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    Non-interactive electrostatic deposition of induction charged conductive powder
    2.
    发明授权
    Non-interactive electrostatic deposition of induction charged conductive powder 失效
    感应带电导电粉末的非交互式静电沉积

    公开(公告)号：US08062713B2

    公开(公告)日：2011-11-22

    申请号：US12592917

    申请日：2009-12-04

    申请人： Dan A. Hays ,  Peter J. Mason ,  James Mason

    发明人： Dan A. Hays ,  Peter J. Mason ,  James Mason

    IPC分类号： B05D1/06

    CPC分类号： H01M4/04 ,  H01M4/139 ,  H01M4/88

    摘要： A method for manufacturing electrodes using an electrostatic deposition unit. In the first step of the process a mixture of magnetic carrier beads and a conductive powder is prepared in the sump of the deposition unit; the mixture forms a magnetic brush on the sleeve of the deposition unit. In the second step of the process, the substrate is positioned away from the magnetic brush to form an air gap. In the third step of the process, a voltage is applied between the substrate and the sleeve of the deposition unit in order to produce a large asymmetry between the magnetic brush and said substrate such that the electric field at the magnetic brush is at least 3.0 times as great as the electric field at the substrate. In the fourth step of the process, conductive powder is deposited onto the substrate.

    摘要翻译： 一种使用静电沉积单元制造电极的方法。 在该方法的第一步中，在沉积单元的贮槽中制备磁性载体珠粒和导电粉末的混合物; 混合物在沉积单元的套筒上形成磁刷。 在该过程的第二步骤中，将衬底定位成远离磁刷形成气隙。 在该过程的第三步骤中，在衬底和沉积单元的套筒之间施加电压，以便在磁刷和所述衬底之间产生大的不对称性，使得磁刷上的电场至少为3.0倍 与基板上的电场一样大。 在该方法的第四步中，将导电粉末沉积到基底上。

    Non-interactive electrostatic deposition of induction charged conductive powder
    5.
    发明申请
    Non-interactive electrostatic deposition of induction charged conductive powder 失效

    公开(公告)号：US20110135836A1

    公开(公告)日：2011-06-09

    申请号：US12592917

    申请日：2009-12-04

    申请人： Dan A. Hays ,  Peter J. Mason ,  James Mason

    发明人： Dan A. Hays ,  Peter J. Mason ,  James Mason

    IPC分类号： B05D1/06

    CPC分类号： H01M4/04 ,  H01M4/139 ,  H01M4/88

    摘要： A method for manufacturing electrodes using an electrostatic deposition unit. In the first step of the process a mixture of magnetic carrier beads and a conductive powder is prepared in the sump of the deposition unit; the mixture forms a magnetic brush on the sleeve of the deposition unit. In the second step of the process, the substrate is positioned away from the magnetic brush to form an air gap. In the third step of the process, a voltage is applied between the substrate and the sleeve of the deposition unit in order to produce a large asymmetry between the magnetic brush and said substrate such that the electric field at the magnetic brush is at least 3.0 times as great as the electric field at the substrate. In the fourth step of the process, conductive powder is deposited onto the substrate.