METHODS AND APPARATUS FOR RADIO FREQUENCY (RF) PLASMA PROCESSING
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    发明申请
    METHODS AND APPARATUS FOR RADIO FREQUENCY (RF) PLASMA PROCESSING 审中-公开
    无线电频率(RF)等离子体处理的方法和装置

    公开(公告)号:US20120000888A1

    公开(公告)日:2012-01-05

    申请号:US13014807

    申请日:2011-01-27

    IPC分类号: H01L21/3065 H03H7/40

    摘要: Methods and apparatus for minimizing reflected radio frequency (RF) energy are provided herein. In some embodiments, an apparatus may include a first RF energy source having frequency tuning to provide a first RF energy, a first matching network coupled to the first RF energy source, one or more sensors to provide first data corresponding to a first magnitude and a first phase of a first impedance of the first RF energy, wherein the first magnitude is equal a first resistance defined as a first voltage divided by a first current and the first phase is equal to a first phase difference between the first voltage and the first current, and a controller adapted to control a first value of a first variable element of the first matching network based upon the first magnitude and to control a first frequency provided by the first RF energy source based upon the first phase.

    摘要翻译: 本文提供了用于最小化反射射频(RF)能量的方法和装置。 在一些实施例中,装置可以包括具有频率调谐以提供第一RF能量的第一RF能量源,耦合到第一RF能量源的第一匹配网络,一个或多个传感器,以提供对应于第一幅度的第一数据和 所述第一RF的能量的第一阻抗的第一相位,其中所述第一幅度等于被定义为第一电压除以第一电流的第一电阻,并且所述第一相位等于所述第一电压和所述第一电流之间的第一相位差 以及控制器,其适于基于所述第一量值来控制所述第一匹配网络的第一可变元件的第一值,并且基于所述第一阶段来控制由所述第一RF能量源提供的第一频率。