公开(公告)号：US20070153275A1

公开(公告)日：2007-07-05

申请号：US11641122

申请日：2006-12-19

申请人： Nicolaas Petrus Van Der Aa ,  Arie Jeffrey Maria Den Boef ,  Robert Martinus Maria Mattheij ,  Henricus Gerhardus Ter Morsche

发明人： Nicolaas Petrus Van Der Aa ,  Arie Jeffrey Maria Den Boef ,  Robert Martinus Maria Mattheij ,  Henricus Gerhardus Ter Morsche

IPC分类号： G01B11/00

CPC分类号： G03F9/7049 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7076 ,  G03F9/7092

摘要： An optical metrology system is disclosed that has a measuring system configured to irradiate a metrology mark and record a portion of a reflected, a transmitted, or both, electromagnetic field and a characterization device configured to determine from the recorded field a mark shape parameter indicative of the structure of the metrology mark, the characterization device comprising: a field calculation unit configured to calculate an expected field for reflection, transmission, or both, from a theoretical reference mark based on an algebraic eigenvalue-eigenvector representation of the expected field, a field derivative calculation unit configured to calculate a first order derivative, a higher order derivative, or both, of the expected field with respect to the mark shape parameter by first deriving analytical forms for corresponding derivatives of eigenvalues and eigenvectors of the eigenvalue-eigenvector representation, and an optimization unit configured to use the outputs from the field and field derivative calculation units to determine an optimized mark shape parameter for which the expected field substantially matches the recorded field.

公开(公告)号：US07649636B2

公开(公告)日：2010-01-19

申请号：US11641122

申请日：2006-12-19

申请人： Nicolaas Petrus Van Der Aa ,  Arie Jeffrey Den Boef ,  Robert Martinus Maria Mattheij ,  Henricus Gerhardus Ter Morsche

发明人： Nicolaas Petrus Van Der Aa ,  Arie Jeffrey Den Boef ,  Robert Martinus Maria Mattheij ,  Henricus Gerhardus Ter Morsche

IPC分类号： G01B11/14

CPC分类号： G03F9/7049 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7076 ,  G03F9/7092

摘要： An optical metrology system is disclosed that has a measuring system configured to irradiate a metrology mark and record a portion of a reflected, a transmitted, or both, electromagnetic field and a characterization device configured to determine from the recorded field a mark shape parameter indicative of the structure of the metrology mark, the characterization device comprising: a field calculation unit configured to calculate an expected field for reflection, transmission, or both, from a theoretical reference mark based on an algebraic eigenvalue-eigenvector representation of the expected field, a field derivative calculation unit configured to calculate a first order derivative, a higher order derivative, or both, of the expected field with respect to the mark shape parameter by first deriving analytical forms for corresponding derivatives of eigenvalues and eigenvectors of the eigenvalue-eigenvector representation, and an optimization unit configured to use the outputs from the field and field derivative calculation units to determine an optimized mark shape parameter for which the expected field substantially matches the recorded field.

摘要翻译： 公开了一种光学测量系统，其具有被配置为照射测量标记并记录反射的，发射的或两者的电磁场的一部分的测量系统和被配置成从记录场确定指示 所述计量标记的结构，所述表征装置包括：场计算单元，被配置为基于所述预期场的代数特征值特征向量表示从理论参考标记计算反射，透射或两者的预期场，场 导数计算单元，被配置为通过首先导出特征值特征向量表示的特征值和特征向量的相应导数的分析形式来计算相对于标记形状参数的期望字段的一阶导数，高阶导数或两者，以及 配置为使用来自所述输出的输出的优化单元 场和场导数计算单元，以确定预期场与记录场基本一致的优化标记形状参数。