Method and apparatus for determining the quantity ratio of two
components of a multi-substance mixture
    1.
    发明授权
    Method and apparatus for determining the quantity ratio of two components of a multi-substance mixture 失效
    用于确定多种物质混合物的两种组分的量比的方法和装置

    公开(公告)号:US4167338A

    公开(公告)日:1979-09-11

    申请号:US831134

    申请日:1977-09-07

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: G01J3/433

    Abstract: A method for determining the quantity ratio of two components of a multi-substance mixture whose absorption bands are adjacent to each other and overlap comprises using an interference filter which is rotated in a uniform rotation about a first axis through the filter plane which forms with a perpendicular erected on the filter plane a fixed angle .beta. which is not equal to zero. The filter is rotatably arranged about a second axis through the filter plane and the method is characterized by adjusting the angle .alpha. which the axis of rotation forms with the ray in the range of .beta. is less than .alpha. so that a signal corresponding to the first derivative of the spectral intensity distribution of the radiation transmitted by the substance mixture just passes through zero and a quantity correlated with this angle is used as a measure of the quantity ratio. The radiation modulator for determining the quantity ratio includes a housing having an opening for the passage of the light ray therethrough and a filter in the housing in the path of the beam. The filter is mounted for rotation about a first axis comprising the axis of the filter and is mounted for pivoting about a second axis also going through the filter. The first axis is such that the area normal thereof forms with the first axis a fixed angle .beta. and the first axis is rotatable about the second axis and an angle .alpha. is formed between the first axis in the ray direction which may be read and indicated and the filter is adjustable to vary the angle.

    Abstract translation: 一种用于确定其吸收带彼此相邻并且重叠的多物质混合物的两种组分的量比的方法包括使用干涉滤光器,所述干涉滤光器以围绕第一轴的均匀旋转通过过滤平面旋转,所述过滤平面与 垂直竖立在过滤平面上,固定角度β不等于零。 过滤器绕第二轴线可旋转地布置通过过滤器平面,并且该方法的特征在于调整旋转轴线形成的角度α,β的范围内的光线小于α,使得对应于一阶导数的信号 由物质混合物传播的辐射的光谱强度分布刚好通过零,并且与该角度相关的量被用作量比的量度。 用于确定数量比率的辐射调制器包括具有用于光线通过的开口的壳体和在梁的路径中的壳体中的过滤器。 安装过滤器以围绕包括过滤器的轴线的第一轴线旋转,并且安装成围绕也穿过过滤器的第二轴线枢转。 第一轴线使得其第一轴线与第一轴线形成固定角度β并且第一轴线可围绕第二轴线旋转并且在可以被读取和指示的射线方向上的第一轴线之间形成角度α,并且 过滤器可调,以改变角度。

    Arrangement for coating substrates by vacuum deposition
    2.
    发明授权
    Arrangement for coating substrates by vacuum deposition 失效
    通过真空沉积涂布基板的布置

    公开(公告)号:US4449478A

    公开(公告)日:1984-05-22

    申请号:US357334

    申请日:1982-03-11

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: C23C14/505 C23C14/044

    Abstract: An arrangement for coating substrates in an apparatus for vacuum deposition comprises a rotatable substrate holding structure in the form of a circular plate provided with holders for the substrates. The holders are arranged in circular rows around the axis of rotation of the plate so that the substrates held in the holder are arranged at axes such that those substrates in a single circular row have axes which intersect a single point along the axis of rotation of the plate. A vapor beam correction screen is mounted for rotation adjacent to the plate in an opposite direction about the same axis. A vapor beam correction screen is conformed in a stepwise manner to an even coating of spherical zones which have their center of curvature at the point of intersection of the substrate axes and are tangent to the poles of the respective substrates and cover the surface areas thereof.

    Abstract translation: 在用于真空沉积的设备中涂覆基板的布置包括具有设置有用于基板的保持器的圆形板形式的可旋转基板保持结构。 保持器围绕板的旋转轴线布置成圆形行,使得保持在保持器中的基板布置在轴线处,使得单个圆形行中的那些基板具有沿着沿着旋转轴线的单个轴线相交的轴线 盘子。 安装蒸汽束校正屏幕以沿着相同轴线的相反方向旋转。 蒸气束校正屏幕以逐步的方式符合均匀的球形区域涂层,该球形区域具有在基板轴线的交点处的曲率中心,并且与相应基板的极点相切并且覆盖其表面区域。

    Method of producing a high vacuum in a container
    3.
    发明授权
    Method of producing a high vacuum in a container 失效
    在容器中产生高真空的方法

    公开(公告)号:US4181161A

    公开(公告)日:1980-01-01

    申请号:US951241

    申请日:1978-10-13

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: B01J3/006 C23C14/564

    Abstract: A method of producing a high vacuum in a container which has limiting wallshich define a reaction chamber which is adapted to be evacuated for vacuum processing purposes, and in which gases are sorbed during vacuum operation and the gases are removed subsequently by increasing the temperature of the walls and evacuating the chamber at the same time includes heating the reaction chamber, sensing the underpressure in the reaction chamber and controlling the heating of the chamber in accordance with the sensed pressure in a manner such that the underpressure remains within a preselected upper and lower limit value until a predetermined temperature of the walls is attained.

    Abstract translation: 一种在容器中产生高真空的方法,该容器具有限定壁,该限定壁限定反应室,该反应室适于真空处理目的被抽真空,并且其中气体在真空操作期间被吸收,并且随后通过增加气体的温度 墙壁和同时抽空室包括加热反应室,感测反应室中的负压,并根据感测到的压力控制室的加热,使得负压保持在预选的上部和下部 直到达到壁的预定温度为止。

    Arrangement for uniformly coating surfaces of revolution by vapor
deposition in a high vacuum
    4.
    发明授权
    Arrangement for uniformly coating surfaces of revolution by vapor deposition in a high vacuum 失效
    在高真空中通过气相沉积均匀地涂覆旋转表面的布置

    公开(公告)号:US4380212A

    公开(公告)日:1983-04-19

    申请号:US299061

    申请日:1981-09-03

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: C23C14/044

    Abstract: Surfaces of revolution to be coated by vapor deposition are placed in centering holes of a rotary dome which is centrally seated on a rotary ring. The rotary ring centered by means of fixedly mounted guide and drive rollers so as to have an evaporative source located as close as possible to the axis of rotation of the dome and at the center of curvature of the dome. The substance, vaporized by heating in a high vacuum space, condenses on the substrates as a thin layer. From the variation of the layer thickness, the outline of a corrective mask is computed for a constant radiant intensity of the vapor in all utilizable directions in the space, while assuming a central, point source of evaporation. A corresponding corrective mask is then secured by means of a support to another rotary ring in close proximity to the surfaces of revolution to be coated, which other ring is centered in the same manner as the first rotary ring, but rotates in the opposite direction about the same axis. Under otherwise equal conditions and in spite of a deviation from ideal conditions, this results in a uniform coating of high precision, that is, in an equal layer thickness at all points of the surfaces of revolution which are equally spaced from the center of the surface.

    Abstract translation: 通过气相沉积涂覆的旋转表面放置在中心位于旋转环上的旋转圆顶的定心孔中。 旋转环以固定安装的引导件和驱动辊为中心,以便具有尽可能靠近圆顶的旋转轴线并且在圆顶的曲率中心处的蒸发源。 通过在高真空空间中加热而蒸发的物质以薄层的形式在基板上冷凝。 根据层厚度的变化,计算出在空间中所有可利用的方向上的蒸汽的恒定辐射强度,同时假设中心点蒸发源,校正掩模的轮廓。 然后通过支撑件将相应的校正掩模固定到紧邻待涂覆的旋转表面的另一旋转环,其另一个环以与第一旋转环相同的方式居中,但是沿相反方向围绕 同轴。 在其他相等的条件下,尽管偏离理想条件,这导致了高精度的均匀涂层,即在与表面中心等距离的旋转表面的所有点处具有相等的层厚度 。

    Vacuum evaporation apparatus
    5.
    发明授权
    Vacuum evaporation apparatus 失效
    真空蒸发装置

    公开(公告)号:US4217856A

    公开(公告)日:1980-08-19

    申请号:US919546

    申请日:1978-06-27

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: C23C14/24 C23C14/564

    Abstract: The vacuum evaporation apparatus comprises a housing having walls definingn evacuable evaporation chamber with an evaporator in the chamber disposed below a supporting structure for the substance to be coated and including an annular screen disposed around the evaporator between the evaporator and the walls of the housing so that only an opening or angle between the evaporator and the supporting structure is left which is sufficient for the vapor deposition of the substrates. The screen is of a material which may be heated, such as a metal material, which may be electrically heated.

    Abstract translation: 真空蒸发装置包括具有限定可抽空蒸发室的壁的壳体,该腔室中的蒸发器设置在用于待涂覆物质的支撑结构下方,并且包括围绕蒸发器设置在蒸发器与壳体壁之间的环形屏幕, 仅留下蒸发器和支撑结构之间的开口或角度,这足以使基板气相沉积。 屏幕是可以被加热的材料,例如可以被电加热的金属材料。

    Fluid protective wall cover in a vapor deposition chamber
    6.
    发明授权
    Fluid protective wall cover in a vapor deposition chamber 失效
    气相沉积室中的流体保护壁盖

    公开(公告)号:US4183982A

    公开(公告)日:1980-01-15

    申请号:US903173

    申请日:1978-05-05

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: F04B37/14

    Abstract: A method of producing a high vacuum in a vacuum container which has an exst connection line connected thereto and using an interior protective covering for the walls of the container and a protective gas comprises, applying covering to the interior of the container so as to shield the inner walls thereof and to also shield the exhaust connection thereto, directing a protective gas into the space between the covering the interior walls of the container, preferably during the flooding in which the container is opened, and thereafter evacuating the interior of the container through the exhaust connection and heating the covering. The vacuum treatment device, such as a device for evaporating materials from vapor deposition, comprises a closed container having interior walls with a thin-walled metal sheet forming a covering arranged in spaced relationship to the interior walls so as to shield a major area of the walls and to define a space between the walls and the covering. A connecting line for introducing a protective gas into the container in the space between the walls and the covering is provided, and in addition an exhaust gas line is connected to the container and to an evacuating pump for evacuating the container. A thin-walled metal screen is arranged in the container and shields at least a portion of the exhaust line, and heater means are provided for heating both the covering and the shield.

    Abstract translation: 在具有与其连接的排气连接线并且使用用于容器的壁的内部保护罩和保护气体的真空容器中产生高真空的方法包括:将覆盖物施加到容器的内部以屏蔽 并且还屏蔽其排气连接,将保护气体引导到覆盖容器的内壁之间的空间中,优选地在容器打开的淹水期间,然后将容器的内部抽空通过容器的内部 排气连接和加热覆盖物。 真空处理装置,例如用于从气相沉积中蒸发材料的装置,包括具有内壁的密闭容器,其具有薄壁金属片,该薄壁金属片形成与内壁间隔开的布置,以便屏蔽 墙壁和墙壁和覆盖物之间的空间。 提供了一种用于在壁和覆盖物之间的空间中将保护气体引入容器的连接管线,此外,排气管线连接到容器和用于抽空容器的抽空泵。 在容器中设置有薄壁金属屏蔽物,并屏蔽排气管线的至少一部分,并且设置加热器装置以加热覆盖物和护罩。

    Pump construction for the treatment of gases with a sorbent material
    7.
    发明授权
    Pump construction for the treatment of gases with a sorbent material 失效
    用吸附剂材料处理气体的泵结构

    公开(公告)号:US4135895A

    公开(公告)日:1979-01-23

    申请号:US828183

    申请日:1977-08-26

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: B01D53/0438 F04B37/02

    Abstract: A pump for the treatment of gases with a sorbent material in an evacuated chamber comprises a housing which has a plurality of stacked plates which define a continuous upwardly extending path for the sorbent material which is made up of successive spirals. At least some of the spirals are spaced vertically apart to define a sorption zone permitting the passage of gases to be treated over the sorbent material. In addition the stacked plates also define a closed path in the housing leading from the sorption zone and out of the housing for discharing desorbed gases. The housing is vibrated by a vibration drive applied to effect upward movement of the sorbent material and a downcomer pipe or return pipe extends through the plates for returning the sorbent material from the upper portion of the path back to the location of the bottom of the sorbent material path. The sorbent material is continuously moved upwardly through the housing on the plates by vibrating the housing to effect such movement. Gases are circulated over the sorbent material for their treatment as the sorbent material is moved upwardly along the path and subsequently returned back to the lower portion of the path.

    Abstract translation: 用于在真空室中用吸附剂材料处理气体的泵包括壳体,该壳体具有多个堆叠的板,其限定由连续螺旋构成的吸附材料的连续向上延伸的路径。 至少一些螺旋线垂直间隔开,以限定吸附区域,允许在吸附剂材料上通过待处理的气体。 此外,堆叠板还在壳体中从吸附区限定出封闭路径,并且从壳体出来以排出解吸的气体。 壳体被施加的振动驱动振动以实现吸附剂材料的向上运动,并且降液管或回流管延伸穿过板,用于将吸附剂材料从路径的上部返回到吸附剂底部的位置 物料路径。 吸附剂材料通过振动壳体而进一步向上移动通过板上的壳体来实现这种运动。 当吸附剂材料沿着路径向上移动并随后返回到路径的下部时,气体在吸附剂材料上循环用于处理。

    Method and apparatus for enriching a lower molecular weight gas with
substances of higher molecular weight contained therein
    8.
    发明授权
    Method and apparatus for enriching a lower molecular weight gas with substances of higher molecular weight contained therein 失效
    用于使含有较高分子量物质的较低分子量气体富集的方法和装置

    公开(公告)号:US3973929A

    公开(公告)日:1976-08-10

    申请号:US486067

    申请日:1974-07-05

    Applicant: Thaddaus Kraus

    Inventor: Thaddaus Kraus

    CPC classification number: G01N1/40 B01D49/00 F04D19/046

    Abstract: A method and apparatus for enriching a gas of lower molecular weight with substances of higher molecular weight contained therein, comprises using first and second molecular pumps connected together, with the second pump having a conveying direction different from the first pump, and wherein a feed line for the gas terminates in a working chamber of the first molecular pump and its exhaust side includes extraction means for the enriching component. The gas is conducted to the working chamber of the first molecular pump and a portion of the gas is conveyed at the intake side of the molecular pump by means of the second pump. The substances of higher molecular weight are collected and extracted at the exhaust side of the first molecular pump.

    Abstract translation: 包含其中含有较高分子量物质的较低分子量气体的方法和装置包括使用连接在一起的第一和第二分子泵,第二泵具有不同于第一泵的输送方向,并且其中馈送线 因为气体终止在第一分子泵的工作室中,其排气侧包括用于富集组分的萃取装置。 气体被传导到第一分子泵的工作室,并且一部分气体通过第二泵在分子泵的进气侧输送。 在第一分子泵的排气侧收集和提取较高分子量的物质。

    Method of determining the concentration ratio of two substances
    9.
    发明授权
    Method of determining the concentration ratio of two substances 失效
    确定两种物质浓度比的方法

    公开(公告)号:US3994592A

    公开(公告)日:1976-11-30

    申请号:US630520

    申请日:1975-11-10

    CPC classification number: G01J3/433

    Abstract: The concentration ratio of two components of a mixture of substances, having absorption bands which are adjacent each other in a manner such that the radiation absorption of the mixture of substances has a minimum between these absorption bands, is determined by measuring, in three adjacent, narrow spectral regions, of the radiation transmitted by the mixture of substances, a variable which is proportional to the ratio .DELTA..sup.1 I / .DELTA..sup.2 I wherein the numerator .DELTA..sup.1 I = (I.sub.3 - I.sub.1) is the difference between the intensities of radiation of the two outer spectral regions, and the denominator .DELTA..sup.2 I = (I.sub.3 - I.sub.2) -(I.sub.2 - I.sub.1) is the value by which the respective differences between the intensities of radiation of each outer spectral region and the middle spectral region differ from each other. The position, in the spectrum, of the three adjacent regions is adjusted so that they are located between the absorption maxima of the two components and where the numerator .DELTA..sup.1 I becomes zero at a definite concentration ratio which is preferably the ratio at which the highest accuracy of measurement is desired. Alternatively, the variable is proportional to the ratio I'/I", which is the ratio of the first derivative I' to the second derivative I" of the distribution of spectral intensity.

    Abstract translation: 具有彼此相邻的吸收带的物质混合物的两种成分的浓度比通过在三个相邻的条件下测量物质混合物的辐射吸收在这些吸收带之间具有最小值的方式来确定, 由物质混合物传播的辐射的窄光谱区域,与DELTA 1I / DELTA 2I比例成比例的变量,其中分子DELTA 1I =(I3-I1)是两个外部辐射强度之间的差异 光谱区域和分母DELTA 2I =(I3-I2) - (I2-I1)是每个外部光谱区域和中间光谱区域的辐射强度之间的相应差别彼此不同的值。 调整三个相邻区域的光谱中的位置,使得它们位于两个分量的吸收最大值之间,其中分子DELTA 1I以确定的浓度比变为零,其优选地为最高精度 需要测量。 或者,该变量与作为光谱强度分布的第一导数I'与第二导数I“的比率I'/ I”成比例。

Patent Agency Ranking