Tellurium imaging composition including improved reductant precursor and
method
    2.
    发明授权
    Tellurium imaging composition including improved reductant precursor and method 失效
    碲成像组合物包括改进的还原剂前体和方法

    公开(公告)号:US4698184A

    公开(公告)日:1987-10-06

    申请号:US732069

    申请日:1985-05-09

    CPC分类号: G03C1/734 C07C46/00 C07C50/32

    摘要: Imaging films and film-forming compositions are provided which include a reducible tellurium compound, a reductant precursor, a source of labile hydrogen incorporated in a matrix. The reductant precursors are of the formulae ##STR1## where Y.sub.1 is alkoxy, Y.sub.2 is chloro or alkoxy and Y.sub.3 is hydrogen, chloro or alkoxy.Methods are provided for synthesizing the reductant precursors.

    摘要翻译: 提供成像薄膜和成膜组合物,其包括可还原的碲化合物,还原剂前体,掺入基质中的不稳定的氢源。 还原剂前体具有下式:其中Y1是烷氧基,Y2是氯或烷氧基,Y3是氢,氯或烷氧基。 提供用于合成还原剂前体的方法。

    Reductant precursor for tellurium imaging compositions
    3.
    发明授权
    Reductant precursor for tellurium imaging compositions 失效
    碲成像组合物的还原前体

    公开(公告)号:US4532078A

    公开(公告)日:1985-07-30

    申请号:US599949

    申请日:1984-04-13

    CPC分类号: G03C1/734 C07C46/00

    摘要: Imaging films and film-forming compositions are provided which include a reducible tellurium compound, a reductant precursor, a source of labile hydrogen incorporated in a matrix. The reductant precursors are of the formulae ##STR1## where Y.sub.1 is alkoxy, Y.sub.2 is chloro or alkoxy and Y.sub.3 is hydrogen, chloro or alkoxy.Methods are provided for synthesizing the reductant precursors.

    摘要翻译: 提供成像薄膜和成膜组合物,其包括可还原的碲化合物,还原剂前体,掺入基质中的不稳定的氢源。 还原剂前体具有下式:其中Y1是烷氧基,Y2是氯或烷氧基,Y3是氢,氯或烷氧基。 提供用于合成还原剂前体的方法。

    Tellurium imaging composition including improved reductant precursor and
method
    4.
    发明授权
    Tellurium imaging composition including improved reductant precursor and method 失效
    碲成像组合物包括改进的还原剂前体和方法

    公开(公告)号:US4460678A

    公开(公告)日:1984-07-17

    申请号:US392586

    申请日:1982-06-28

    摘要: Imaging films and film-forming compositions are provided which include a reducible tellurium compound, a reductant precursor, a source of labile hydrogen incorporated in a matrix. The reductant precursors are of the formulae ##STR1## where Y.sub.1 is alkoxy, Y.sub.2 is chloro or alkoxy and Y.sub.3 is hydrogen, chloro or alkoxy.Methods are provided for synthesizing the reductant precursors.

    摘要翻译: 提供成像薄膜和成膜组合物,其包括可还原的碲化合物,还原剂前体,掺入基质中的不稳定的氢源。 还原剂前体具有下式:其中Y1是烷氧基,Y2是氯或烷氧基,Y3是氢,氯或烷氧基。 提供用于合成还原剂前体的方法。