Silver halide emulsions with doped epitaxy
    4.
    发明授权
    Silver halide emulsions with doped epitaxy 失效
    具有掺杂外延的卤化银乳剂

    公开(公告)号:US5462849A

    公开(公告)日:1995-10-31

    申请号:US330280

    申请日:1994-10-27

    IPC分类号: G03C1/035 G03C1/08 G03C1/09

    CPC分类号: G03C1/09 G03C1/08 G03C1/035

    摘要: A photographic silver halide emulsion is disclosed comprised of radiation sensitive composite silver halide grains including host grain portions accounting for at least 50 percent of total silver and surface portions epitaxially deposited on the host grain portions. The epitaxially deposited surface portions on the host grain portions exhibit a face centered cubic crystal lattice structure containing a hexacoordination complex of a metal from periods 4, 5 and 6 of groups 3 to 14 inclusive of the periodic table of elements in which one or more organic ligands each containing at least one carbon-to-carbon bond, at least one carbon-to-hydrogen bond or at least one carbon-to-nitrogen-to-hydrogen bond sequence occupy up to half the metal coordination sites in the coordination complex and at least half of the metal coordination sites in the coordination complex are provided by halogen or pseudohalogen ligands.

    摘要翻译: 公开了一种照相卤化银乳剂,其包含辐射敏感复合卤化银颗粒,其包括占整个银的至少50%的主体颗粒部分和外延沉积在主体颗粒部分上的表面部分。 在主体颗粒部分上的外延沉积的表面部分表现出一种面心立方晶格结构,其含有第3至14族的第4,5和6周期的金属的六配位络合物,包括元素周期表,其中一个或多个有机 每个含有至少一个碳 - 碳键,至少一个碳 - 氢键或至少一个碳 - 氮 - 氢键序列的配体占配位络合物中金属配位点的一半, 配位络合物中至少一半的金属配位点由卤素或假卤素配体提供。

    High chloride emulsion doped with combination of metal complexes
    6.
    发明授权
    High chloride emulsion doped with combination of metal complexes 失效
    掺有金属络合物的高氯化物乳液

    公开(公告)号:US06531274B1

    公开(公告)日:2003-03-11

    申请号:US09919514

    申请日:2001-07-31

    IPC分类号: G03C1005

    CPC分类号: G03C1/09

    摘要: A radiation-sensitive emulsion comprised of silver halide grains (a) containing greater than 50 mole percent chloride, based on silver, (b) having greater than 50 percent of their surface area provided by {100} crystal faces, and (c) having a central portion accounting for up to 99 percent of total silver and containing a first dopant of Formula (I) and a second dopant of Formula (II): [RuL6]n  (I) wherein n is zero, −1, −2, −3 or −4, and L6 represents bridging ligands which can be independently selected, provided that at least four of the ligands are anionic ligands, and at least one of the ligands is a cyano ligand or a ligand more electronegative than a cyano ligand; [TE4(NZ)E′]r  (II) wherein T is Os or Ru; E4 represents bridging ligands which can be independently selected; E′ is E or NZ; r is zero, −1, −2 or −3; and Z is oxygen or sulfur; wherein the dopant of Formula (II) is selected from hexacoordination complexes which form deep electron traps in silver chloride grains by providing an incorporated molecular entity having a lowest unoccupied molecular orbital which is at least 0.5 eV below the conduction band of the silver chloride grains, where (i) less than 60% of the deep electron traps empty within 2000 seconds at 300 K after being filled and (ii) between 15-60% of the deep electron traps empty within 12,000 seconds at 300 K after being filled. Improved latent image keeping performance can be obtained for optical and digital exposed elements which comprise silver halide grains in an emulsion layer doped with a dopant of Formula (I) and a dopant of Formula (II) as described above, while substantially maintaining other desired photographic parameters.

    摘要翻译: 由卤化银颗粒(a)组成的辐射敏感性乳液(a),其含有大于50摩尔%的氯化物,基于银,(b)具有由{100}晶面提供的其表面积的50%以上,和(c) 占中银总量的99%,并含有式(I)的第一掺杂剂和式(II)的第二掺杂剂:其中n为0,-1,-2,-3或-4,和 L6表示可以独立选择的桥连配体,条件是至少四种配体是阴离子配体,并且至少一种配体是氰基配体或比氰基配体更具有负电性的配体;其中T是Os或Ru; E4表示可独立选择的桥连配体; E'是E或NZ; r为零,-1,-2或-3; Z是氧或硫; 其中式(II)的掺杂剂选自六配位络合物,其通过提供低于氯化银颗粒的导带至少0.5eV的最低未占分子轨道的掺入分子实体在氯化银颗粒中形成深电子陷阱, 其中(i)在填充之后300K内,在2000秒内小于60%的深电子陷阱空闲,以及(ii)在填充之后的300K下,15-60%的深电子陷阱在12,000秒内空出。 对于在掺杂有式(I)的掺杂剂和如上所述的式(II)的掺杂剂的乳剂层中包含卤化银颗粒的光学和数字暴露元件,可以获得改进的潜像保持性能,同时基本上保持其它所需的照相 参数。

    Internally doped silver halide emulsions and processes for their
preparation
    7.
    发明授权
    Internally doped silver halide emulsions and processes for their preparation 失效
    内掺卤化银乳剂及其制备方法

    公开(公告)号:US5360712A

    公开(公告)日:1994-11-01

    申请号:US91148

    申请日:1993-07-13

    CPC分类号: G03C1/08

    摘要: A process is disclosed of preparing a radiation sensitive silver halide emulsion comprising reacting silver and halide ions in a dispersing medium in the presence of a metal hexacoordination or tetracoordination complex having at least one organic ligand containing a least one carbon-to-carbon bond, at least one carbon-to-hydrogen bond, or at least one carbon-to-nitrogen-to-hydrogen bond sequence and at least half of the metal coordination sites occupied by halide or pseudohalide ligands. The metal forming the complex is chosen from periods 4, 5 and 6 and groups 3 to 13 inclusive of the periodic table of elements. The incorporation of the transition metal ion dopant and at least one organic ligand into the cubic crystal lattice of the silver halide grains can be used to improve photographic performance.

    摘要翻译: 公开了制备辐射敏感卤化银乳剂的方法,其包括在存在金属六配位体或具有至少一个含有至少一个碳 - 碳键的有机配体的四配位络合物的存在下,使分散介质中的银和卤离子反应, 至少一个碳 - 氢键,或至少一个碳 - 氮 - 氢键序列和由卤化物或拟卤化物配体占据的至少一半的金属配位点。 形成络合物的金属选自周期表4,5和6,第3至13族,包括元素周期表。 将过渡金属离子掺杂剂和至少一种有机配体掺入卤化银颗粒的立方晶格可以用于改善照相性能。