Method for cleaning a substrate
    2.
    发明授权
    Method for cleaning a substrate 有权
    清洗基材的方法

    公开(公告)号:US08080108B2

    公开(公告)日:2011-12-20

    申请号:US10586967

    申请日:2005-01-21

    IPC分类号: B08B6/00

    摘要: A method for the continuous vacuum cleaning of a substrate, characterized in that: a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter; using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; and at least one surface portion of the substrate is subjected to the plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on the surface portion.

    摘要翻译: 一种用于基材的连续真空清洁的方法,其特征在于:选择具有低溅射效率并且对于污染物质具有化学活性的物质; 使用至少一个线性离子源,从主要是具有低溅射效率的物质,特别是基于氧的物质的气体混合物产生等离子体; 并且基板的至少一个表面部分经受等离子体,使得所述离子化物质通过化学反应至少部分地消除可能吸附或位于表面部分上的污染物质。

    SUBSTRATE PROCESSING METHOD
    5.
    发明申请
    SUBSTRATE PROCESSING METHOD 审中-公开
    基板处理方法

    公开(公告)号:US20090011194A1

    公开(公告)日:2009-01-08

    申请号:US12090907

    申请日:2006-10-23

    摘要: Method for the treatment of at least one surface portion of at least one layer A located between a substrate and a layer B of a thin-film multilayer, the layers of which are vacuum-deposited on the substrate having a glass function, according to the invention, is characterized in that: at least one thin layer A is deposited on a surface portion of said substrate, this deposition phase being carried out by a vacuum deposition process; using at least one linear ion source, a plasma of ionized species is generated from a gas or from a gas mixture; at least one surface portion of the layer A is subjected to said plasma so that said ionized species at least partly modifies the surface state of the layer A; and at least one layer B is deposited on a surface portion of the layer A, this deposition phase being carried out by a vacuum deposition process.

    摘要翻译: 用于处理位于薄膜多层的基板和层B之间的至少一个层A的至少一个表面部分的方法,所述薄膜多层的层被真空沉积在具有玻璃功能的基板上,根据 本发明的特征在于:至少一层薄层A沉积在所述衬底的表面部分上,该沉积阶段通过真空沉积工艺进行; 使用至少一个线性离子源,从气体或气体混合物产生离子化物质的等离子体; 层A的至少一个表面部分经受所述等离子体,使得所述离子化物质至少部分地改变层A的表面状态; 并且至少一层B沉积在层A的表面部分上,该沉积阶段通过真空沉积工艺进行。

    Multiple Glazing With Improved Selectivity
    7.
    发明申请
    Multiple Glazing With Improved Selectivity 审中-公开
    多重玻璃具有改进的选择性

    公开(公告)号:US20080193686A1

    公开(公告)日:2008-08-14

    申请号:US11911057

    申请日:2006-04-06

    IPC分类号: E06B3/67

    摘要: The invention relates to laminated glazing intended to close a window opening and consisting of an external solid pane and an internal solid pane, which are joined together by means of an interlayer. A multilayer system partially transparent to visible radiation is placed on the inside of the laminated glazing. The laminated glazing according to the invention is characterized in that the panes are tinted and absorb some of the infrared radiation, and in that the multilayer system selectively reflects and/or absorbs the infrared radiation. The laminated glazing is particularly suitable for being used as side windows, tail gate or sunroof in vehicles or aircraft.

    摘要翻译: 本发明涉及用于封闭窗户开口并由外部固体窗格和内部固体窗格组成的层压玻璃窗,其通过中间层连接在一起。 对可见光辐射部分透明的多层体系被放置在层压玻璃的内侧。 根据本发明的层压玻璃的特征在于,所述窗玻璃被着色并吸收一些红外辐射,并且所述多层系统选择性地反射和/或吸收红外辐射。 层压玻璃特别适用于车辆或飞机中的侧窗,尾门或天窗。

    Method for cleaning a substrate
    8.
    发明申请
    Method for cleaning a substrate 有权
    清洗基材的方法

    公开(公告)号:US20070157668A1

    公开(公告)日:2007-07-12

    申请号:US10586967

    申请日:2005-01-21

    IPC分类号: C03C17/00 B32B3/00 B05D3/10

    摘要: Method for the continuous vacuum cleaning of a substrate, characterized in that: a species is chosen that has a low sputtering efficiency and is chemically active with regard to the soiling matter; using at least one linear ion source, a plasma is generated from a gas mixture comprising predominantly the species having a low sputtering efficiency, especially one based on oxygen; and at least one surface portion of said substrate is subjected to said plasma so that said ionized species at least partly eliminates, by chemical reaction, the soiling matter possibly adsorbed or located on said surface portion.

    摘要翻译: 用于基材的连续真空清洁的方法,其特征在于:选择具有低溅射效率并且在污染物质上具有化学活性的物质; 使用至少一个线性离子源,从主要是具有低溅射效率的物质,特别是基于氧的物质的气体混合物产生等离子体; 并且所述衬底的至少一个表面部分经受所述等离子体,使得所述离子化物质通过化学反应至少部分地消除可能吸附或位于所述表面部分上的污染物质。