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1.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权化学敏感性或辐射敏感性树脂组合物和使用其的图案形成方法公开(公告)号：US20120015302A1
公开(公告)日：2012-01-19
申请号：US13260777
申请日：2010-03-26
申请人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
发明人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译： 光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物，其中（B）当以光化射线或辐射照射时能够产生酸的化合物的含量为10〜30质量％ 基于光化射线敏感性或辐射敏感性树脂组合物的全部固体含量，并且图案形成方法使用该组合物。
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2.发明授权Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device 有权光敏感或辐射敏感性树脂组合物，抗蚀剂膜和图案形成方法各自使用组合物，电子器件的制备方法和电子器件公开(公告)号：US08841060B2
公开(公告)日：2014-09-23
申请号：US13537843
申请日：2012-06-29
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0397 , G03F7/11 , Y10S430/106 , Y10S430/114 , Y10S430/128 , Y10T428/24802
摘要： An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.
摘要翻译： 能够改善线边缘粗糙度（LER）并抑制图案塌陷的光化射线敏感性或辐射敏感性树脂组合物，抗蚀剂膜和各自使用它们的图案形成方法，制备电子器件的方法和 提供电子设备。 光化射线敏感性或辐射敏感性树脂组合物含有：（A）具有由以下通式（I-1）至（I-3）中任一个表示的结构的重复单元的树脂和含 选自内酯结构，磺内酯结构和氰基中的至少一种; 和（B）通过用光化射线或辐射照射产生酸的化合物。
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3.发明申请ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME 审中-公开化学敏感性或辐射敏感性树脂组合物，耐腐蚀性膜和使用其的图案形成方法公开(公告)号：US20120164573A1
公开(公告)日：2012-06-28
申请号：US13323179
申请日：2011-12-12
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , G03F7/2041
摘要： An actinic-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent critical dimension uniformity (CDU) in the line width, and a pattern forming method using the same are provided.The actinic-ray-sensitive or radiation-sensitive resin composition of the present invention includes (A) a resin containing a repeating unit having a specific lactone structure and a repeating unit having a specific monocyclic alicyclic structure, which increases a solubility in an alkaline developer by the action of an acid, and (B) a compound having a specific structure, which generates an acid upon irradiation with an actinic-ray or a radiation.
摘要翻译： 提供能够形成在线宽度上具有优异临界尺寸均匀性（CDU）的图案的光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法。 本发明的光化射线敏感性或辐射敏感性树脂组合物包括（A）含有具有特定内酯结构的重复单元的树脂和具有特定单环脂肪结构的重复单元，其增加了在碱性显影剂中的溶解度 通过酸的作用，和（B）具有特定结构的化合物，其在用光化射线或辐射照射时产生酸。
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4.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME 审中-公开丙烯酸类敏感性或辐射敏感性树脂组合物，耐蚀膜和使用其的图案形成方法公开(公告)号：US20120129100A1
公开(公告)日：2012-05-24
申请号：US13388404
申请日：2010-08-17
申请人： Akinori Shibuya , Shuhei Yamaguchi , Shohei Kataoka , Michihiro Shirakawa , Takayuki Kato , Naohiro Tango
发明人： Akinori Shibuya , Shuhei Yamaguchi , Shohei Kataoka , Michihiro Shirakawa , Takayuki Kato , Naohiro Tango
IPC分类号： G03F7/20 , C07D409/12 , C07D409/14 , G03F7/027
CPC分类号： C08F20/10 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： An actinic ray-sensitive or radiation-sensitive resin composition including: (PA) a compound having a proton acceptor functional group and undergoing decomposition upon irradiation with an actinic ray or radiation to generate a compound reduced in or deprived of proton acceptor property or changed to be acidic from being proton acceptor-functioning, wherein a molar extinction coefficient ε of the compound (PA) at a wavelength of 193 nm as measured in acetonitrile solvent is 55,000 or less, and a pattern forming method using the composition are provided.
摘要翻译： 一种光化射线敏感性或辐射敏感性树脂组合物，其包含：（PA）具有质子受体官能团的化合物，并且在用光化射线或辐射照射时经历分解以产生还原或剥夺质子受体性质的化合物或改变为 由质子受体功能呈酸性，其中摩尔消光系数＆egr; 的化合物（PA）在乙腈溶剂中测定的波长为193nm的化合物（PA）为55,000以下，使用该组合物的图案形成方法。
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5.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same composition 有权光敏性或辐射敏感性树脂组合物，以及使用相同组成的光化射线敏感或辐射敏感膜和图案形成方法公开(公告)号：US08846293B2
公开(公告)日：2014-09-30
申请号：US13431736
申请日：2012-03-27
申请人： Yusuke Iizuka , Akinori Shibuya , Naohiro Tango , Shohei Kataoka
发明人： Yusuke Iizuka , Akinori Shibuya , Naohiro Tango , Shohei Kataoka
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a logP value of not less than 0 and less than 2.8.
摘要翻译： 本发明的光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，（C）选自化合物组中的至少一种 由下式（ZI-3），（ZI-4）或（ZI-5）表示，并且能够在光化射线或辐射照射时产生酸，其中树脂（A）含有至少一个具有 能够通过酸的作用分解离开具有环结构的离去基团的基团，具有环结构的离去基团具有作为取代基的极性基团和作为环结构的一部分的极性原子中的至少一种 ，衍生自具有环结构的离去基团的化合物的logP值不小于0且小于2.8。
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6.发明授权Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法公开(公告)号：US08846290B2
公开(公告)日：2014-09-30
申请号：US13260777
申请日：2010-03-26
申请人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
发明人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
IPC分类号： G03F7/027 , C08F220/18
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译： 光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物，其中（B）当以光化射线或辐射照射时能够产生酸的化合物的含量为10〜30质量％ 基于光化射线敏感性或辐射敏感性树脂组合物的全部固体含量，并且图案形成方法使用该组合物。
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7.发明申请ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 有权使用该组合物的抗紫外线敏感性或辐射敏感性树脂组合物，耐蚀膜和图案形成方法，制备电子器件的方法和电子器件公开(公告)号：US20130004740A1
公开(公告)日：2013-01-03
申请号：US13537843
申请日：2012-06-29
CPC分类号： G03F7/2041 , G03F7/0045 , G03F7/0397 , G03F7/11 , Y10S430/106 , Y10S430/114 , Y10S430/128 , Y10T428/24802
摘要： An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.
摘要翻译： 能够改善线边缘粗糙度（LER）并抑制图案塌陷的光化射线敏感性或辐射敏感性树脂组合物，抗蚀剂膜和各自使用它们的图案形成方法，制备电子器件的方法和 提供电子设备。 光化射线敏感性或辐射敏感性树脂组合物含有：（A）具有由以下通式（I-1）至（I-3）中任一个表示的结构的重复单元的树脂和含有 选自内酯结构，磺内酯结构和氰基中的至少一种; 和（B）通过用光化射线或辐射照射产生酸的化合物。
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8.发明申请ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION 有权丙烯酸类敏感性或辐射敏感性树脂组合物，以及使用相同组成的丙烯酸类敏感或辐射敏感性膜和图案形成方法公开(公告)号：US20120251948A1
公开(公告)日：2012-10-04
申请号：US13431736
申请日：2012-03-27
申请人： Yusuke IIZUKA , Akinori SHIBUYA , Naohiro TANGO , Shohei KATAOKA
发明人： Yusuke IIZUKA , Akinori SHIBUYA , Naohiro TANGO , Shohei KATAOKA
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/0758 , G03F7/2041 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a log P value of not less than 0 and less than 2.8.
摘要翻译： 本发明的光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，（C）选自化合物组中的至少一种 由下式（ZI-3），（ZI-4）或（ZI-5）表示，并且能够在光化射线或辐射照射时产生酸，其中树脂（A）含有至少一个具有 能够通过酸的作用分解离开具有环结构的离去基团的基团，具有环结构的离去基团具有作为取代基的极性基团和作为环结构的一部分的极性原子中的至少一种 ，并且衍生自具有环结构的离去基团的化合物的log P值不小于0且小于2.8。
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