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公开(公告)号:US20100255263A1
公开(公告)日:2010-10-07
申请号:US12438645
申请日:2007-08-23
申请人: Toshiyuki Miyadera , Isamu Oshita , Soh Fujimura
发明人: Toshiyuki Miyadera , Isamu Oshita , Soh Fujimura
CPC分类号: C23C16/56 , B32B5/02 , B32B5/24 , B32B15/04 , B32B15/18 , B32B27/06 , B32B27/285 , B32B27/286 , B32B27/288 , B32B27/304 , B32B27/32 , B32B27/322 , B32B27/36 , B32B27/365 , B32B2255/02 , B32B2255/06 , B32B2255/10 , B32B2255/20 , B32B2255/205 , B32B2255/28 , B32B2260/021 , B32B2260/046 , B32B2262/0269 , B32B2262/101 , B32B2262/106 , B32B2307/50 , B32B2307/7242 , B32B2307/7244 , B32B2307/7246 , B32B2457/20 , C23C14/588 , H01L51/5253 , Y10T428/24612
摘要: Disclosed is a gas barrier film for preventing penetration of gas or moisture or the like. Such a gas barrier film includes a substrate and a gas barrier layer, which is formed on at least one main face of the substrate and has a recess part, wherein an embedment part is formed by charging a filler into the recess part. The embedment part is completed by forming the embedment layer made of the filler on the gas barrier layer having the recess part, and depositing the filler in the recess part of the gas barrier layer while contacting the embedment layer with a cleaning device to expand and remove the embedment layer.
摘要翻译: 公开了一种防止气体或水分等渗透的阻气膜。 这种阻气膜包括衬底和阻气层,其形成在衬底的至少一个主面上并具有凹部,其中通过将填充物填充到凹部中而形成嵌入部。 通过在具有凹部的气体阻隔层上形成由填料形成的嵌入层,并且将填料沉积在阻气层的凹部中,同时使其与清洁装置接触以使其移除 嵌入层。