hiroshi Morita ,  Atsushi Kobayashi ,  Hiroo Yokota ,  Yasuhisa Furihata

发明人： Hiroshi Morita ,  Atsushi Kobayashi ,  Hiroo Yokota ,  Yasuhisa Furihata

IPC分类号： H01L21/02 ,  C09D1/00 ,  C01B21/087

CPC分类号： H01L21/02164 ,  C01B21/087 ,  C08G77/62 ,  C08L83/16 ,  C09D1/00 ,  H01L21/02282 ,  H01L31/02167 ,  Y02E10/50

摘要： Disclosed is an inorganic polysilazane that undergoes less shrinkage during a calcination step in an oxidizing agent such as water vapor and is less prone to allow a silica film to suffer from the formation of cracks or peel off from a semiconductor substrate, and a silica film-forming coating liquid containing the inorganic polysilazane, and also provides an inorganic polysilazane and a silica film-forming coating liquid containing the same. The value of A/(B+C) is 0.9-1.5 and the value of (A+B)/C is 4.2-50. A=peak area within the range of from 4.75 ppm to less than 5.4 ppm. B=peak area within the range of from 4.5 ppm to less than 4.75 ppm. Peak area within the range of from 4.2 ppm to less than 4.5 ppm is represented by C in a 1H-NMR spectrum; and the polystyrene-equivalent mass average molecular weight is 2000 to 20000.

摘要翻译： 公开了一种无机聚硅氮烷，其在诸如水蒸气的氧化剂中在煅烧步骤中经历较少的收缩，并且不容易使二氧化硅膜发生裂纹或从半导体衬底剥离而形成二氧化硅膜 - 形成含有无机聚硅氮烷的涂布液，并且还提供无机聚硅氮烷和含有该聚硅氮烷的二氧化硅成膜涂布液。 A /（B + C）的值为0.9-1.5，（A + B）/ C的值为4.2〜50。 A = 4.75ppm至小于5.4ppm范围内的峰面积。 B = 4.5ppm至小于4.75ppm范围内的峰面积。 在4.2ppm至小于4.5ppm的范围内的峰面积在1H-NMR光谱中由C表示; 聚苯乙烯当量的质均分子量为2000〜20000。