SINTERING APPARATUS
    1.
    发明申请

    公开(公告)号:US20220268522A1

    公开(公告)日:2022-08-25

    申请号:US17404537

    申请日:2021-08-17

    Inventor: Jong Dae Cha

    Abstract: A sintering apparatus is provided. The sintering apparatus includes a case having an internal space formed therein and including a door provided in a front portion thereof to open and close the internal space, a magnetron coupled to the case and oscillating microwaves toward the internal space, a heat insulating unit disposed in the internal space to form a chamber space and blocking transmission of heat of the chamber space to the internal space, a susceptor unit disposed in the chamber space and having a sintering space in which a to-be-sintered material is accommodated, and a cooling unit cooling at least one of the case or the chamber space.

    Sintering apparatus
    2.
    发明授权

    公开(公告)号:US12104852B2

    公开(公告)日:2024-10-01

    申请号:US17404537

    申请日:2021-08-17

    Inventor: Jong Dae Cha

    Abstract: A sintering apparatus is provided. The sintering apparatus includes a case having an internal space formed therein and including a door provided in a front portion thereof to open and close the internal space, a magnetron coupled to the case and oscillating microwaves toward the internal space, a heat insulating unit disposed in the internal space to form a chamber space and blocking transmission of heat of the chamber space to the internal space, a susceptor unit disposed in the chamber space and having a sintering space in which a to-be-sintered material is accommodated, and a cooling unit cooling at least one of the case or the chamber space.

    SINTERING DEVICE
    3.
    发明申请
    SINTERING DEVICE 审中-公开

    公开(公告)号:US20170203362A1

    公开(公告)日:2017-07-20

    申请号:US15158986

    申请日:2016-05-19

    Inventor: Jongdae Cha

    Abstract: A sintering device comprising a tray including a tray part in which metallic workpieces to be sintered (not represented here) are placed during the sintering operation and a base part in which the tray is located including gas-flowing holes and side wall extended upwardly from the edge of the upper surface of the base part, and a sintering chamber including side wall extended downwardly from the upper surface for covering the tray part and at least one gas flow passage between the inner surface thereof and outer surface of the side wall of the tray part;wherein the tray part and base part are integrally formed; wherein the base part includes at the lower portion through holes in horizontal and longitudinal directions for gas inflowing and discharging, a hole at crossover point of the through holes for penetrating the center portion of the base plate and extended to the exterior, and wherein the lower end of the sinter chamber is disposed on the lowered and stepped surface of the base part and the stepped portion formed in the middle of the side wall of the sintering chamber is supported by the upper end of the side wall of the tray for allowing the gas to flow.

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