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公开(公告)号：US08603617B2
公开(公告)日：2013-12-10
申请号：US12994952
申请日：2009-05-05
申请人： Veit Schier , Wolfgang Engelhart
发明人： Veit Schier , Wolfgang Engelhart
IPC分类号： B32B9/00
CPC分类号： C23C14/08 , C23C14/081 , C23C14/083 , C23C30/005 , Y10T407/27 , Y10T428/24975 , Y10T428/265
摘要： The invention concerns a cutting tool comprising a base body and a multi-layer coating applied thereto, which, possibly besides further layers, includes a plurality of main layers A and intermediate layers B applied alternately directly one upon the other, wherein the main layers A and the intermediate layers B are respectively metal oxide layers produced by the PVD process, the thickness of the main layers A is in the range of 4 nm to 1 μm, and the thickness of the intermediate layers B is in the range of 2 nm to 50 nm, wherein the ratio of the thicknesses of the intermediate layers B to the thicknesses of the main layers A is in the range of 1:2 to 1:100.
摘要翻译： 本发明涉及一种包括基体和施加到其上的多层涂层的切削工具，其可能除了另外的层之外还包括多个相互直接交替施加的主层A和中间层B，其中主层A 中间层B分别是通过PVD工艺制造的金属氧化物层，主层A的厚度在4nm〜1μm的范围内，中间层B的厚度在2nm〜 50nm，其中中间层B的厚度与主层A的厚度的比率在1:2至1:100的范围内。
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公开(公告)号：US20110182681A1
公开(公告)日：2011-07-28
申请号：US12994952
申请日：2009-05-05
申请人： Veit Schier , Wolfgang Engelhart
发明人： Veit Schier , Wolfgang Engelhart
IPC分类号： B23B27/14
CPC分类号： C23C14/08 , C23C14/081 , C23C14/083 , C23C30/005 , Y10T407/27 , Y10T428/24975 , Y10T428/265
摘要： The invention concerns a cutting tool comprising a base body and a multi-layer coating applied thereto, which, possibly besides further layers, includes a plurality of main layers A and intermediate layers B applied alternately directly one upon the other, wherein the main layers A and the intermediate layers B are respectively metal oxide layers produced by the PVD process, the thickness of the main layers A is in the range of 4 nm to 1 μm, and the thickness of the intermediate layers B is in the range of 2 nm to 50 nm, wherein the ratio of the thicknesses of the intermediate layers B to the thicknesses of the main layers A is in the range of 1:2 to 1:100.
摘要翻译： 本发明涉及一种包括基体和施加到其上的多层涂层的切削工具，其可能除了另外的层之外还包括多个相互直接交替施加的主层A和中间层B，其中主层A 中间层B分别是通过PVD法制造的金属氧化物层，主层A的厚度在4nm〜1μm的范围内，中间层B的厚度在2nm〜 50nm，其中中间层B的厚度与主层A的厚度的比率在1:2至1:100的范围内。
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公开(公告)号：US20140193637A1
公开(公告)日：2014-07-10
申请号：US14238352
申请日：2012-09-05
申请人： Veit Schier , Wolfgang Engelhart
发明人： Veit Schier , Wolfgang Engelhart
CPC分类号： C23C30/00 , C23C14/06 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/32 , C23C14/325 , C23C14/35 , C23C14/354 , C23C28/04 , C23C28/044 , C23C30/005 , Y10T428/265
摘要： Cutting tool has a substrate and a multilayer coating deposited by PVD. The coating comprises a base layer of one or more identical or different layers of a nitride or carbonitride which contains at least aluminium (Al) and a chromium-containing, oxidic functional layer. Attachment of the chromium-containing functional layer is improved by an intermediate layer of one or more oxides or oxide nitrates of the metals Al, Cr, Si, and/or Zr provided between the base layer and the functional layer. The intermediate layer has a cubic structure and the chromium-containing functional layer is selected from chromium oxide (Cr2O3), chromium oxynitride, aluminium-chromium oxide (AlCr)2O3, aluminium-chromium oxynitride or a mixed oxide or mixed oxynitride of aluminium, chromium and further metals of (AlCrMe1, Men)2 oxide or (AlCrMe1, Men)2 oxynitride, where Me . . . Men means one or more further metals, selected from Hf, Y, Zr and Ru, and wherein the functional layer has a rhombohedral structure.
摘要翻译： 切割工具具有通过PVD沉积的基底和多层涂层。 该涂层包含至少包含铝（Al）和含铬氧化功能层的氮化物或碳氮化物的一个或多个相同或不同层的基层。 通过设置在基层和功能层之间的金属Al，Cr，Si和/或Zr的一种或多种氧化物或氧化物硝酸盐的中间层来改善含铬功能层的附着。 中间层具有立方结构，含铬功能层选自氧化铬（Cr 2 O 3），氮氧化铬，铝 - 氧化铬（AlCr）2 O 3，铝 - 氮氧化铬或铝，铬的混合氧化物或混合氮氧化物 和（AlCrMe1，Men）2氧化物或（AlCrMe1，Men）2氮氧化物的其他金属，其中Me。 。 。 男士是指选自Hf，Y，Zr和Ru中的一种或多种其它金属，其中功能层具有菱形结构。
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公开(公告)号：US20110311805A1
公开(公告)日：2011-12-22
申请号：US13201028
申请日：2010-03-18
申请人： Veit Schier , Oliver Eibl , Wolfgang Engelhart
发明人： Veit Schier , Oliver Eibl , Wolfgang Engelhart
IPC分类号： B32B15/04 , B32B33/00 , C23C14/34 , C23C14/24 , C23C14/35 , C23C14/46 , C09D1/00 , B32B5/16 , C01B13/00 , C01F7/02 , C01G37/02 , C01B33/113 , C01F17/00 , C01G53/04 , C01G35/00 , C01G25/02 , C01G41/02 , C01G39/02 , C01G27/02 , C01G31/02 , B32B9/00 , B82Y30/00
CPC分类号： C23C14/08 , B23B27/14 , B23B2228/08 , B23B2228/105 , C23C14/081 , C23C14/083 , C23C16/40 , C23C30/005 , Y10T428/257 , Y10T428/265
摘要： The invention relates to a cutting tool having a substrate base body and a single or multi-layered coating attached thereupon, wherein at least one layer of the coating is a metal oxide layer produced in the PVD process or in the CVD process and the metal oxide layer has a grain structure wherein there is structural disorder within a plurality of the existing grains that are characterized in that in electron diffraction images of the grains, point-shaped reflections occur up to a maximum lattice spacing dGRENZ and for lattice spacing greater than dGRENZ no point-shaped reflections occur, but rather a diffuse intensity distribution typical for amorphous structures.
摘要翻译： 本发明涉及一种切割工具，其具有基底基体和附着在其上的单层或多层涂层，其中涂层的至少一层是在PVD工艺或CVD工艺中生产的金属氧化物层，金属氧化物 层具有晶粒结构，其中在多个现有晶粒内存在结构紊乱，其特征在于在晶粒的电子衍射图像中，点形反射发生到最大晶格间距dGRENZ，并且对于大于dGRENZ的晶格间距 发生点状反射，而是非晶体结构的典型散射强度分布。
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公开(公告)号：US08980446B2
公开(公告)日：2015-03-17
申请号：US13642976
申请日：2011-05-03
申请人： Wolfgang Engelhart , Veit Schier
发明人： Wolfgang Engelhart , Veit Schier
IPC分类号： C23C14/00 , C23C14/32 , C23C14/08 , C23C14/22 , C23C14/35 , C23C28/04 , C23C30/00 , B32B15/01
CPC分类号： C23C14/325 , B32B15/01 , B32B15/012 , B32B15/013 , C23C14/08 , C23C14/22 , C23C14/35 , C23C14/352 , C23C28/042 , C23C28/044 , C23C30/005 , Y10T428/12493 , Y10T428/12972
摘要： The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.
摘要翻译： 本发明涉及通过PVD方法在衬底上沉积具有至少两种不同金属的混晶层的方法。 为了提供一种通过PVD方法在衬底上沉积具有至少两种不同金属的混晶层的方法，其产生尽可能自由的大颗粒（液滴）并且具有尽可能高的比例的混合晶体层 所需的结晶相是高度结晶的，根据本发明提出，混合晶体层的沉积是通过同时施加i）双磁控溅射或大功率脉冲磁控溅射的阴极溅射法和ii）弧 气相沉积。
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公开(公告)号：US20130209834A1
公开(公告)日：2013-08-15
申请号：US13642976
申请日：2011-05-03
申请人： Wolfgang Engelhart , Veit Schier
发明人： Wolfgang Engelhart , Veit Schier
CPC分类号： C23C14/325 , B32B15/01 , B32B15/012 , B32B15/013 , C23C14/08 , C23C14/22 , C23C14/35 , C23C14/352 , C23C28/042 , C23C28/044 , C23C30/005 , Y10T428/12493 , Y10T428/12972
摘要： The present invention concerns a method for depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods. To provide a method of depositing mixed crystal layers with at least two different metals on a substrate by means of PVD methods, which gives mixed crystal layers which are as free as possible of macroparticles (droplets) and which have a proportion as high as possible of a desired crystalline phase and which are highly crystalline, it is proposed according to the invention that deposition of the mixed crystal layer is effected with simultaneous application of i) the cathode sputtering method of dual magnetron sputtering or high power impulse magnetron sputtering and ii) arc vapour deposition.
摘要翻译： 本发明涉及通过PVD方法在衬底上沉积具有至少两种不同金属的混晶层的方法。 为了提供一种通过PVD方法在衬底上沉积具有至少两种不同金属的混晶层的方法，其产生尽可能自由的大颗粒（液滴）并且具有尽可能高的比例的混合晶体层 所需的结晶相是高度结晶的，根据本发明提出，混合晶体层的沉积是通过同时施加i）双磁控溅射或大功率脉冲磁控溅射的阴极溅射法和ii）弧 气相沉积。
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公开(公告)号：US09249515B2
公开(公告)日：2016-02-02
申请号：US14238352
申请日：2012-09-05
申请人： Veit Schier , Wolfgang Engelhart
发明人： Veit Schier , Wolfgang Engelhart
CPC分类号： C23C30/00 , C23C14/06 , C23C14/0641 , C23C14/08 , C23C14/081 , C23C14/32 , C23C14/325 , C23C14/35 , C23C14/354 , C23C28/04 , C23C28/044 , C23C30/005 , Y10T428/265
摘要： Cutting tool has a substrate and a multilayer coating deposited by PVD. The coating comprises a base layer of one or more identical or different layers of a nitride or carbonitride which contains at least aluminium (Al) and a chromium-containing, oxidic functional layer. Attachment of the chromium-containing functional layer is improved by an intermediate layer of one or more oxides or oxide nitrates of the metals Al, Cr, Si, and/or Zr provided between the base layer and the functional layer. The intermediate layer has a cubic structure and the chromium-containing functional layer is selected from chromium oxide (Cr2O3), chromium oxynitride, aluminium-chromium oxide (AlCr)2O3, aluminium-chromium oxynitride or a mixed oxide or mixed oxynitride of aluminium, chromium and further metals of (AlCrMe1, Men)2 oxide or (AlCrMe1, Men)2 oxynitride, where Me . . . Men means one or more further metals, selected from Hf, Y, Zr and Ru, and wherein the functional layer has a rhombohedral structure.
摘要翻译： 切割工具具有通过PVD沉积的基底和多层涂层。 该涂层包含至少包含铝（Al）和含铬氧化功能层的氮化物或碳氮化物的一个或多个相同或不同层的基层。 通过设置在基层和功能层之间的金属Al，Cr，Si和/或Zr的一种或多种氧化物或氧化物硝酸盐的中间层来改善含铬功能层的附着。 中间层具有立方结构，含铬功能层选自氧化铬（Cr 2 O 3），氮氧化铬，铝 - 氧化铬（AlCr）2 O 3，铝 - 氮氧化铬或铝，铬的混合氧化物或混合氮氧化物 和（AlCrMe1，Men）2氧化物或（AlCrMe1，Men）2氮氧化物的其他金属，其中Me。 。 。 男士是指选自Hf，Y，Zr和Ru中的一种或多种其它金属，其中功能层具有菱形结构。
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公开(公告)号：US08691378B2
公开(公告)日：2014-04-08
申请号：US13201028
申请日：2010-03-18
申请人： Veit Schier , Oliver Eibl , Wolfgang Engelhart
发明人： Veit Schier , Oliver Eibl , Wolfgang Engelhart
CPC分类号： C23C14/08 , B23B27/14 , B23B2228/08 , B23B2228/105 , C23C14/081 , C23C14/083 , C23C16/40 , C23C30/005 , Y10T428/257 , Y10T428/265
摘要： The invention relates to a cutting tool having a substrate base body and a single or multi-layered coating attached thereupon, wherein at least one layer of the coating is a metal oxide layer produced in the PVD process or in the CVD process and the metal oxide layer has a grain structure wherein there is structural disorder within a plurality of the existing grains that are characterized in that in electron diffraction images of the grains, point-shaped reflections occur up to a maximum lattice spacing dGRENZ and for lattice spacing greater than dGRENZ no point-shaped reflections occur, but rather a diffuse intensity distribution typical for amorphous structures.
摘要翻译： 本发明涉及一种切割工具，其具有基底基体和附着在其上的单层或多层涂层，其中涂层的至少一层是在PVD工艺或CVD工艺中生产的金属氧化物层，金属氧化物 层具有晶粒结构，其中在多个现有晶粒内存在结构紊乱，其特征在于在晶粒的电子衍射图像中，点形反射发生到最大晶格间距dGRENZ，并且对于大于dGRENZ的晶格间距 发生点状反射，而是非晶体结构的典型散射强度分布。
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