公开(公告)号：US06843264B2

公开(公告)日：2005-01-18

申请号：US10323377

申请日：2002-12-18

Applicant: Chih-Tien Chang ,  Hsueh-Chang Wu ,  Sunny Wu ,  Chien-Ling Huang ,  Chin-Hsin Peng ,  Mei-Seng Zhou

Inventor： Chih-Tien Chang ,  Hsueh-Chang Wu ,  Sunny Wu ,  Chien-Ling Huang ,  Chin-Hsin Peng ,  Mei-Seng Zhou

IPC: C23C16/44 ,  F16K11/10 ,  F16K1/18

CPC classification number: F16K1/223 ,  C23C16/4412 ,  Y10T137/0396 ,  Y10T137/86944 ,  Y10T137/87378 ,  Y10T137/87523

Abstract: A new and improved, multi-phase pressure control valve for facilitating quick and accurate attainment and stabilization of gas pressure inside a semiconductor fabrication process chamber such as an etch chamber or CVD chamber. In one embodiment, the multi-phase pressure control valve is a butterfly-type valve which includes outer and inner vanes that independently control flow of gases from a process chamber to a vacuum pump. The larger-diameter outer vane stabilizes gas pressures within a large range, whereas the inner vane stabilizes pressure within a smaller range. In another embodiment, the multi-phase pressure control valve is a gate-type valve which may include a pivoting outer vane and an inner vane slidably disposed with respect to the outer vane for exposing a central gas flow opening in the outer vane.

Abstract translation: 一种新的和改进的多相压力控制阀，用于促进半导体制造工艺室（例如蚀刻室或CVD室）内的气体压力的快速和准确的获得和稳定。 在一个实施例中，多相压力控制阀是蝶形阀，其包括独立地控制气体从处理室到真空泵的流动的外叶片和内叶片。 较大直径的外叶片将气体压力稳定在大范围内，而内叶片将压力稳定在较小的范围内。 在另一个实施例中，多相压力控制阀是门型阀，其可以包括枢转外叶片和相对于外叶片可滑动地设置的用于暴露外叶片中的中心气流开口的内叶片。