公开(公告)号：US20110104387A1

公开(公告)日：2011-05-05

申请号：US12612618

申请日：2009-11-04

申请人： Meng-Tan Chiang ,  Cheng-Hsiang Chuang ,  Jenq-Der Tsou ,  Ko-Shao Chen ,  Shu-Ju Chang ,  Shu-Chuan Liao

发明人： Meng-Tan Chiang ,  Cheng-Hsiang Chuang ,  Jenq-Der Tsou ,  Ko-Shao Chen ,  Shu-Ju Chang ,  Shu-Chuan Liao

IPC分类号： C08J7/18

CPC分类号： B05D1/62 ,  B05D5/08 ,  B05D2202/10

摘要： The invention provides a method of a cold plasma surface process for ferrous absorbent including the following steps. Firstly, a substrate is disposed in a vacuum chamber under a room temperature, and electrical energy is transmitted to the substrate; next, organic silicon monomer is added into the vacuum chamber under the room temperature; at last, the organic silicon monomer is deposited on the surface of the substrate by a plasma polymerization process to form a hydrophobic film on the surface of the substrate.

摘要翻译： 本发明提供了一种用于含铁吸收剂的冷等离子体表面处理方法，包括以下步骤。 首先，将基板在室温下设置在真空室中，将电能透过至基板; 接下来，在室温下将真空室中加入有机硅单体; 最后，通过等离子体聚合方法将有机硅单体沉积在衬底的表面上，以在衬底的表面上形成疏水膜。