公开(公告)号：US07011254B2

公开(公告)日：2006-03-14

申请号：US10916226

申请日：2004-08-10

Applicant: Brian Thornton

Inventor： Brian Thornton

IPC: A62C5/02

CPC classification number: A01C23/042 ,  Y10T137/4891

Abstract: A lawn chemical application system is disclosed. The system comprises a dispenser having a lower chamber, an upper chamber, an upstream opening, and a downstream opening. The dispenser may be formed by a tee connector and a cylinder secured to an upper opening of the tee connector. Powered valves are operably connected to the upstream and downstream openings of the dispenser. The powered valves may be wired to open and close simultaneously. A lower portion of the upper chamber may be disposed below an upper portion of the lower chamber and above a lower portion of the lower chamber, leaving the lower portion of the lower chamber unobstructed over substantially its entire length. The lower portion of the upper chamber may have a plurality of openings to provide for adequate mixing of water with the chemicals stored in the upper chamber. In operation, soluble matter or other chemicals are placed in the upper chamber of the dispenser, and the two valves are opened simultaneously. Water flows through the first powered valve and into the dispenser, where the water is mixed with soluble matter or other chemicals stored in the upper chamber of the tee. The solution or mixture then passes from the dispenser, through the second powered valve, to one or more sprinkler heads of the irrigation system. When the application is finished, the valves are closed simultaneously.

公开(公告)号：US20050098649A1

公开(公告)日：2005-05-12

申请号：US10916226

申请日：2004-08-10

Applicant: Brian Thornton

Inventor： Brian Thornton

IPC: A01C23/04 ,  A62C5/02 ,  B05B15/06

CPC classification number: A01C23/042 ,  Y10T137/4891

Abstract: A lawn chemical application system is disclosed. The system comprises a dispenser having a lower chamber, an upper chamber, an upstream opening, and a downstream opening. The dispenser may be formed by a tee connector and a cylinder secured to an upper opening of the tee connector. Powered valves are operably connected to the upstream and downstream openings of the dispenser. The powered valves may be wired to open and close simultaneously. A lower portion of the upper chamber may be disposed below an upper portion of the lower chamber and above a lower portion of the lower chamber, leaving the lower portion of the lower chamber unobstructed over substantially its entire length. The lower portion of the upper chamber may have a plurality of openings to provide for adequate mixing of water with the chemicals stored in the upper chamber. In operation, soluble matter or other chemicals are placed in the upper chamber of the dispenser, and the two valves are opened simultaneously. Water flows through the first powered valve and into the dispenser, where the water is mixed with soluble matter or other chemicals stored in the upper chamber of the tee. The solution or mixture then passes from the dispenser, through the second powered valve, to one or more sprinkler heads of the irrigation system. When the application is finished, the valves are closed simultaneously.

Abstract translation: 公开了草坪化学应用系统。 该系统包括具有下室，上室，上游开口和下游开口的分配器。 分配器可以由三通连接器和固定到三通连接器的上开口的圆筒形成。 动力阀可操作地连接到分配器的上游和下游开口。 动力阀可以被连接以同时打开和关闭。 上部腔室的下部可以设置在下部腔室的上部下方并且位于下部腔室的下部的下方，从而使下部腔室的下部部分基本上不受其整个长度的阻碍。 上室的下部可以具有多个开口，以提供水与存储在上室中的化学品的充分混合。 在操作中，可溶性物质或其他化学品被放置在分配器的上腔室中，并且两个阀门同时打开。 水流过第一动力阀并进入分配器，水与可溶性物质或存储在发球台上部腔室中的其他化学物质混合。 溶液或混合物然后从分配器通过第二动力阀传递到冲洗系统的一个或多个喷洒头。 当应用完成时，阀门同时关闭。

公开(公告)号：US20100302674A1

公开(公告)日：2010-12-02

申请号：US12473198

申请日：2009-05-27

Applicant: Walton Fong ,  Brian Thornton

Inventor： Walton Fong ,  Brian Thornton

IPC: G11B15/18

CPC classification number: G11B5/59655 ,  B82Y10/00 ,  G11B5/6011 ,  G11B5/6064 ,  G11B5/743

Abstract: This application discloses a hard disk drive and a disk employing Discrete Tracks each including a land with a groove at a first depth with sectors of each track separated by servo pattern wedges with a variable second land and a variable second groove possessing widths and a second depth for the grooves differing from the first widths and depth of the groove of the sectors. The second depth optimizes the stability of the flying height of a slider over both sectors and servo pattern wedges, removing the possibility of added vibrational modes adversely affecting the slider's normal operations of reading, writing and flying above the disk surface. This also discloses the disks and their manufacture of disk surfaces with these sector zones and servo pattern wedges.

Abstract translation: 本申请公开了一种硬盘驱动器和采用离散轨道的盘，每个盘包括具有在第一深度上的凹槽的平台，每个轨道的扇区由具有可变的第二脊的伺服模式楔形物分开的每个轨道的扇区以及具有宽度和第二深度的可变第二凹槽 对于与扇区的凹槽的第一宽度和深度不同的凹槽。 第二个深度优化了滑块在两个扇区和伺服模式楔上的飞行高度的稳定性，消除了增加的振动模式不利地影响滑块在磁盘表面上方读取，写入和飞行的正常操作的可能性。 这也公开了磁盘及其具有这些扇区和伺服模式楔的磁盘表面的制造。

公开(公告)号：US06402591B1

公开(公告)日：2002-06-11

申请号：US09539397

申请日：2000-03-31

Applicant: Brian Thornton

Inventor： Brian Thornton

IPC: B24B100

CPC classification number: B24B37/11

Abstract: A method for performing and an apparatus to perform chemical mechanical polishing on a semiconductor wafer are disclosed. The apparatus includes a wafer holder, a polishing member, and a movable table. The movable table is in contact with and is supporting the polishing member. The polishing member includes a polishing pad, a backing layer, and a stiffening layer positioned between the backing layer and the polishing pad. The polishing pad has a polishing surface that is oriented to receive a semiconductor wafer held by the wafer holder. The polishing surface is configured to chemically mechanically polish the semiconductor wafer. The method includes holding a semiconductor wafer, moving a polishing member, and bringing a surface of the semiconductor wafer into contact with the polishing member. The polishing member includes a polishing pad, a backing layer, and a stiffening layer positioned between the polishing pad and the backing layer.

Abstract translation: 公开了一种在半导体晶片上执行化学机械抛光的方法和一种设备。 该装置包括晶片保持器，抛光构件和可动台。 可移动台与抛光件接触并正在支撑。 抛光构件包括抛光垫，背衬层和位于背衬层和抛光垫之间的加强层。 抛光垫具有被定向成接收由晶片保持器保持的半导体晶片的抛光表面。 抛光表面被配置为对半导体晶片进行化学机械抛光。 该方法包括保持半导体晶片，移动抛光构件，并使半导体晶片的表面与抛光构件接触。 抛光构件包括抛光垫，背衬层和位于抛光垫和背衬层之间的加强层。

公开(公告)号：US06186865B1

公开(公告)日：2001-02-13

申请号：US09182532

申请日：1998-10-29

Applicant: Brian Thornton ,  Andrew J. Nagengast ,  Robert G. Boehm, Jr. ,  Anil K. Pant ,  Wilbur C. Krusell

Inventor： Brian Thornton ,  Andrew J. Nagengast ,  Robert G. Boehm, Jr. ,  Anil K. Pant ,  Wilbur C. Krusell

IPC: B24B722

CPC classification number: B24B37/013 ,  B24B21/08 ,  B24B49/16

Abstract: A technique for utilizing a sensor to monitor fluid pressure from a fluid bearing located under a polishing pad to detect a polishing end point. A sensor is located at the leading edge of a fluid bearing of a linear polisher, which is utilized to perform chemical-mechanical polishing on a semiconductor wafer. The sensor monitors the fluid pressure to detect a change in the fluid pressure during polishing, which change corresponds to a change in the shear force when the polishing transitions from one material layer to the next.

Abstract translation: 一种利用传感器来监测来自位于抛光垫下方的流体轴承的流体压力以检测抛光终点的技术。 传感器位于线性抛光机的流体轴承的前缘，用于在半导体晶片上执行化学机械抛光。 传感器监测流体压力以检测抛光期间流体压力的变化，该变化对应于当抛光从一个材料层转移到下一个材料层时的剪切力的变化。

公开(公告)号：USD418512S

公开(公告)日：2000-01-04

申请号：US101194

申请日：1999-02-26

Applicant: Wei-Li Lin ,  Brian Thornton

Designer： Wei-Li Lin ,  Brian Thornton

公开(公告)号：US08331049B2

公开(公告)日：2012-12-11

申请号：US12796346

申请日：2010-06-08

Applicant: SungChang Lee ,  Brian Thornton ,  Mike Suk ,  SeungMo Kang

Inventor： SungChang Lee ,  Brian Thornton ,  Mike Suk ,  SeungMo Kang

IPC: G11B27/36 ,  G11B21/02

CPC classification number: G11B27/36 ,  G11B5/6029 ,  G11B5/6076 ,  G11B19/048

Abstract: This application discloses a hard disk drive and a control circuit that are configured to determine touchdown by determining the SAGC for a track, removing the repeatable component of the SAGC to create the non-repeatable component and determining an indication of clearance irregularity and/or touch down when the standard deviation of the non-repeatable component spikes. These operations may create a defect map and/or a Flying height On Demand (FOD) control table in or for the hard disk drive as products of operating the hard disk drive.

Abstract translation: 本申请公开了一种硬盘驱动器和控制电路，其被配置为通过确定用于轨道的SAGC来确定触地，除去SAGC的可重复部件以创建不可重复的部件并确定间隙不规则性和/或触摸的指示 当不可重复组件的标准偏差峰值时下降。 这些操作可以在硬盘驱动器中或硬盘驱动器上创建缺陷映射和/或飞行高度随选（FOD）控制表，作为操作硬盘驱动器的产品。

公开(公告)号：US08199435B2

公开(公告)日：2012-06-12

申请号：US12349464

申请日：2009-01-06

Applicant: Walton Fong ,  Brian Thornton

Inventor： Walton Fong ,  Brian Thornton

IPC: G11B15/64

CPC classification number: G11B5/6005 ,  G11B5/6082

Abstract: This application discloses a hard disk drive, a head stack assembly, a head gimbal assembly, each including a slider with a deposited end including at least one means for retaining lubricant that tends to accumulate on the deposited end.

Abstract translation: 本申请公开了一种硬盘驱动器，头部堆叠组件，头部万向架组件，每个头部万向节组件包括具有沉积端的滑块，该滑块具有至少一个用于保持易于积聚在沉积端上的润滑剂的装置。

公开(公告)号：US20100020445A1

公开(公告)日：2010-01-28

申请号：US12180434

申请日：2008-07-25

Applicant: Brian Thornton

Inventor： Brian Thornton

IPC: G11B5/48

CPC classification number: G11B5/5582 ,  G11B5/59627

Abstract: A method for maintaining a servo signal. The method includes monitoring a shock event value. The shock event value is generated by a shock sensor. The shock sensor is operably coupled with a disk drive. The disk drive is configured with an actuator arm having a suspension and slider coupled thereto. The method further includes detecting a variation in the shock event value associated with the slider. The method also includes switching from a conductive link to the slider to another conductive link to another slider, the another slider is coupled with another actuator arm in the disk drive.

Abstract translation: 一种用于维持伺服信号的方法。 该方法包括监视冲击事件值。 冲击事件值由冲击传感器产生。 冲击传感器与磁盘驱动器可操作地耦合。 磁盘驱动器配置有具有与其耦合的悬架和滑块的致动器臂。 该方法还包括检测与滑块相关联的冲击事件值的变化。 该方法还包括从导电连接件切换到滑动件到另一滑块的另一个导电连接件，另一个滑块与磁盘驱动器中的另一个致动臂连接。

公开(公告)号：US20070172161A1

公开(公告)日：2007-07-26

申请号：US11336078

申请日：2006-01-20

Applicant: Ferdinand Hendriks ,  Fu-Ying Huang ,  Brian Thornton

Inventor： Ferdinand Hendriks ,  Fu-Ying Huang ,  Brian Thornton

IPC: F16C32/06

CPC classification number: F16C17/107 ,  F16C33/107

Abstract: A bearing system having variably grooved radial and thrust bearing with reduced groove angle near bearing entry is described. In an embodiment, the bearing system includes a housing. The bearing system also includes a shaft centrally located in the housing. The bearing system additionally includes a rotor portion that is adapted to be rotated about the shaft and contained within the housing. The bearing further includes a variably angled groove disposed on an internal surface of the bearing system. The variably angled groove reduces ingestion of air in the bearing system during operation of the bearing system.

Abstract translation: 描述了一种具有可变凹槽径向和推力轴承的轴承系统，其具有在轴承入口附近减小的沟槽角度。 在一个实施例中，轴承系统包括壳体。 轴承系统还包括位于壳体中心的轴。 所述轴承系统还包括转子部分，所述转子部分适于围绕所述轴线旋转并且容纳在所述壳体内。 轴承还包括设置在轴承系统的内表面上的可变角度的凹槽。 在轴承系统运行期间，可变角度的槽减少了轴承系统中的空气的摄入。