公开(公告)号：US08549317B2

公开(公告)日：2013-10-01

申请号：US11489462

申请日：2006-07-20

Applicant: Osamu Funayama

Inventor： Osamu Funayama

IPC: G06F21/00 ,  G06F17/00 ,  H04L29/06

CPC classification number: G06F21/32 ,  G06F21/31

Abstract: When only a fingerprint authentication approach is set, it is displayed that only authentication by the fingerprint authentication approach is accepted, and authentication by the fingerprint authentication approach is performed. Meanwhile, at least a system administrator is enabled to perform authentication by a password authentication approach.

Abstract translation: 当仅设置指纹验证方法时，显示仅接受通过指纹验证方法的认证，并且通过指纹验证方法进行认证。 同时，至少能够通过密码认证方式来进行认证。

公开(公告)号：US20070239980A1

公开(公告)日：2007-10-11

申请号：US11489462

申请日：2006-07-20

Applicant: Osamu Funayama

Inventor： Osamu Funayama

IPC: H04L9/00

CPC classification number: G06F21/32 ,  G06F21/31

Abstract: When only a fingerprint authentication approach is set, it is displayed that only authentication by the fingerprint authentication approach is accepted, and authentication by the fingerprint authentication approach is performed. Meanwhile, at least a system administrator is enabled to perform authentication by a password authentication approach.

Abstract translation: 当仅设置指纹验证方法时，显示仅接受通过指纹验证方法的认证，并且通过指纹验证方法进行认证。 同时，至少能够通过密码认证方式来进行认证。

公开(公告)号：US5145812A

公开(公告)日：1992-09-08

申请号：US747488

申请日：1991-08-19

Applicant: Mikiro Arai ,  Osamu Funayama ,  Hayato Nishii ,  Tamio Ishiyama ,  Hiroshi Kaya ,  Takeshi Isoda ,  Kouichi Yasuda ,  Atsuro Takazawa ,  Tadashi Suzuki ,  Ichiro Kohshi ,  Masaaki Ichiyama ,  Tomohiro Kato

Inventor： Mikiro Arai ,  Osamu Funayama ,  Hayato Nishii ,  Tamio Ishiyama ,  Hiroshi Kaya ,  Takeshi Isoda ,  Kouichi Yasuda ,  Atsuro Takazawa ,  Tadashi Suzuki ,  Ichiro Kohshi ,  Masaaki Ichiyama ,  Tomohiro Kato

IPC: C04B35/589 ,  C04B35/593 ,  C08G79/00

CPC classification number: C04B35/589 ,  C04B35/593 ,  C08G79/00

Abstract: A molded body formed of a silicon nitride-based ceramic containing Si and N and optionally O, C and/or a metal. The ceramic is formed from a polysilazane. A molded body may be a composite body which is composed of a matrix of the ceramic and a reinforcing material such as powder or fiber embedded within the matrix or which is composed of ceramic powder bound with a binder formed of the silicon nitride-based ceramic.

Abstract translation: 由含有Si和N以及任选的O，C和/或金属的氮化硅基陶瓷形成的成型体。 陶瓷由聚硅氮烷形成。 成型体可以是由陶瓷基体和嵌入基体内的粉末或纤维等增强材料构成的复合体，或由与氮化硅系陶瓷形成的粘合剂结合的陶瓷粉末构成的复合体。

公开(公告)号：US5079323A

公开(公告)日：1992-01-07

申请号：US555067

申请日：1990-07-18

Applicant: Osamu Funayama ,  Mikiro Arai ,  Hayato Nishii ,  Takeshi Isoda

Inventor： Osamu Funayama ,  Mikiro Arai ,  Hayato Nishii ,  Takeshi Isoda

IPC: D01F9/10 ,  C04B35/589 ,  C08G77/48 ,  C08G77/54

CPC classification number: C04B35/589 ,  C08G77/54

Abstract: Novel polysiloxazanes comprising --SiH.sub.2).sub.n NH] and --SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).

公开(公告)号：US4975512A

公开(公告)日：1990-12-04

申请号：US230422

申请日：1988-08-10

Applicant: Osamu Funayama ,  Mikiro Arai ,  Takeshi Isoda

Inventor： Osamu Funayama ,  Mikiro Arai ,  Takeshi Isoda

IPC: C04B35/589 ,  C08G77/62

CPC classification number: C04B35/589 ,  C08G77/62

Abstract: A novel, reformed polysilazane obtained by reacting a polysilazane with a compound selected from ammonia, primary and secondary amines, hydrazine and mono-, di- and tri-substituted hydrazines to cross-link the polysilazane with the compound serving as a cross-linking agent or to link the compound to the polysilazane.

公开(公告)号：US4869858A

公开(公告)日：1989-09-26

申请号：US13680

申请日：1987-02-12

Applicant: Osamu Funayama ,  Mikiro Arai ,  Hayato Nishii ,  Takeshi Isoda

Inventor： Osamu Funayama ,  Mikiro Arai ,  Hayato Nishii ,  Takeshi Isoda

IPC: D01F9/10 ,  C04B35/589 ,  C08G77/48 ,  C08G77/54

CPC classification number: C04B35/589 ,  C08G77/54

Abstract: Novel polysiloxazanes comprising [(SiH.sub.2).sub.n NH] and [(SiH.sub.2).sub.m O] as the main repeating units are provided. The polysiloxazanes are produced by reacting a dihalosilane or an adduct thereof with a Lewis base, with ammonia and water vapor or oxygen. From the polysiloxazane, novel silicon oxynitride shapes can be produced and the silicon oxynitride shapes are essentially composed of silicon, nitride (5 mol % or more) and oxygen (5 mol % or more).

Abstract translation: 提供了包含[（SiH 2）nNH]和[（SiH 2）m O]作为主要重复单元的新型聚硅氧氮烷。 聚硅氧烷是通过使二氯硅烷或其加合物与路易斯碱反应，与氨和水蒸汽或氧气反应制备的。 从聚硅氮烷可以制造新的氮氧化硅形状，氮氧化硅形状主要由硅，氮化物（5摩尔％以上）和氧（5摩尔％以上）组成。

公开(公告)号：US4861569A

公开(公告)日：1989-08-29

申请号：US230421

申请日：1988-08-10

Applicant: Osamu Funayama ,  Mikiro Arai ,  Takeshi Isoda

Inventor： Osamu Funayama ,  Mikiro Arai ,  Takeshi Isoda

IPC: C08G77/62

CPC classification number: C08G77/62

Abstract: A novel, reformed, inorganic polysilazane which is liquid or solid at room temperature and soluble in o-xylene at room temperature and which has (a) a number-average molecular weight of 200-500,000, (b) contents of Si, N and H of 50-70% by weight, 20-34% by weight and 5-9% by weight, respectively; and (c) --SiH.sub.2 -- and --SiH.sub.3 groups, the molar ratio of the --SiH.sub.2 -- groups to the --SiH.sub.3 groups being 2.0:1 to 8.4:1. The reformed polysilazane is obtained by reaction of a solution of a polysilazane in an organic base-containing solvent to polycondense the polysilazane.

公开(公告)号：US20050279255A1

公开(公告)日：2005-12-22

申请号：US10533428

申请日：2003-10-21

Applicant: Tadashi Suzuki ,  Osamu Funayama ,  Andreas Dierdorf ,  Hubert Liebe

Inventor： Tadashi Suzuki ,  Osamu Funayama ,  Andreas Dierdorf ,  Hubert Liebe

IPC: A61K6/087 ,  A61K6/093 ,  C04B41/49 ,  C04B41/50 ,  C04B41/87 ,  C08K3/00 ,  C08K5/00 ,  C09D183/16

CPC classification number: C04B41/009 ,  C04B41/5035 ,  C04B41/87 ,  C08G77/62 ,  C09D183/16 ,  C04B41/4554 ,  C04B33/00 ,  C04B14/308 ,  C08K5/098 ,  C08K5/3445

Abstract: A coating solution comprising 0.1 to 35% by weight of an inorganic or organic polysilazane having repeating units represented by the general formula below and soluble in a solvent and 0.1 to 10% by weight of catalyst such as 4,4′-trimethylenebis(1-methylpiperidine) based on a pure polysilazane content. By applying the coating solution onto the surface of base materials such as metals, plastics, glass, ceramic, wood, cement, mortar, bricks, etc., a silica coating strongly adhered to the base materials can be formed excellent in corrosion resistance and anti-scratch properties and simultaneously excellent in characteristics such as abrasion resistant, long-lasting anti-fouling properties, wetting properties to water, sealing properties, chemical resistance, oxidation resistance, physical barrier effect, heat resistance, fire resistance and antistatic properties.

Abstract translation: 包含0.1至35重量％的具有由以下通式表示的并且可溶于溶剂的重复单元的无机或有机聚硅氮烷和0.1至10重量％的催化剂如4,4'-三亚甲基双（1- 基于纯聚硅氮烷含量的甲基哌啶）。 通过将涂布溶液涂布在诸如金属，塑料，玻璃，陶瓷，木材，水泥，砂浆，砖等基材的表面上，可以形成强烈粘合到基材上的二氧化硅涂层，其耐腐蚀性和抗反射性优异 同时优异的耐磨性，持久的防污性能，对水的润湿性能，密封性能，耐化学性，抗氧化性，物理屏障效应，耐热性，耐火性和抗静电性等特性。

公开(公告)号：US06310168B1

公开(公告)日：2001-10-30

申请号：US09485174

申请日：2000-02-07

Applicant: Yasuo Shimizu ,  Tomoko Aoki ,  Osamu Funayama

Inventor： Yasuo Shimizu ,  Tomoko Aoki ,  Osamu Funayama

IPC: C08G7762

CPC classification number: C08G77/62 ,  C08G77/54

Abstract: An amine residue-containing polysilazane having a number average molecular weight of 100-100,000 and having a molecular chain containing a silazane structure represented by the general formula (I) shown below and/or a silazane structure represented by the general formula (II) shown below: wherein R1 and R2 each stand for hydrogen, a hydrocarbyl group or a hydrocarbyl group-containing silyl group, A and A2 each stand for a divalent hydrocarbyl group, B stands for an N-hydrocarbyl group-substituted amine residue or a cyclic amine residue, B2 stands for a divalent linear amine residue or a divalent cyclic amine residue and p, r and q are each 0 or 1. The above polysilazane may be obtained by reacting a polysilazane with a mono- and/or dihydroxyl compound having an amine residue in an inert organic solvent containing no active hydrogen.

Abstract translation: 具有数均分子量为100〜1000000，含有下述通式（I）所示的硅氮烷结构的分子链和/或由通式（II）表示的硅氮烷结构的含胺残基的聚硅氮烷 其中R1和R2各自表示氢，烃基或含烃基的甲硅烷基，A和A2各自表示二价烃基，B表示N-烃基取代的胺残基或环状胺 残基，B2表示二价线性胺残基或二价环状胺残基，p，r和q各自为0或1.上述聚硅氮烷可以通过使聚硅氮烷与具有胺的单和/或二羟基化合物 残余物在不含活性氢的惰性有机溶剂中。

公开(公告)号：US6011167A

公开(公告)日：2000-01-04

申请号：US125874

申请日：1998-08-26

Applicant: Yuuji Tashiro ,  Osamu Funayama

Inventor： Yuuji Tashiro ,  Osamu Funayama

IPC: C04B35/589 ,  C08G77/54 ,  C08G77/62 ,  C07F7/02 ,  C07F7/10 ,  C07F7/18

CPC classification number: C08G77/62 ,  C04B35/589 ,  C08G77/54

Abstract: Polyorganosiloxazane is provided which is capable of being converted into a ceramic material having low dielectric constant. The polymer according to the present invention is characterized by comprising the main repeating units of --(RSiN.sub.3)--, --(RSiN.sub.2 O)--, --(RSiNO.sub.2)-- and --(RSiO.sub.3)--, wherein, R represents an alkyl, alkenyl, cycloalkyl, aryl, alkylamino or alkylsilyl group, and by having a number-average molecular weight ranging from 300 to 100,000. The polyorganosiloxazane of the present invention has superior thermal resistance, and a ceramic material obtainable by firing the same at a predetermined temperature shows very low specific dielectric constant of 2.7 or less, making it useful particularly as a material in electronics.

Abstract translation: PCT No.PCT / JP97 / 04900 Sec。 371日期：1998年8月26日 102（e）1998年8月26日PCT 1997年12月26日PCT公布。 第WO98 / 29475号公报 日期1998年7月9日提供能够转化为具有低介电常数的陶瓷材料的聚有机硅氧烷。 根据本发明的聚合物的特征在于包含 - （RSiN 3） - ， - （RSiN 2 O） - ， - （RSiNO 2） - 和 - （RSiO 3） - 的主要重复单元，其中R表示烷基，烯基，环烷基 ，芳基，烷基氨基或烷基甲硅烷基，数均分子量为300〜100000。 本发明的聚有机硅氮烷具有优异的耐热性，并且通过在预定温度下烧制可获得的陶瓷材料显示出非常低的比介电常数为2.7或更小，使其特别用作电子学中的材料。