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公开(公告)号：US08314362B2
公开(公告)日：2012-11-20
申请号：US12743628
申请日：2008-10-31
IPC分类号： B23K26/00
CPC分类号： B23K26/067 , B23K26/0676
摘要： A device for processing a workpiece using a plurality of parallel laser beams includes a focusing optical system displaceable in a direction of an axis of symmetry configured to focus each of the plurality of parallel laser beams onto a common focusing plane, and wherein the plurality of laser beams include a first and a second laser beam pair, each containing two laser beams equidistant from the axis of symmetry. The device further includes a reflector assembly having at least two reflectors each having a plurality of reflection surfaces displaceable relative to one another in a direction of the axis of symmetry.
摘要翻译： 用于使用多个平行激光束处理工件的装置包括聚焦光学系统，该聚焦光学系统可沿着对称轴的方向移动，被配置为将多个平行激光束中的每一个聚焦到共同的聚焦平面上，并且其中所述多个激光 光束包括第一和第二激光束对，每个激光束包含与对称轴等距的两束激光束。 该装置还包括具有至少两个反射器的反射器组件，每个反射器具有可在对称轴线的方向上相对于彼此移位的多个反射表面。
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公开(公告)号：US20100320178A1
公开(公告)日：2010-12-23
申请号：US12743628
申请日：2008-10-31
IPC分类号： B23K26/06
CPC分类号： B23K26/067 , B23K26/0676
摘要： A device for processing a workpiece using a plurality of parallel laser beams includes a focusing optical system displaceable in a direction of an axis of symmetry configured to focus each of the plurality of parallel laser beams onto a common focusing plane, and wherein the plurality of laser beams include a first and a second laser beam pair, each containing two laser beams equidistant from the axis of symmetry. The device further includes a reflector assembly having at least two reflectors each having a plurality of reflection surfaces displaceable relative to one another in a direction of the axis of symmetry.
摘要翻译： 用于使用多个平行激光束处理工件的装置包括聚焦光学系统，该聚焦光学系统可沿着对称轴的方向移动，被配置为将多个平行激光束中的每一个聚焦到共同的聚焦平面上，并且其中所述多个激光 光束包括第一和第二激光束对，每个激光束包含与对称轴等距的两束激光束。 该装置还包括具有至少两个反射器的反射器组件，每个反射器具有可在对称轴线的方向上相对于彼此移位的多个反射表面。
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