MOS STRUCTURES WITH REMOTE CONTACTS AND METHODS FOR FABRICATING THE SAME
    1.
    发明申请
    MOS STRUCTURES WITH REMOTE CONTACTS AND METHODS FOR FABRICATING THE SAME 有权
    具有远程联系的MOS结构及其制造方法

    公开(公告)号:US20080296682A1

    公开(公告)日:2008-12-04

    申请号:US11755930

    申请日:2007-05-31

    Abstract: MOS structures with remote contacts and methods for fabricating such MOS structures are provided. In one embodiment, a method for fabricating an MOS structure comprises providing a semiconductor layer that is at least partially surrounded by an isolation region and that has an impurity-doped first portion. First and second MOS transistors are formed on and within the first portion. The transistors are substantially parallel and define a space therebetween. An insulating material is deposited overlying the first portion of the semiconductor layer and at least a portion of the isolation region. A contact is formed through the insulating material outside the space such that the contact is in electrical communication with the transistors.

    Abstract translation: 提供了具有远程触点的MOS结构和用于制造这种MOS结构的方法。 在一个实施例中,一种用于制造MOS结构的方法包括提供半导体层,该半导体层至少部分地被隔离区包围,并且具有杂质掺杂的第一部分。 第一和第二MOS晶体管形成在第一部分内部和第一部分内。 晶体管基本上平行并且在它们之间限定了一个空间。 沉积覆盖半导体层的第一部分和隔离区域的至少一部分的绝缘材料。 通过空间外部的绝缘材料形成触点,使得触点与晶体管电连通。

    MOS structures with remote contacts and methods for fabricating the same
    4.
    发明授权
    MOS structures with remote contacts and methods for fabricating the same 有权
    具有远程触点的MOS结构及其制造方法

    公开(公告)号:US07989891B2

    公开(公告)日:2011-08-02

    申请号:US11755930

    申请日:2007-05-31

    Abstract: MOS structures with remote contacts and methods for fabricating such MOS structures are provided. In one embodiment, a method for fabricating an MOS structure comprises providing a semiconductor layer that is at least partially surrounded by an isolation region and that has an impurity-doped first portion. First and second MOS transistors are formed on and within the first portion. The transistors are substantially parallel and define a space therebetween. An insulating material is deposited overlying the first portion of the semiconductor layer and at least a portion of the isolation region. A contact is formed through the insulating material outside the space such that the contact is in electrical communication with the transistors.

    Abstract translation: 提供具有远程触点的MOS结构和用于制造这种MOS结构的方法。 在一个实施例中,一种用于制造MOS结构的方法包括提供半导体层,该半导体层至少部分地被隔离区包围,并且具有杂质掺杂的第一部分。 第一和第二MOS晶体管形成在第一部分内部和第一部分内。 晶体管基本上平行并且在它们之间限定了一个空间。 沉积覆盖半导体层的第一部分和隔离区域的至少一部分的绝缘材料。 通过空间外部的绝缘材料形成触点,使得触点与晶体管电连通。

Patent Agency Ranking