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公开(公告)号：US20150353298A1
公开(公告)日：2015-12-10
申请号：US14831423
申请日：2015-08-20
Applicant: Owen Potter
Inventor： Owen Potter
CPC classification number: B65G53/66 , B01J8/0015 , B01J8/005 , B01J8/08 , B01J2208/00088 , B01J2208/00548 , B01J2208/0084 , B65G53/16 , F26B3/0923 , F26B17/10 , F26B17/101 , F26B17/104 , F26B21/003 , F28C3/12 , F28D19/02
Abstract: A gas-particle processing method comprising: introducing gas into a chamber through a gas inlet; flowing the gas through the chamber from the gas inlet to the gas outlet at a first controlled mass flowrate; introducing at least one particle stream into the chamber through one or more particle inlets of the chamber at a second controlled mass flowrate; flowing each particle stream through a respective processing region in the chamber; and controlling the first and/or second mass flowrates, such that the gas-particle mixture porosity in a substantial portion of each processing region is 0.900-0.995.
Abstract translation: 一种气体颗粒处理方法，包括：通过气体入口将气体引入室; 使气体以气体入口流过气体，以第一受控质量流量流过气体出口; 通过所述室的一个或多个颗粒入口以第二受控质量流量将至少一个颗粒物流引入所述室; 使每个颗粒流流过腔室中的相应处理区域; 并且控制第一和/或第二质量流量，使得每个处理区域的大部分中的气体 - 微粒混合物孔隙率为0.900-0.995。
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公开(公告)号：US09670012B2
公开(公告)日：2017-06-06
申请号：US14831423
申请日：2015-08-20
Applicant: Owen Potter
Inventor： Owen Potter
IPC: F26B3/08 , B65G53/66 , B65G53/16 , F26B17/10 , F26B21/00 , B01J8/08 , B01J8/00 , F28C3/12 , F28D19/02 , F26B3/092
CPC classification number: B65G53/66 , B01J8/0015 , B01J8/005 , B01J8/08 , B01J2208/00088 , B01J2208/00548 , B01J2208/0084 , B65G53/16 , F26B3/0923 , F26B17/10 , F26B17/101 , F26B17/104 , F26B21/003 , F28C3/12 , F28D19/02
Abstract: A gas-particle processing method comprising: introducing gas into a chamber through a gas inlet; flowing the gas through the chamber from the gas inlet to the gas outlet at a first controlled mass flowrate; introducing at least one particle stream into the chamber through one or more particle inlets of the chamber at a second controlled mass flowrate; flowing each particle stream through a respective processing region in the chamber; and controlling the first and/or second mass flowrates, such that the gas-particle mixture porosity in a substantial portion of each processing region is 0.900-0.995.
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公开(公告)号：US20130283636A1
公开(公告)日：2013-10-31
申请号：US13989721
申请日：2011-11-25
Applicant: Owen Potter
Inventor： Owen Potter
CPC classification number: B65G53/66 , B01J8/0015 , B01J8/005 , B01J8/08 , B01J2208/00088 , B01J2208/00548 , B01J2208/0084 , B65G53/16 , F26B3/0923 , F26B17/10 , F26B17/101 , F26B17/104 , F26B21/003 , F28C3/12 , F28D19/02
Abstract: A gas-particle processor comprising: a chamber having a gas inlet, a gas outlet and one or more particle inlets; a gas flow arrangement operable to flow gas through the chamber from the gas inlet to the gas outlet at a first controlled mass flow-rate; and a particle flow arrangement operable to introduce particles in one or more streams into the chamber at a second controlled mass flow-rate, each particle stream flowing through respective processing regions in the chamber, wherein the processor is operable to control the first and/or second controlled mass flow-rates to provide a gas-particle mixture porosity in a substantial portion of each processing region of 0.900-0.995.
Abstract translation: 一种气体颗粒处理器，包括：具有气体入口，气体出口和一个或多个颗粒入口的室; 气流装置，其可操作以以第一受控质量流量将气体从所述气体入口流到所述气体出口; 以及可操作以将颗粒以一个或多个流以第二受控质量流量引入所述室的颗粒流布置，每个颗粒流流过所述室中的相应处理区域，其中所述处理器可操作以控制所述第一和/ 第二受控质量流量以在0.900-0.995的每个处理区域的大部分中提供气体 - 微粒混合物孔隙率。
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公开(公告)号：US09146055B2
公开(公告)日：2015-09-29
申请号：US13989721
申请日：2011-11-25
Applicant: Owen Potter
Inventor： Owen Potter
CPC classification number: B65G53/66 , B01J8/0015 , B01J8/005 , B01J8/08 , B01J2208/00088 , B01J2208/00548 , B01J2208/0084 , B65G53/16 , F26B3/0923 , F26B17/10 , F26B17/101 , F26B17/104 , F26B21/003 , F28C3/12 , F28D19/02
Abstract: A gas-particle processor comprising: a chamber having a gas inlet, a gas outlet and one or more particle inlets; a gas flow arrangement operable to flow gas through the chamber from the gas inlet to the gas outlet at a first controlled mass flow-rate; and a particle flow arrangement operable to introduce particles in one or more streams into the chamber at a second controlled mass flow-rate, each particle stream flowing through respective processing regions in the chamber, wherein the processor is operable to control the first and/or second controlled mass flow-rates to provide a gas-particle mixture porosity in a substantial portion of each processing region of 0.900-0.995.
Abstract translation: 一种气体颗粒处理器，包括：具有气体入口，气体出口和一个或多个颗粒入口的室; 气流装置，其可操作以以第一受控质量流量将气体从所述气体入口流到所述气体出口; 以及可操作以将颗粒以一个或多个流以第二受控质量流量引入所述室的颗粒流布置，每个颗粒流流过所述室中的相应处理区域，其中所述处理器可操作以控制所述第一和/ 第二受控质量流量以在0.900-0.995的每个处理区域的大部分中提供气体 - 微粒混合物孔隙率。
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