3D Nanoprinter
    5.
    发明申请

    公开(公告)号:US20220404708A1

    公开(公告)日:2022-12-22

    申请号:US17488283

    申请日:2021-09-28

    IPC分类号: G03F7/16

    摘要: A 3D nanoprinter electron beam lithography module for a lithography system, such as a scanning electron microscope (SEM) or an environmental SEM (ESEM) with a beam blanker and electron beam lithography attachment, but generally applicable to any electron beam lithography capable system. The module is comprised of an in-situ spin-coating stage that is compatible with a cooling-SEM stage, with a spin-coating motor, a spin-coating sample stub, a liquid waste collector cup, a liquid dispensing arm holding a tube bundle that is connected via tubing to micro-syringe pumps or a pressure driven flow controller or pumps connected to fluid reservoirs, an electron beam scan generator control box, electrical feedthroughs, control electronics, and a computing system responsible for controlling the entire module. The dispensing arm can be controlled by a servo motor.

    Computational Radiation Tolerance for High Quality Infrared Focal Plane Arrays

    公开(公告)号:US20220333996A1

    公开(公告)日:2022-10-20

    申请号:US17687170

    申请日:2022-03-04

    IPC分类号: G01J5/22 H04N5/33

    摘要: An imaging system includes a focal plane array, readout electronics, and a computing system in which the number of active pixels is either set at a low-fraction of the total pixels thereby reducing the effect of radiation damage, or radiation damage over time is detected and automatically compensated. Machine learning is used to identify radiation damaged pixels and damaged regions which are subsequently eliminated and replaced by the computational system. The machine learning is used to identify changes in the fixed pattern signal/noise and/or noise of the system, and is then computationally corrected.