公开(公告)号：US20110157599A1

公开(公告)日：2011-06-30

申请号：US13060033

申请日：2009-08-25

Applicant: Jonathan Mark Ralph Weaver ,  Phillip Stephen Dobson ,  David Paul Burt ,  Stephen Thoms ,  Kevin Edward Docherty ,  Yuan Zhang

Inventor： Jonathan Mark Ralph Weaver ,  Phillip Stephen Dobson ,  David Paul Burt ,  Stephen Thoms ,  Kevin Edward Docherty ,  Yuan Zhang

IPC: G01B11/02

CPC classification number: G01D5/266 ,  G01D5/38 ,  G01D11/00 ,  G01J9/0246 ,  G01J2009/0234 ,  G01N21/45 ,  G03H1/0005

Abstract: Various uses of visible light interference patterns are provided. Suitable interference patterns are those formed by diffraction from patterns of apertures. Typical uses disclosed herein relate to spatial metrology, such as a translational and/or angular position determination system. Further uses include the analysis of properties of the light itself (such as the determination of the wavelength of the electromagnetic radiation). Still further uses include the analysis of one or more properties (e.g. refractive index) of the matter through which the light passes. Part of the interference pattern is captured at a pixellated detector, such as a CCD chip, and the captured pattern compared with a calculated pattern. Very precise measurements of the spacing between maxima is possible, thus allowing very precise measurements of position of the detector in the interference pattern.

Abstract translation: 提供了可见光干涉图案的各种用途。 合适的干涉图案是由孔的图案衍射形成的。 本文公开的典型用途涉及空间计量学，例如平移和/或角位置确定系统。 另外的用途包括对光本身的性质的分析（例如确定电磁辐射的波长）。 另外的用途包括对光通过的物质的一个或多个性质（例如折射率）的分析。 干涉图案的一部分在诸如CCD芯片的像素化检测器处捕获，并且捕获的图案与计算的图案相比较。 可以非常精确地测量最大值之间的间距，从而允许在干涉图案中非常精确地测量检测器的位置。

公开(公告)号：US09618369B2

公开(公告)日：2017-04-11

申请号：US13060033

申请日：2009-08-25

Applicant: Jonathan Mark Ralph Weaver ,  Phillip Stephen Dobson ,  David Paul Burt ,  Stephen Thoms ,  Kevin Edward Docherty ,  Yuan Zhang

Inventor： Jonathan Mark Ralph Weaver ,  Phillip Stephen Dobson ,  David Paul Burt ,  Stephen Thoms ,  Kevin Edward Docherty ,  Yuan Zhang

IPC: G01B11/02 ,  G01D5/26 ,  G01D5/38 ,  G01D11/00 ,  G01J9/02 ,  G01N21/45 ,  G03H1/00

CPC classification number: G01D5/266 ,  G01D5/38 ,  G01D11/00 ,  G01J9/0246 ,  G01J2009/0234 ,  G01N21/45 ,  G03H1/0005

Abstract: Various uses of visible light interference patterns are provided. Suitable interference patterns are those formed by diffraction from patterns of apertures. Typical uses disclosed herein relate to spatial metrology, such as a translational and/or angular position determination system. Further uses include the analysis of properties of the light itself (such as the determination of the wavelength of the electromagnetic radiation). Still further uses include the analysis of one or more properties (e.g. refractive index) of the matter through which the light passes. Part of the interference pattern is captured at a pixellated detector, such as a CCD chip, and the captured pattern compared with a calculated pattern. Very precise measurements of the spacing between maxima is possible, thus allowing very precise measurements of position of the detector in the interference pattern.