Pyrogenically produced silicondioxide powder
    1.
    发明申请
    Pyrogenically produced silicondioxide powder 有权
    热解产生的二氧化硅粉末

    公开(公告)号:US20060155052A1

    公开(公告)日:2006-07-13

    申请号:US11084170

    申请日:2005-03-21

    摘要: Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 200±25 m2/g, wherein the aggregates display an average surface area of 7000 to 12000 nm2, an average equivalent circle diameter (ECD) of 80 to 100 nm and an average circumference of 850 to 1050 nm. It is produced by a pyrogenic process in which silicon tetrachloride and a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1570 to 1630° C. is obtained. It can be used as a filler.

    摘要翻译: 以BET表面积为200±25m 2 / g的一次粒子的聚集体的形式的热解生成的二氧化硅粉末,其中聚集体的平均表面积为7000〜12000nm, 2,平均当量圆直径(ECD)为80〜100nm,平均周长为850〜1050nm。 它是通过热原法制造的,其中四氯化硅和包含H 3 SiCl,H 2 SiCl 2,HSiCl 3>与一次空气和燃烧气体混合并燃烧到反应室中,二次空气也被引入反应室,并且进料选择为使绝热火焰温度为1570至1630℃ C.得到。 它可以用作填料。

    Pyrogenically produced silicon dioxide powder
    4.
    发明授权
    Pyrogenically produced silicon dioxide powder 有权
    热解生成二氧化硅粉末

    公开(公告)号:US07491375B2

    公开(公告)日:2009-02-17

    申请号:US11084170

    申请日:2005-03-21

    IPC分类号: C01B33/12

    摘要: Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 200±25 m2/g, wherein the aggregates display an average surface area of 7000 to 12000 nm2, an average equivalent circle diameter (ECD) of 80 to 100 nm and an average circumference of 850 to 1050 nm. It is produced by a pyrogenic process in which silicon tetrachloride and a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3 are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1570 to 1630° C. is obtained. It can be used as a filler.

    摘要翻译: 以BET表面积为200±25m 2 / g的一次粒子聚集形式的热解生成二氧化硅粉末,其中聚集体的平均表面积为7000〜12000nm 2,平均当量圆直径(ECD)为80 至100nm,平均周长为850〜1050nm。 其通过热解法制备,其中将四氯化硅和包含H3SiCl,H 2 SiCl 2,HSiCl 3,CH 3 SiCl 3,(CH 3)2 SiCl 2,(CH 3)3 SiCl和/或(n-C 3 H 7)SiCl 3的第二硅组分与一次空气和 燃烧气体并燃烧到反应室中,二次空气也被引入反应室,并且进料选择为使得绝热火焰温度为1570℃至1630℃。 它可以用作填料。