公开(公告)号：US08381998B1

公开(公告)日：2013-02-26

申请号：US13337329

申请日：2011-12-27

申请人： Shu-Ju Chang

发明人： Shu-Ju Chang

IPC分类号： G06K19/06

CPC分类号： G06K19/07786

摘要： Method for manufacturing a long-range RFID metallic product and structure thereof are provided so that UHF RFID skills can be smoothly applied on the various metallic products without interference. Electromagnetic waves radiated from a transmitter can be received by a metallic first antenna. With the resonance and induction generated by the resonance chamber located in the metallic first antenna and a second antenna of the electronic tag module patch, the signal generated can be transmitted to the RFID chip to achieve long-range reading and transmitting effects. Due to the breaking cutlines of the first rigid clip located on the second antenna of the electronic tag module patch, the second antenna of the electronic tag module patch is damaged when removing the electronic tag module patch from the metallic first antenna by tearing along the breaking cutlines of the first rigid clip, thereby preventing the RFID from being duplicated.

摘要翻译： 提供了制造远程RFID金属制品的方法及其结构，使得UHF RFID技术可以平滑地应用于各种金属制品而不受干扰。 从发射机辐射的电磁波可以由金属的第一天线接收。 利用位于金属第一天线中的谐振腔产生的谐振和感应电路以及电子标签模块贴片的第二天线，所产生的信号可被传送到RFID芯片以实现远距离读取和发送效果。 由于位于电子标签模块贴片的第二天线上的第一刚性夹具的断开切割线，电子标签模块贴片的第二天线在沿着断裂撕裂从金属第一天线移除电子标签模块贴片时被损坏 第一刚性夹的切割线，从而防止RFID被复制。

公开(公告)号：US20110104387A1

公开(公告)日：2011-05-05

申请号：US12612618

申请日：2009-11-04

申请人： Meng-Tan Chiang ,  Cheng-Hsiang Chuang ,  Jenq-Der Tsou ,  Ko-Shao Chen ,  Shu-Ju Chang ,  Shu-Chuan Liao

发明人： Meng-Tan Chiang ,  Cheng-Hsiang Chuang ,  Jenq-Der Tsou ,  Ko-Shao Chen ,  Shu-Ju Chang ,  Shu-Chuan Liao

IPC分类号： C08J7/18

CPC分类号： B05D1/62 ,  B05D5/08 ,  B05D2202/10

摘要： The invention provides a method of a cold plasma surface process for ferrous absorbent including the following steps. Firstly, a substrate is disposed in a vacuum chamber under a room temperature, and electrical energy is transmitted to the substrate; next, organic silicon monomer is added into the vacuum chamber under the room temperature; at last, the organic silicon monomer is deposited on the surface of the substrate by a plasma polymerization process to form a hydrophobic film on the surface of the substrate.

摘要翻译： 本发明提供了一种用于含铁吸收剂的冷等离子体表面处理方法，包括以下步骤。 首先，将基板在室温下设置在真空室中，将电能透过至基板; 接下来，在室温下将真空室中加入有机硅单体; 最后，通过等离子体聚合方法将有机硅单体沉积在衬底的表面上，以在衬底的表面上形成疏水膜。