公开(公告)号：US20250067809A1

公开(公告)日：2025-02-27

申请号：US18723945

申请日：2022-01-19

Applicant: Hitachi High-Tech Corporation

Inventor： Chiaki OZAWA ,  Akira FUJIMOTO ,  Hiroya FUJIMOTO

IPC: G01R31/392 ,  G01R31/367 ,  G01R31/396

Abstract: The disclosure discloses a technique for more accurately evaluating a residual value of a secondary battery. For this reason, the disclosure proposes a battery residual value management system that manages a residual value of a battery, the battery residual value management system including: at least one storage device configured to store information about a multi-dimensional vector space formed by at least three indexes for evaluating the residual value of the battery, the multi-dimensional vector space including a plurality of regions for determining a residual value rank of the battery, each of the regions being defined by one or more threshold values set for each index in the multi-dimensional vector space; and at least one processor configured to acquire the information about the multi-dimensional vector space from the storage device and determine, based on the at least three indexes of the battery that is a residual value assessment target, to which of the plurality of regions in the multi-dimensional vector space the battery being the residual value assessment target belongs, thereby determining the residual value rank of the battery that is the residual value assessment target (see FIG. 2A).

公开(公告)号：US12237174B2

公开(公告)日：2025-02-25

申请号：US17642356

申请日：2021-04-22

Applicant: Hitachi High-Tech Corporation

Inventor： Kazunori Shinoda ,  Hirotaka Hamamura ,  Kenji Maeda ,  Kenetsu Yokogawa ,  Kenji Ishikawa ,  Masaru Hori

IPC: H01L21/311 ,  H01L21/02 ,  H01L21/3065

Abstract: Provided is an etching technique providing higher uniformity of etching amount and a higher yield of etching processing. An etching method for etching a film layer as a processing object containing nitride of transition metal, the film layer being disposed on a surface of a wafer, includes a step of supplying reactive particles containing fluorine and hydrogen but containing no oxygen to a surface of the film layer to form a reaction layer on the surface of the film layer, and a step of eliminating the reaction layer by heating the film layer.

公开(公告)号：US12237145B2

公开(公告)日：2025-02-25

申请号：US17791013

申请日：2020-01-22

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Atsuko Shintani ,  Makoto Suzuki ,  Hiroki Kawada

IPC: H01J37/22 ,  G01N23/2251 ,  H01J37/147 ,  H01J37/244

Abstract: System and method for preventing blurring of an image in a scanning direction caused by a signal processing delay of a detector. of a charged particle beam device. The charged particle beam device is configured to calibrate first image data generated based on a detection signal output from a detector when the sample is two-dimensionally scanned with the charged particle beam, to generate second image data, in which the the second image data is generated using n first signal profiles each of which corresponds to a signal strength distribution in a first direction and which are extracted from the first image data, and a power spectral density P(f) (f: spatial frequency) of a window function corresponding to the signal processing delay of the detector.

公开(公告)号：US20250060678A1

公开(公告)日：2025-02-20

申请号：US18937471

申请日：2024-11-05

Applicant: Hitachi High-Tech Corporation

Inventor： Takuma YAMAMOTO ,  Hiroya OHTA ,  Kenji TANIMOTO ,  Yusuke ABE ,  Tomohiro TAMORI ,  Masaaki NOJIRI

IPC: G03F7/00 ,  G01B15/04 ,  G01N23/225 ,  G03F7/20

Abstract: A computation device is provided for measuring the dimensions of patterns formed on a sample based on a signal obtained from a charged particle beam device. The computation device includes a positional deviation amount calculation unit for calculating the amount of positional deviation in a direction parallel to a wafer surface between two patterns having different heights based on an image acquired at a given beam tilt angle; a pattern inclination amount calculation unit for calculating an amount of pattern inclination from the amount of positional deviation using a predetermined relational expression for the amount of positional deviation and the amount of pattern inclination; and a beam tilt control amount calculation unit for controlling the beam tilt angle so as to match the amount of pattern inclination. The pattern measurement device sets the beam tilt angle to a calculated beam tilt angle, reacquires an image and measures the patterns.

公开(公告)号：US12230471B2

公开(公告)日：2025-02-18

申请号：US17788556

申请日：2019-12-24

Applicant: Hitachi High-Tech Corporation

Inventor： Shota Aida ,  Hisayuki Takasu ,  Atsushi Kamino ,  Hitoshi Kamoshida

IPC: H01J37/24 ,  H01J37/08 ,  H01J37/244 ,  H01J37/30 ,  H01J37/305

Abstract: There is provided an ion milling apparatus that can enhance reproducibility of ion distribution.
The ion milling apparatus includes an ion source 101, a sample stage 102 on which a sample processed by radiating a non-convergent ion beam from the ion source 101 is placed, a drive unit 107 that moves a measurement member holding section 106 holding an ion beam current measurement member 105 along a track located between the ion source and the sample stage, and an electrode 112 that is disposed near the track, in which a predetermined positive voltage is applied to the electrode 112, the ion beam current measurement member 105 is moved within a radiation range of the ion beam by the drive unit 107, in a state in which the ion beam is output from the ion source 101 under a first radiation condition, and an ion beam current that flows when the ion beam is radiated to the ion beam current measurement member 105 is measured.

公开(公告)号：US20250053920A1

公开(公告)日：2025-02-13

申请号：US18719304

申请日：2021-12-23

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Hirokazu KATO ,  Motohiro YAMAZAKI ,  Ryusuke KIMURA ,  Noriyuki SUMIDA ,  Hiroyuki TANAI ,  Asami TERAKADO ,  Mitsuhiro MIYAZAKI

IPC: G06Q10/087

Abstract: An analysis system includes: an analyzer that performs an analysis using polymer filled in a polymer cartridge, acquires attribute information on the polymer cartridge, and transmits the attribute information to the outside; and a server that acquires the attribute information on the polymer cartridge transmitted from the analyzer, collates the attribute information with attribute information stored in a database, and transmits to the analyzer a determination result obtained by determining whether or not the polymer cartridge in which polymer corresponding to the collated attribute information has been filled already is proper as an object to be set on the analyzer.

公开(公告)号：US20250052716A1

公开(公告)日：2025-02-13

申请号：US18715810

申请日：2021-12-15

Applicant: Hitachi High-Tech Corporation

Inventor： Katsunari MARUOKA ,  Takeshi OOURA ,  Katsuhiro ARITOME

IPC: G01N27/447

Abstract: An object of the present invention is to provide an electrophoresis device with high workability while protecting a detection unit at the time of a replacement work of a capillary array. The present invention is the electrophoresis device including the capillary array that includes one piece or more capillary, the capillary array including a load header arranged at one end, a capillary head arranged at the other end, and the detection unit formed between the load header and the capillary head and detecting a sample electrophoresed within the capillary. The electrophoresis device includes: a holder to which the detection unit is fit; and a protection unit protruding with respect to an array surface of the capillary array. When the detection unit is to be fit, the protection unit allows an inner surface of the holder to depart from the detection unit.

公开(公告)号：US12224157B2

公开(公告)日：2025-02-11

申请号：US17763320

申请日：2021-03-25

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Yuki Tanaka ,  Takamasa Ichino ,  Shintarou Nakatani ,  Ryusuke Eijima

IPC: H01L21/67 ,  H01J37/32

Abstract: A plasma processing apparatus having an improved yield includes a metal base member having a disk shape or a cylindrical shape arranged inside a sample table; a refrigerant flow path arranged multiple times in a concentrical shape around a center of the base member; at least one temperature sensor; and a controller configured to detect a temperature of the base member or the wafer using the temperature sensor. The controller is configured to detect the temperature of the base member or the wafer based on one of a plurality of linear functions indicating a relation between an error and a set temperature of the refrigerant, and the linear functions are different corresponding to regions of a plurality of continuous temperature ranges within an adjustable temperature range of the refrigerant, and the plurality of linear functions include the same coefficient and have a point where the error is 0.

公开(公告)号：US12222690B2

公开(公告)日：2025-02-11

申请号：US17370131

申请日：2021-07-08

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi Dobashi ,  Hiroyuki Kobayashi ,  Takeshi Ohmori

IPC: G05B13/04 ,  G06N20/00 ,  G06T7/00 ,  H01L21/3065 ,  H01L21/66 ,  H01L21/67

Abstract: To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.

公开(公告)号：US12222360B2

公开(公告)日：2025-02-11

申请号：US17603725

申请日：2020-02-26

Applicant: Hitachi High-Tech Corporation

Inventor： Yoshihiro Kabe ,  Takenori Okusa

IPC: G01N35/10 ,  G01N35/00 ,  G01N35/02 ,  G01N35/08 ,  G01N35/04

Abstract: An automatic analyzer includes a flow cell detector, a nozzle that is connected to the flow cell detector by a flow path and aspirates or discharges liquid, a reservoir that is provided with a table and a table driving mechanism that rotates or moves the table up and down, and a cleaning tank that is disposed on the table. A position of the nozzle is fixed, and a cleaning water discharge port discharges cleaning water used for cleaning the nozzle at an angle φ with respect to a plane perpendicular to a central axis of the nozzle. An upper part of a side wall of the cleaning tank is continuous with an upper discharge unit at a side facing a discharge outlet provided in the reservoir and a spatula-shaped part projects outward of the cleaning tank at a side facing the upper discharge unit.