Thin-film heterostructure thermoelectrics in a group IIa and IV-VI materials system
    1.
    发明授权
    Thin-film heterostructure thermoelectrics in a group IIa and IV-VI materials system 有权
    IIa和IV-VI族材料体系中的薄膜异质结构热电

    公开(公告)号:US08901612B2

    公开(公告)日:2014-12-02

    申请号:US13404548

    申请日:2012-02-24

    IPC分类号: H01L21/02 H01L29/26 H01L29/15

    CPC分类号: H01L29/155 H01L29/26

    摘要: Embodiments of a thin-film heterostructure thermoelectric material and methods of fabrication thereof are disclosed. In general, the thermoelectric material is formed in a Group IIa and IV-VI materials system. The thermoelectric material includes an epitaxial heterostructure and exhibits high heat pumping and figure-of-merit performance in terms of Seebeck coefficient, electrical conductivity, and thermal conductivity over broad temperature ranges through appropriate engineering and judicious optimization of the epitaxial heterostructure.

    摘要翻译: 公开了薄膜异质结构热电材料的实施例及其制造方法。 通常,热电材料以IIa和IV-VI族材料体系形成。 热电材料包括外延异质结构,通过外延异质结构的适当工程和明智优化,在宽温度范围内,以塞贝克系数,导电率和热导率表现出高的热泵浦和品质因数性能。

    Thin-film heterostructure thermoelectrics in a group IIA and IV-VI materials system
    2.
    发明授权
    Thin-film heterostructure thermoelectrics in a group IIA and IV-VI materials system 有权
    IIA和IV-VI族材料体系中的薄膜异质结构热电

    公开(公告)号:US08563844B2

    公开(公告)日:2013-10-22

    申请号:US13416246

    申请日:2012-03-09

    IPC分类号: H01L35/26 H01L35/22

    CPC分类号: H01L29/155 H01L29/26

    摘要: Embodiments of a thin-film heterostructure thermoelectric material and methods of fabrication thereof are disclosed. In general, the thermoelectric material is formed in a Group IIa and IV-VI materials system. The thermoelectric material includes an epitaxial heterostructure and exhibits high heat pumping and figure-of-merit performance in terms of Seebeck coefficient, electrical conductivity, and thermal conductivity over broad temperature ranges through appropriate engineering and judicious optimization of the epitaxial heterostructure.

    摘要翻译: 公开了薄膜异质结构热电材料的实施例及其制造方法。 通常,热电材料以IIa和IV-VI族材料体系形成。 热电材料包括外延异质结构,通过外延异质结构的适当工程和明智优化,在宽温度范围内,以塞贝克系数,导电率和热导率表现出高的热泵浦和品质因数性能。

    Low thermal conductivity material
    3.
    发明授权
    Low thermal conductivity material 有权
    低导热性材料

    公开(公告)号:US08519380B2

    公开(公告)日:2013-08-27

    申请号:US13537164

    申请日:2012-06-29

    IPC分类号: H01L29/15

    摘要: Embodiments of a material having low cross-plane thermal conductivity are provided. Preferably, the material is a thermoelectric material. In general, the thermoelectric material is designed to block phonons, which reduces or eliminates heat transport due to lattice vibrations and thus cross-plane thermal conductivity. By reducing the thermal conductivity of the thermoelectric material, a figure-of-merit (ZT) of the thermoelectric material is improved. In one embodiment, the thermoelectric material includes multiple superlattice periods that block, or reflect, multiple phonon wavelengths.

    摘要翻译: 提供具有低横截面导热性的材料的实施例。 优选地,该材料是热电材料。 通常,热电材料被设计成阻挡声子,这减少或消除了由于晶格振动导致的热传递,从而减少了交叉平面导热性。 通过降低热电材料的热导率,提高了热电材料的品质因数(ZT)。 在一个实施例中,热电材料包括阻挡或反射多个声子波长的多个超晶格周期。

    Thermoelectric materials
    4.
    发明授权
    Thermoelectric materials 有权
    热电材料

    公开(公告)号:US09059363B2

    公开(公告)日:2015-06-16

    申请号:US12748531

    申请日:2010-03-29

    摘要: A thermoelectric material having a high ZT value is provided. In general, the thermoelectric material is a thin film thermoelectric material that includes a heterostructure formed of IV-VI semiconductor materials, where the heterostructure includes at least one potential barrier layer. In one embodiment, the heterostructure is formed of IV-VI semiconductor materials and includes a first matrix material layer, a potential barrier material layer adjacent to the first matrix material layer and formed of a wide bandgap material, and a second matrix material layer that is adjacent the potential barrier material layer opposite the first matrix material layer. A thickness of the potential barrier layer is approximately equal to a mean free path distance for charge carriers at a desired temperature.

    摘要翻译: 提供具有高ZT值的热电材料。 通常,热电材料是包括由IV-VI半导体材料形成的异质结构的薄膜热电材料,其中异质结构包括至少一个势垒层。 在一个实施例中,异质结构由IV-VI半导体材料形成,并且包括第一基体材料层,与第一基质材料层相邻并由宽带隙材料形成的势垒材料层,以及第二基质材料层, 邻近与第一基质材料层相对的势垒材料层。 势垒层的厚度近似等于在期望温度下载流子的平均自由程距离。

    LOW THERMAL CONDUCTIVITY MATERIAL
    5.
    发明申请
    LOW THERMAL CONDUCTIVITY MATERIAL 有权
    低热导率材料

    公开(公告)号:US20130009132A1

    公开(公告)日:2013-01-10

    申请号:US13537164

    申请日:2012-06-29

    IPC分类号: H01L29/15

    摘要: Embodiments of a material having low cross-plane thermal conductivity are provided. Preferably, the material is a thermoelectric material. In general, the thermoelectric material is designed to block phonons, which reduces or eliminates heat transport due to lattice vibrations and thus cross-plane thermal conductivity. By reducing the thermal conductivity of the thermoelectric material, a figure-of-merit (ZT) of the thermoelectric material is improved. In one embodiment, the thermoelectric material includes multiple superlattice periods that block, or reflect, multiple phonon wavelengths.

    摘要翻译: 提供具有低横截面导热性的材料的实施例。 优选地,该材料是热电材料。 通常,热电材料被设计成阻挡声子,这减少或消除了由于晶格振动导致的热传递,从而减少了交叉平面导热性。 通过降低热电材料的热导率,提高了热电材料的品质因数(ZT)。 在一个实施例中,热电材料包括阻挡或反射多个声子波长的多个超晶格周期。

    METHOD FOR THIN FILM THERMOELECTRIC MODULE FABRICATION
    6.
    发明申请
    METHOD FOR THIN FILM THERMOELECTRIC MODULE FABRICATION 有权
    薄膜热电模块制造方法

    公开(公告)号:US20110241153A1

    公开(公告)日:2011-10-06

    申请号:US12898218

    申请日:2010-10-05

    IPC分类号: H01L29/66 H01L21/28

    CPC分类号: H01L35/34 H01L35/08

    摘要: Methods of fabrication of a thermoelectric module from thin film thermoelectric material are disclosed. In general, a thin film thermoelectric module is fabricated by first forming an N-type thin film thermoelectric material layer and one or more metallization layers on a substrate. The one or more metallization layers and the N-type thin film thermoelectric material layer are etched to form a number of N-type thermoelectric material legs. A first electrode assembly is then bonded to a first portion of the N-type thermoelectric material legs, and the first electrode assembly including the first portion of the N-type thermoelectric material legs is removed from the substrate. In a similar manner, a second electrode assembly is bonded to a first portion of a number of P-type thermoelectric material legs. The first and second electrode assemblies are then bonded using a flip-chip bonding process to complete the fabrication of the thermoelectric module.

    摘要翻译: 公开了从薄膜热电材料制造热电模块的方法。 通常,通过在衬底上首先形成N型薄膜热电材料层和一个或多个金属化层来制造薄膜热电模块。 蚀刻一个或多个金属化层和N型薄膜热电材料层以形成多个N型热电材料支脚。 然后将第一电极组件接合到N型热电材料支脚的第一部分,并且包括N型热电材料支脚的第一部分的第一电极组件从基板移除。 以类似的方式,第二电极组件结合到多个P型热电材料支脚的第一部分。 然后使用倒装芯片接合工艺来接合第一和第二电极组件,以完成热电模块的制造。

    THIN-FILM HETEROSTRUCTURE THERMOELECTRICS IN A GROUP IIA AND IV-VI MATERIALS SYSTEM
    7.
    发明申请
    THIN-FILM HETEROSTRUCTURE THERMOELECTRICS IN A GROUP IIA AND IV-VI MATERIALS SYSTEM 有权
    集团IIA和IV-VI材料系统中的薄膜结构热电

    公开(公告)号:US20120217548A1

    公开(公告)日:2012-08-30

    申请号:US13404548

    申请日:2012-02-24

    IPC分类号: H01L29/267 H01L21/20

    CPC分类号: H01L29/155 H01L29/26

    摘要: Embodiments of a thin-film heterostructure thermoelectric material and methods of fabrication thereof are disclosed. In general, the thermoelectric material is formed in a Group IIa and IV-VI materials system. The thermoelectric material includes an epitaxial heterostructure and exhibits high heat pumping and figure-of-merit performance in terms of Seebeck coefficient, electrical conductivity, and thermal conductivity over broad temperature ranges through appropriate engineering and judicious optimization of the epitaxial heterostructure.

    摘要翻译: 公开了薄膜异质结构热电材料的实施例及其制造方法。 通常,热电材料以IIa和IV-VI族材料体系形成。 热电材料包括外延异质结构,通过外延异质结构的适当工程和明智优化,在宽温度范围内,以塞贝克系数,导电率和热导率表现出高的热泵浦和品质因数性能。

    Method for thin film thermoelectric module fabrication
    9.
    发明授权
    Method for thin film thermoelectric module fabrication 有权
    薄膜热电模块制造方法

    公开(公告)号:US08216871B2

    公开(公告)日:2012-07-10

    申请号:US12898218

    申请日:2010-10-05

    IPC分类号: H01L21/00

    CPC分类号: H01L35/34 H01L35/08

    摘要: Methods of fabrication of a thermoelectric module from thin film thermoelectric material are disclosed. In general, a thin film thermoelectric module is fabricated by first forming an N-type thin film thermoelectric material layer and one or more metallization layers on a substrate. The one or more metallization layers and the N-type thin film thermoelectric material layer are etched to form a number of N-type thermoelectric material legs. A first electrode assembly is then bonded to a first portion of the N-type thermoelectric material legs, and the first electrode assembly including the first portion of the N-type thermoelectric material legs is removed from the substrate. In a similar manner, a second electrode assembly is bonded to a first portion of a number of P-type thermoelectric material legs. The first and second electrode assemblies are then bonded using a flip-chip bonding process to complete the fabrication of the thermoelectric module.

    摘要翻译: 公开了从薄膜热电材料制造热电模块的方法。 通常,通过在衬底上首先形成N型薄膜热电材料层和一个或多个金属化层来制造薄膜热电模块。 蚀刻一个或多个金属化层和N型薄膜热电材料层以形成多个N型热电材料支脚。 然后将第一电极组件接合到N型热电材料支脚的第一部分,并且包括N型热电材料支脚的第一部分的第一电极组件从基板移除。 以类似的方式,第二电极组件结合到多个P型热电材料支脚的第一部分。 然后使用倒装芯片接合工艺来接合第一和第二电极组件,以完成热电模块的制造。

    THERMOELECTRIC MATERIALS
    10.
    发明申请
    THERMOELECTRIC MATERIALS 有权
    热电材料

    公开(公告)号:US20120055528A1

    公开(公告)日:2012-03-08

    申请号:US12748531

    申请日:2010-03-29

    IPC分类号: H01L35/16 H01L35/00

    摘要: A thermoelectric material having a high ZT value is provided. In general, the thermoelectric material is a thin film thermoelectric material that includes a heterostructure formed of IV-VI semiconductor materials, where the heterostructure includes at least one potential barrier layer. In one embodiment, the heterostructure is formed of IV-VI semiconductor materials and includes a first matrix material layer, a potential barrier material layer adjacent to the first matrix material layer and formed of a wide bandgap material, and a second matrix material layer that is adjacent the potential barrier material layer opposite the first matrix material layer. A thickness of the potential barrier layer is approximately equal to a mean free path distance for charge carriers at a desired temperature.

    摘要翻译: 提供具有高ZT值的热电材料。 通常,热电材料是包括由IV-VI半导体材料形成的异质结构的薄膜热电材料,其中异质结构包括至少一个势垒层。 在一个实施例中,异质结构由IV-VI半导体材料形成,并且包括第一基体材料层,与第一基质材料层相邻并由宽带隙材料形成的势垒材料层,以及第二基质材料层, 邻近与第一基质材料层相对的势垒材料层。 势垒层的厚度近似等于在期望温度下载流子的平均自由程距离。