INDUCTOR DESIGN WITH METAL DUMMY FEATURES
    1.
    发明申请
    INDUCTOR DESIGN WITH METAL DUMMY FEATURES 有权
    具有金属特征的电感器设计

    公开(公告)号:US20140197916A1

    公开(公告)日:2014-07-17

    申请号:US13976080

    申请日:2011-12-29

    IPC分类号: H01F27/28 H01F41/04

    摘要: Techniques are disclosed for enhancing performance of integrated or on-chip inductors by implementing a schema of conductive metal dummies in the design thereof. In some cases, a metal dummy schema may be disposed in a layer proximate an upper surface of the inductor. The techniques may be implemented to improve overall inductor performance while enabling area scaling effects such as shrinking of inductor-to-inductor spacing on a die and/or increasing the quantity of inductors that may be manufactured on a die. In some cases, conductive metal dummies may be disposed in a region of minimal or non-peak magnetic field relative to the inductor, orthogonal to current flow in the inductor, and/or so as to minimize their occupation of the overall area of the inductor. The techniques may be implemented in analog circuits such as inductor-capacitor phase-locked loops (LC-PLLs), high-volume architectures, processor microarchitectures, applications involving stringent jitter requirements, microprocessor clocking, and wireless communication systems.

    摘要翻译: 公开了通过在其设计中实现导电金属假人的图案来提高集成或片上电感器的性能的技术。 在一些情况下,金属虚拟模式可以设置在靠近电感器的上表面的层中。 可以实施这些技术以改善总体电感器性能,同时实现区域缩放效应,例如在管芯上的电感器 - 电感器间隔的缩小和/或增加可在模具上制造的电感器的数量。 在一些情况下,导电金属假模可以设置在相对于电感器的最小或非峰值磁场的区域中,与电感器中的电流正交,和/或以使其对电感器的整个面积的占用最小化 。 这些技术可以在诸如电感器 - 电容器锁相环(LC-PLL),大容量架构,处理器微体系结构,涉及严格抖动要求的应用,微处理器时钟和无线通信系统的模拟电路中实现。

    Inductor design with metal dummy features
    2.
    发明授权
    Inductor design with metal dummy features 有权
    具有金属虚拟特征的电感器设计

    公开(公告)号:US09418783B2

    公开(公告)日:2016-08-16

    申请号:US13976080

    申请日:2011-12-29

    摘要: Techniques are disclosed for enhancing performance of integrated or on-chip inductors by implementing a schema of conductive metal dummies in the design thereof. In some cases, a metal dummy schema may be disposed in a layer proximate an upper surface of the inductor. The techniques may be implemented to improve overall inductor performance while enabling area scaling effects such as shrinking of inductor-to-inductor spacing on a die and/or increasing the quantity of inductors that may be manufactured on a die. In some cases, conductive metal dummies may be disposed in a region of minimal or non-peak magnetic field relative to the inductor, orthogonal to current flow in the inductor, and/or so as to minimize their occupation of the overall area of the inductor. The techniques may be implemented in analog circuits such as inductor-capacitor phase-locked loops (LC-PLLs), high-volume architectures, processor microarchitectures, applications involving stringent jitter requirements, microprocessor clocking, and wireless communication systems.

    摘要翻译: 公开了通过在其设计中实现导电金属假人的图案来提高集成或片上电感器的性能的技术。 在一些情况下,金属虚拟模式可以设置在靠近电感器的上表面的层中。 可以实施这些技术以改善总体电感器性能,同时实现区域缩放效应,例如在管芯上的电感器 - 电感器间隔的缩小和/或增加可在模具上制造的电感器的数量。 在一些情况下,导电金属假模可以设置在相对于电感器的最小或非峰值磁场的区域中,与电感器中的电流正交,和/或以使其对电感器的整个面积的占用最小化 。 这些技术可以在诸如电感器 - 电容器锁相环(LC-PLL),大容量架构,处理器微体系结构,涉及严格抖动要求的应用,微处理器时钟和无线通信系统的模拟电路中实现。