公开(公告)号：US6003185A

公开(公告)日：1999-12-21

申请号：US691450

申请日：1996-08-01

申请人： Albert M. Saenz ,  David L. Thrasher ,  Wilbur C. Krusell ,  William G. Drapak

发明人： Albert M. Saenz ,  David L. Thrasher ,  Wilbur C. Krusell ,  William G. Drapak

IPC分类号： A47L15/42 ,  B08B11/02 ,  H01L21/00 ,  H01L21/687

CPC分类号： H01L21/68728 ,  A47L15/42 ,  B08B11/02 ,  H01L21/67046

摘要： A method and apparatus for rotating wafers in a scrubber, wherein both sides of a wafer are scrubbed without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a cleaning process wherein both sides of a wafer are scrubbed. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove. The wafer edge is pinched inside the groove to create enough friction that when cleaning solutions are applied the wafer does not slip and continues to rotate. Also, the groove allows the roller to pinch the wafer just enough so that when the roller reaches the flat of the wafer, the roller may regain the radius of the wafer without hesitating.

摘要翻译： 一种用于在洗涤器中旋转晶片的方法和装置，其中晶片的两侧被擦洗而没有滑动或犹豫。 在清洁工艺期间，旋转辊将旋转运动提供给半导体晶片，其中清洗晶片的两侧。 在其外边缘处的旋转辊和晶片接触以及它们的外边缘之间的摩擦导致晶片旋转。 辊具有带有凹槽的外边缘。 晶片边缘被夹在凹槽内以产生足够的摩擦力，当施加清洁溶液时，晶片不会滑动并继续旋转。 此外，凹槽允许辊足够地夹紧晶片，使得当辊到达晶片的平面时，辊可以重新获得晶片的半径而不会犹豫。

公开(公告)号：US5762084A

公开(公告)日：1998-06-09

申请号：US770913

申请日：1996-12-20

申请人： Wilbur C. Krusell ,  David L. Thrasher ,  Lynn S. Ryle

发明人： Wilbur C. Krusell ,  David L. Thrasher ,  Lynn S. Ryle

IPC分类号： B08B3/12 ,  H01L21/00 ,  B08B3/10

CPC分类号： H01L21/67057 ,  B08B3/12 ,  H01L21/67046 ,  H01L21/67051 ,  Y10S134/902

摘要： A megasonic bath with horizontal wafer orientation that may be conveniently interfaced with brush scrub systems. The megasonic transducer creates a sonic energy flow in the direction of the wafers. The sonic energy causes cavitation which loosens and displaces particles from the surface of the wafers. Water jets produce a horizontal flow across the wafer surfaces. The horizontal flow created by the water jets keeps the wafer surfaces wet, exposes the surfaces to fresh chemicals, and removes the particles which have been displaced or loosened by the sonic energy.

摘要翻译： 具有水平晶片取向的兆声波浴，其可以方便地与刷洗系统接口。 兆声传感器在晶片方向上产生声能量流。 声能引起空化，从晶片表面松动并排出颗粒。 水射流在晶片表面产生横向流动。 由水射流产生的水平流动使晶片表面变湿，将表面暴露于新鲜的化学物质中，并且通过声能除去已被移位或松动的颗粒。

公开(公告)号：US5745946A

公开(公告)日：1998-05-05

申请号：US688062

申请日：1996-07-29

申请人： David L. Thrasher ,  Lynn S. Ryle ,  Robert M. Ruppell ,  John S. Hearne ,  Wilbur C. Krussell ,  Gary D. Youre

发明人： David L. Thrasher ,  Lynn S. Ryle ,  Robert M. Ruppell ,  John S. Hearne ,  Wilbur C. Krussell ,  Gary D. Youre

IPC分类号： B08B17/00 ,  H01L21/00 ,  B08B11/00 ,  B08B3/02

CPC分类号： H01L21/67028 ,  B08B17/00 ,  Y10S134/902

摘要： An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels are provided between modules to prevent leakage between the modules. A substrate transport mechanism which is moveable along a rail is provided with the stabilizer to provide for stable substrate transfer. The processing system has two brush stations which are placed within a single enclosure. The sensors located throughout the system, which sense the presence of a wafer, are fixedly mounted in a frame so that they are self-aligned to one another. In the sender station, two sensors are used, with the system requiring both sensors to sense the presence of a wafer to increase the reliability. In the dry station, the heating lamp is shielded from the substrate to reduce particulate contamination. Various flow meters are mounted on a transparent panel to provide easy and convenient hook-up. The system is provided with an airflow control bulkhead between the clean and dirty side of the system to prevent intermixing to thereby provide for lower contamination levels in the clean side of the system.

摘要翻译： 改进的基板处理系统。 该系统可用于半导体衬底的双面擦洗。 系统的湿站具有防止积聚的液体滴落在车站外部并且使滴落在基底上最小化的盖子。 在模块之间提供运输隧道，以防止模块之间的泄漏。 可沿轨道移动的基板输送机构设置有稳定器以提供稳定的基板转印。 处理系统具有放置在单个外壳内的两个刷台。 位于整个系统中的感测晶片存在的传感器被固定地安装在框架中，使得它们彼此自对准。 在发送站中，使用两个传感器，系统需要两个传感器来感测晶片的存在以提高可靠性。 在干燥站，加热灯与基板隔离，以减少颗粒污染。 各种流量计安装在透明面板上，提供简单方便的连接。 该系统在系统的清洁和脏污的一侧设置有气流控制隔板，以防止混合，从而在系统的清洁侧面提供较低的污染水平。

公开(公告)号：US5606251A

公开(公告)日：1997-02-25

申请号：US275637

申请日：1994-07-15

申请人： Lynn S. Ryle ,  Robert M. Ruppell ,  David L. Thrasher ,  Martin J. McGrath

发明人： Lynn S. Ryle ,  Robert M. Ruppell ,  David L. Thrasher ,  Martin J. McGrath

IPC分类号： H01L21/00 ,  G01N21/86 ,  G01R27/26

CPC分类号： H01L21/67173 ,  H01L21/67046 ,  H01L21/67051 ,  H01L21/67196 ,  H01L21/67259 ,  Y10S414/136 ,  Y10S414/137

摘要： An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels are provided between modules to prevent leakage between the modules. A substrate transport mechanism which is moveable along a rail is provided with the stabilizer to provide for stable substrate transfer. The processing system has two brush stations which are placed within a single enclosure. The sensors located throughout the system, which sense the presence of a wafer, are fixedly mounted in a frame so that they are self-aligned to one another. In the sender station, two sensors are used, with the system requiring both sensors to sense the presence of a wafer to increase the reliability. In the dry station, the heating lamp is shielded from the substrate to reduce particulate contamination. Various flow meters are mounted on a transparent panel to provide easy and convenient hook-up. The system is provided with an airflow control bulkhead between the clean and dirty side of the system to prevent intermixing to thereby provide for lower contamination levels in the clean side of the system.

摘要翻译： 改进的基板处理系统。 该系统可用于半导体衬底的双面擦洗。 系统的湿站具有防止积聚的液体滴落在车站外部并且使滴落在基底上最小化的盖子。 在模块之间提供运输隧道，以防止模块之间的泄漏。 可沿轨道移动的基板输送机构设置有稳定器以提供稳定的基板转印。 处理系统具有放置在单个外壳内的两个刷台。 位于整个系统中的感测晶片存在的传感器被固定地安装在框架中，使得它们彼此自对准。 在发送站中，使用两个传感器，系统需要两个传感器来感测晶片的存在以提高可靠性。 在干燥站，加热灯与基板隔离，以减少颗粒污染。 各种流量计安装在透明面板上，提供简单方便的连接。 该系统在系统的清洁和脏污的一侧设置有气流控制隔板，以防止混合，从而在系统的清洁侧面提供较低的污染水平。

公开(公告)号：US5975736A

公开(公告)日：1999-11-02

申请号：US687977

申请日：1996-07-29

申请人： Mark A. Simmons ,  Martin J. McGrath ,  David L. Thrasher

发明人： Mark A. Simmons ,  Martin J. McGrath ,  David L. Thrasher

IPC分类号： G05B19/418 ,  G05B15/00 ,  G06F17/00

CPC分类号： G05B19/4185 ,  G05B19/41855 ,  G05B2219/31226 ,  G05B2219/31234 ,  G05B2219/33136 ,  G05B2219/33161 ,  G05B2219/33168 ,  G05B2219/45026 ,  G05B2219/45232 ,  Y02P90/14 ,  Y02P90/185

摘要： A control system. An apparatus having a motor; a host processor for generating a message containing motor control information; a control board for receiving the message and for transmitting a command, corresponding to the message, to the motor; and a communications medium coupling the host processor and the control board. The communications medium supports a first communications path and a second communications path. The first communications path is for transmitting messages from the host processor to the control board. The second communications path is for transmitting messages from the control board to the host processor.

摘要翻译： 控制系统。 具有马达的装置; 主机处理器，用于生成包含电机控制信息的消息; 用于接收所述消息并将与所述消息对应的命令发送到所述电动机的控制板; 以及耦合主处理器和控制板的通信介质。 通信介质支持第一通信路径和第二通信路径。 第一通信路径用于将消息从主处理器发送到控制板。 第二通信路径用于将消息从控制板传送到主机处理器。

公开(公告)号：US5727332A

公开(公告)日：1998-03-17

申请号：US782155

申请日：1997-01-13

申请人： David L. Thrasher ,  John S. Hearne ,  Lynn S. Ryle

发明人： David L. Thrasher ,  John S. Hearne ,  Lynn S. Ryle

IPC分类号： B08B1/02 ,  H01L21/00 ,  F26B3/34

CPC分类号： H01L21/67051 ,  B08B1/02 ,  H01L21/67046

摘要： An improved substrate processing system. The system may be used for double sided scrubbing of a semiconductor substrate. The wet stations of the system has covers which prevent accumulated liquid from dripping outside of the station and which minimize dripping on the substrates. Transport tunnels are provided between modules to prevent leakage between the modules. A substrate transport mechanism which is moveable along a rail is provided with the stabilizer to provide for stable substrate transfer. The processing system has two brush stations which are placed within a single enclosure. The sensors located throughout the system, which sense the presence of a wafer, are fixedly mounted in a frame so that they are self-aligned to one another. In the sender station, two sensors are used, with the system requiring both sensors to sense the presence of a wafer to increase the reliability. In the dry station, the heating lamp is shielded from the substrate to reduce particulate contamination. Various flow meters are mounted on a transparent panel to provide easy and convenient hook-up. The system is provided with an airflow control bulkhead between the clean and dirty side of the system to prevent intermixing to thereby provide for lower contamination levels in the clean side of the system.

摘要翻译： 改进的基板处理系统。 该系统可用于半导体衬底的双面擦洗。 系统的湿站具有防止积聚的液体滴落在车站外部并且使滴落在基底上最小化的盖子。 在模块之间提供运输隧道，以防止模块之间的泄漏。 可沿轨道移动的基板输送机构设置有稳定器以提供稳定的基板转印。 处理系统具有放置在单个外壳内的两个刷台。 位于整个系统中的感测晶片存在的传感器被固定地安装在框架中，使得它们彼此自对准。 在发送站中，使用两个传感器，系统需要两个传感器来感测晶片的存在以提高可靠性。 在干燥站，加热灯与基板隔离，以减少颗粒污染。 各种流量计安装在透明面板上，提供简单方便的连接。 该系统在系统的清洁和脏污的一侧设置有气流控制隔板，以防止混合，从而在系统的清洁侧面提供较低的污染水平。

公开(公告)号：US5548505A

公开(公告)日：1996-08-20

申请号：US275797

申请日：1994-07-15

申请人： Mark A. Simmons ,  Martin J. McGrath ,  David L. Thrasher

发明人： Mark A. Simmons ,  Martin J. McGrath ,  David L. Thrasher

IPC分类号： G05B19/418 ,  G05B15/00

CPC分类号： G05B19/4185 ,  G05B19/41855 ,  G05B2219/31226 ,  G05B2219/31234 ,  G05B2219/33136 ,  G05B2219/33161 ,  G05B2219/33168 ,  G05B2219/45026 ,  G05B2219/45232 ,  Y02P90/14 ,  Y02P90/185

摘要： A control system. An apparatus having a motor; a host processor for generating a message containing motor control information; a control board for receiving the message and for transmitting a command, corresponding to the message, to the motor; and a communications medium coupling the host processor and the control board. The communications medium supports a first communications path and a second communications path. The first communications path is for transmitting messages from the host processor to the control board. The second communications path is for transmitting messages from the control board to the host processor.

公开(公告)号：US5475889A

公开(公告)日：1995-12-19

申请号：US275774

申请日：1994-07-15

申请人： David L. Thrasher ,  Lynn Ryle

发明人： David L. Thrasher ,  Lynn Ryle

IPC分类号： B08B1/04 ,  B21B45/06 ,  H01L21/00 ,  H01L21/304 ,  A46B13/02

CPC分类号： H01L21/67046 ,  B08B1/04 ,  B21B45/06

摘要： An automatically adjustable brush assembly for cleaning semiconductor wafers. The brush assembly includes a first rotary brush, a brush carriage having first and second arms and a second rotary brush, and at least one pressure adjustment assembly positioned to engage at least one of the arms of the brush carriage and configured for automatically adjusting the pressure applied to the wafer surfaces by the first and second rotary brushes. The brush assembly further includes a control system coupled to the pressure adjustment assembly for controlling operation of the pressure adjustment assembly to selectively increase and decrease the pressure applied to the wafer by the first and second rotary brushes.

摘要翻译： 一种用于清洁半导体晶片的自动调节刷组件。 刷组件包括第一旋转刷，具有第一臂和第二臂的刷架和第二旋转刷，以及至少一个压力调节组件，其定位成与刷架的至少一个臂接合，并被构造成用于自动调节压力 通过第一和第二旋转刷施加到晶片表面。 刷组件还包括耦合到压力调节组件的控制系统，用于控制压力调节组件的操作，以选择性地增加和减少由第一和第二旋转刷施加到晶片的压力。

公开(公告)号：US5840129A

公开(公告)日：1998-11-24

申请号：US692594

申请日：1996-08-06

申请人： Albert M. Saenz ,  David L. Thrasher ,  Wilbur C. Krusell ,  William G. Drapak

发明人： Albert M. Saenz ,  David L. Thrasher ,  Wilbur C. Krusell ,  William G. Drapak

IPC分类号： A47L15/42 ,  B08B11/02 ,  H01L21/00 ,  H01L21/687 ,  C03C23/00 ,  A47L15/00 ,  A47L25/00 ,  B08B7/00

CPC分类号： H01L21/68728 ,  A47L15/42 ,  B08B11/02 ,  H01L21/67046

摘要： A method and apparatus for rotating wafers in a double sided scrubber without slipping or hesitating. A rotating roller imparts rotary motion to a semiconductor wafer during a double sided cleaning process. The rotating roller and wafer contact at their outer edges and the friction between their outer edges causes the wafer to rotate. The roller has an outer edge with a groove. The wafer edge is pinched inside the groove to create enough friction that when cleaning solutions are applied the wafer does not slip and continues to rotate. Also, the groove allows the roller to pinch the wafer just enough so that when the roller reaches the flat of the wafer, the roller may regain the radius of the wafer without hesitating.

摘要翻译： 一种用于在双面洗涤器中旋转晶片而不会发生滑动或犹豫的方法和装置。 旋转辊在双面清洁过程中向半导体晶片施加旋转运动。 在其外边缘处的旋转辊和晶片接触以及它们的外边缘之间的摩擦导致晶片旋转。 辊具有带有凹槽的外边缘。 晶片边缘被夹在凹槽内以产生足够的摩擦力，当施加清洁溶液时，晶片不会滑动并继续旋转。 此外，凹槽允许辊足够地夹紧晶片，使得当辊到达晶片的平面时，辊可以重新获得晶片的半径而不会犹豫。

公开(公告)号：US4616683A

公开(公告)日：1986-10-14

申请号：US721332

申请日：1985-04-08

申请人： Barclay J. Tullis ,  Mihir Parikh ,  David L. Thrasher ,  Mark E. Johnston

发明人： Barclay J. Tullis ,  Mihir Parikh ,  David L. Thrasher ,  Mark E. Johnston

IPC分类号： H01L21/67 ,  H01L21/677 ,  B65B1/04

CPC分类号： H01L21/67 ,  H01L21/67775

摘要： A particle-free dockable interface is disclosed for linking together two spaces each enclosing a clean air environment. The interface is composed of interlocking doors on each space which fit together to trap particles which have accumulated from the dirty ambient environment on the outer surfaces of the doors.

摘要翻译： 公开了一种无颗粒的可停靠接口，用于将每个包围清洁空气环境的两个空间连接在一起。 接口由每个空间上的互锁门构成，它们组合在一起，以捕获从脏污的环境环境积聚在门的外表面上的颗粒。