公开(公告)号：US08377211B2

公开(公告)日：2013-02-19

申请号：US12309533

申请日：2007-02-01

Applicant: Masatomo Sumiya ,  Mikk Lippmaa ,  Tsuyoshi Ohnishi ,  Eiji Fujimoto ,  Hideomi Koinuma

Inventor： Masatomo Sumiya ,  Mikk Lippmaa ,  Tsuyoshi Ohnishi ,  Eiji Fujimoto ,  Hideomi Koinuma

IPC: C23C16/00

CPC classification number: C23C16/481

Abstract: Disclosed is a device for vacuum processing that performs vapor-deposition on a substrate being heated in a vacuum chamber; the device, wherein the chamber has a light transmissible window formed in a section of the chamber; the light transmissible window and a holding part holding the substrate are connected by a linear space isolated from other parts in the chamber; a laser emitter is installed outside the light transmissible window; and the laser emitter emits a laser beam to the substrate through the linear space, thereby heating the substrate. This device enables laser heating, eliminating conventional drawbacks such as a decrease in laser output.

Abstract translation: 公开了一种真空处理装置，其在真空室内被加热的基板上进行气相沉积; 所述装置，其中所述室具有形成在所述室的一部分中的透光窗; 光透射窗和保持基板的保持部通过与室内的其他部分分离的直线空间连接; 激光发射器安装在透光窗外; 并且激光发射器通过线性空间向基板发射激光束，从而加热基板。 该装置能够激光加热，消除诸如激光输出减少的常规缺点。

公开(公告)号：US20100058987A1

公开(公告)日：2010-03-11

申请号：US12309533

申请日：2007-02-01

Applicant: Masatomo Sumiya ,  Mikk Lippmaa ,  Tsuyoshi Ohnishi ,  Eiji Fujimoto ,  Hideomi Koinuma

Inventor： Masatomo Sumiya ,  Mikk Lippmaa ,  Tsuyoshi Ohnishi ,  Eiji Fujimoto ,  Hideomi Koinuma

IPC: C23C16/54

CPC classification number: C23C16/481

Abstract: Disclosed is a device for vacuum processing that performs vapor-deposition on a substrate being heated in a vacuum chamber; the device, wherein the chamber has a light transmissible window formed in a section of the chamber; the light transmissible window and a holding part holding the substrate are connected by a linear space isolated from other parts in the chamber; a laser emitter is installed outside the light transmissible window; and the laser emitter emits a laser beam to the substrate through the linear space, thereby heating the substrate. This device enables laser heating, eliminating conventional drawbacks such as a decrease in laser output.

Abstract translation: 公开了一种真空处理装置，其在真空室内被加热的基板上进行气相沉积; 所述装置，其中所述室具有形成在所述室的一部分中的透光窗; 光透射窗和保持基板的保持部通过与室内的其他部分分离的直线空间连接; 激光发射器安装在透光窗外; 并且激光发射器通过线性空间向基板发射激光束，从而加热基板。 该装置能够激光加热，消除诸如激光输出减少的常规缺点。