公开(公告)号：US06768124B2

公开(公告)日：2004-07-27

申请号：US09828300

申请日：2001-04-06

申请人： Kazuaki Suzuki ,  Mikio Ushijima

发明人： Kazuaki Suzuki ,  Mikio Ushijima

IPC分类号： G03F900

CPC分类号： G03F7/70775 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7026 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/31794

摘要： Due to its lack of appreciable thickness, the reticle used in charged-particle-beam (CPB) microlithography is prone to bending and flexing, causing instability in reticle axial height position relative to the projection-lens system, with consequent errors in image focus, rotation and magnification. Apparatus and methods are disclosed for monitoring changes in axial height position of the reticle, to facilitate making compensatory changes. Representative apparatus include a device for detecting the axial height position of the reticle. The device produces one or more beams of light (IR to visible) to strike the reticle at an oblique angle of incidence, detects light reflected from the reticle surface, and detects lateral shifts of the reflected light as received by a height detector. Hence, reticle focus is detected easily and in real time. Multiple detection beams can be used, thereby allowing detection of both axial height position and inclination of the reticle with high accuracy. Reticle-position data can be used to regulate one or more parameters of exposure and/or axial position of the reticle or wafer.

摘要翻译： 由于其缺乏可观的厚度，用于带电粒子束（CPB）微光刻的掩模版易于弯曲和弯曲，导致相对于投影透镜系统的标线轴高度位置不稳定，导致图像聚焦的误差， 旋转和放大。 公开了用于监测标线的轴向高度位置变化的装置和方法，以便于进行补偿性变化。 代表性装置包括用于检测掩模版的轴向高度位置的装置。 该装置产生一个或多个光束（IR到可见）以倾斜的入射角撞击光罩，检测从标线片表面反射的光，并且检测由高度检测器接收的反射光的横向偏移。 因此，准确地检测到掩模版焦点。 可以使用多个检测光束，从而能够高精度地检测光罩的轴向高度位置和倾斜度。 标线片位置数据可用于调节掩模版或晶片的曝光和/或轴向位置的一个或多个参数。

公开(公告)号：US20110288674A1

公开(公告)日：2011-11-24

申请号：US13112719

申请日：2011-05-20

申请人： Isao Sugaya ,  Satoru Sanada ,  Hidehiro Maeda ,  Masahiro Yoshihashi ,  Mikio Ushijima

发明人： Isao Sugaya ,  Satoru Sanada ,  Hidehiro Maeda ,  Masahiro Yoshihashi ,  Mikio Ushijima

IPC分类号： G06F17/00 ,  B23Q7/00 ,  B23Q3/00

CPC分类号： H01L21/67092 ,  H01L21/67276 ,  H01L21/67294 ,  Y10T29/49998

摘要： Management of the holding member that holds the semiconductor substrate is efficiently implemented. Provided is a holding member management apparatus that manages a substrate holding member that holds a semiconductor substrate in a manufacturing apparatus that manufactures a stacked semiconductor apparatus by joining a plurality of semiconductor substrates; comprising a history storing part that stores the usage history of the substrate holding member in association with identification information that specifies the substrate holding member and a holding member specifying part that specifies and outputs identification information of the substrate holding member whose usage is to be suspended based on the usage history stored in the history storing part.

摘要翻译： 有效地实施保持半导体基板的保持构件的管理。 提供一种保持构件管理装置，其通过接合多个半导体衬底来管理在制造半导体装置的制造装置中保持半导体衬底的衬底保持构件; 包括历史存储部分，其与用于指定基板保持部件的识别信息相关联地存储基板保持部件的使用历史;以及保持部件指定部，其指定并输出其使用被暂停的基板保持部件的识别信息 关于存储在历史存储部分中的使用历史。