APPARATUS FOR MEASURING AND CALIBRATING ERROR OF WAFER PROBER
    1.
    发明申请
    APPARATUS FOR MEASURING AND CALIBRATING ERROR OF WAFER PROBER 有权
    用于测量和校准波浪探头误差的装置

    公开(公告)号:US20100166291A1

    公开(公告)日:2010-07-01

    申请号:US12664011

    申请日:2008-06-11

    申请人: Jong-Guk Lee

    发明人: Jong-Guk Lee

    IPC分类号: G06K9/62 G01R35/00 G06F19/00

    摘要: Provided is an error measurement and correction device of a stage of a wafer prober. The error measurement and correction device includes a jig member, a vision module, a central processing unit, and an interface unit. The jig member is disposed on a chuck on the stage, and the vision module is disposed on an upper plate of the wafer prober disposed at a position facing the jig member to enable the camera of the vision module to acquire images of the patterns of the jig member and transmits the acquired images to the central processing unit. The central processing unit acquires images of the patterns of the jig member disposed on the chuck by using the vision module to extract reference position information, moves the stage at a unit interval of the pattern, acquires images of the patterns of the jig member again to extract measured position information, and generates and stores mapping data by calculating difference between the measured position information and the reference position information. The central processing unit corrects the movement position information on the stage to be moved by using the mapping data when the stage is moved, so that irrespective of physical deterioration of the stage, the stage can be moved to an accurate position.

    摘要翻译: 提供了晶片探测器的阶段的误差测量和校正装置。 误差测量和校正装置包括夹具构件,视觉模块,中央处理单元和接口单元。 夹具构件设置在台架上的卡盘上,并且视觉模块设置在设置在面向夹具构件的位置处的晶片探测器的上板上,以使得视觉模块的照相机能够获取图像的图像 将所获取的图像发送到中央处理单元。 中央处理单元通过使用视觉模块获取配置在卡盘上的夹具构件的图案的图像,提取基准位置信息,以图案的单位间隔移动台,再次获取夹具构件的图案的图像, 提取测量位置信息,并通过计算测量位置信息和参考位置信息之间的差异来生成并存储映射数据。 当舞台移动时,中央处理单元通过使用映射数据校正要移动的舞台上的移动位置信息,因此,不论舞台的物理劣化如何,舞台可以移动到准确的位置。

    SHOE AND MANUFACTURING METHOD THEREOF
    2.
    发明申请
    SHOE AND MANUFACTURING METHOD THEREOF 审中-公开
    鞋及其制造方法

    公开(公告)号:US20140230271A1

    公开(公告)日:2014-08-21

    申请号:US14347716

    申请日:2012-09-26

    申请人: Jong-guk LEE

    IPC分类号: A43B13/28 A43B13/32

    CPC分类号: A43B13/28 A43B9/02 A43B13/32

    摘要: The present invention relates to a shoe and a manufacturing method thereof, wherein the invention comprises: a shoe upper; a bottom sole for blocking the lower part of the shoe upper; and a sole cover which is extended from the lower part of the upper of the shoe, and enhance the circumference of a sole, wherein an edge of the bottom sole and a lower edge of the sole cover are connected along a lower edge of the upper of the shoe by backstitching, the sole is attached to a lower side of the bottom sole, the sole cover is turned inside out to face the sole such that the sole cover is attached to enclose an outer surface and a lower edge of the sole, and a window is attached to a lower side of the sole including the end of the sole cover. According to the present invention, instead of the existing methods, a new method is performed to manufacture a shoe which has simple shoemaking steps, whereby time and effort for shoemaking can be reduced, and further, said shoe is light and has excellent sweat-absorbing power and high wearability, thereby minimizing fatigue of the feet.

    摘要翻译: 鞋及其制造方法技术领域本发明涉及一种鞋及其制造方法,其特征在于, 用于阻挡鞋面下部的底部鞋底; 以及从鞋的上部的下部延伸并且增强鞋底的圆周的鞋底,其中鞋底底部的边缘和鞋底底部的下边缘沿着鞋帮的下边缘连接, 鞋底被附着到底部底部的下侧,鞋底盖向内翻转以面对鞋底,使得鞋底盖被附接以包围鞋底的外表面和下边缘, 并且窗口附接到鞋底的下侧,包括鞋底罩的端部。 根据本发明,代替现有的方法,采用新的方法来制造具有简单的制鞋步骤的鞋,从而可以减少制鞋时间和精力,此外,所述鞋是轻的并具有优异的吸汗 功率和高耐磨性,从而使脚的疲劳最小化。

    Apparatus for measuring and calibrating error of wafer prober
    3.
    发明授权
    Apparatus for measuring and calibrating error of wafer prober 有权
    用于测量和校准晶圆探测器误差的装置

    公开(公告)号:US08452563B2

    公开(公告)日:2013-05-28

    申请号:US12664011

    申请日:2008-06-11

    申请人: Jong-Guk Lee

    发明人: Jong-Guk Lee

    IPC分类号: G06F19/00

    摘要: Provided is an error measurement and correction device of a stage of a wafer prober. The error measurement and correction device includes a jig member, a vision module, a central processing unit, and an interface unit. The jig member is disposed on a chuck on the stage, and the vision module is disposed on an upper plate of the wafer prober disposed at a position facing the jig member to enable the camera of the vision module to acquire images of the patterns of the jig member and transmits the acquired images to the central processing unit. The central processing unit acquires images of the patterns of the jig member disposed on the chuck by using the vision module to extract reference position information, moves the stage at a unit interval of the pattern, acquires images of the patterns of the jig member again to extract measured position information, and generates and stores mapping data by calculating difference between the measured position information and the reference position information. The central processing unit corrects the movement position information on the stage to be moved by using the mapping data when the stage is moved, so that irrespective of physical deterioration of the stage, the stage can be moved to an accurate position.

    摘要翻译: 提供了晶片探测器的阶段的误差测量和校正装置。 误差测量和校正装置包括夹具构件,视觉模块,中央处理单元和接口单元。 夹具构件设置在台架上的卡盘上,并且视觉模块设置在设置在面向夹具构件的位置处的晶片探测器的上板上,以使得视觉模块的照相机能够获取图像的图像 将所获取的图像发送到中央处理单元。 中央处理单元通过使用视觉模块获取配置在卡盘上的夹具构件的图案的图像,提取基准位置信息,以图案的单位间隔移动台,再次获取夹具构件的图案的图像, 提取测量位置信息,并通过计算测量位置信息和参考位置信息之间的差异来生成并存储映射数据。 当舞台移动时,中央处理单元通过使用映射数据校正要移动的舞台上的移动位置信息,因此,不论舞台的物理劣化如何,舞台可以移动到准确的位置。