Abstract:
A process for glass passivating silicon semiconductor junctions comprises the steps of coating a slice of semiconductor material containing exposed rectifying junctions in a liquid mixture of powdered glass and an organic component, spinning the slice to remove excess mixture, but leave remaining on the slice a thin uniform film of the mixture, heating the slice in an oxygen atmosphere to form a very thin silicon dioxide layer on the surface of the slice while burning off the organic component to leave the glass in a highly compacted, dry powder form tightly adhering to the slice, and again heating the slice in a dry, substantially oxygen-free atmosphere at a temperature sufficient to fuse the glass powder together and to the slice.
Abstract:
The specification discloses a semiconductor switch having a body formed from at least five layers of alternating first and second types of semiconductor material. A pair of regions of the first type of semiconductor material are formed on an outer surface of the body and are spaced apart by a pair of regions of the second type of semiconductor material. Electrodes contact the regions and form a gate and an anode. An electrode contacts the other outer surface of the body to form a second anode. Structure is provided for electrically connecting at least one of the regions with an intermediate layer which is interior within the body and is not immediately adjacent the regions. This shorting structure increases the switching speed of the device and improves the commutating and static dv/dt capabilities of the device.