Aligning and focusing an electron beam in an X-ray source
    1.
    发明授权
    Aligning and focusing an electron beam in an X-ray source 有权
    将电子束对准和聚焦在X射线源中

    公开(公告)号:US09380690B2

    公开(公告)日:2016-06-28

    申请号:US13884447

    申请日:2011-12-21

    IPC分类号: H05G1/52 H01J35/14 H01J35/08

    摘要: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.

    摘要翻译: 一种用于间接测量包括对准装置,聚焦装置和偏转装置的电子 - 光学系统中的光束对准程度的技术。 为了进行测量,可以使用简单的传感器,即使是单元件传感器,只要它具有明确的空间范围。 当与可操作以产生X射线靶的X射线源相结合时,进一步地,用于确定和控制电子束在与目标的交点处的宽度的技术。

    ALIGNING AND FOCUSING AN ELECTRON BEAM IN AN X-RAY SOURCE
    2.
    发明申请
    ALIGNING AND FOCUSING AN ELECTRON BEAM IN AN X-RAY SOURCE 有权
    在X射线源中对准和聚焦电子束

    公开(公告)号:US20130301805A1

    公开(公告)日:2013-11-14

    申请号:US13884447

    申请日:2011-12-21

    IPC分类号: H05G1/52

    摘要: A technique for indirectly measuring the degree of alignment of a beam in an electron-optical system including aligning means, focusing means and deflection means. To carry out the measurements, a simple sensor may be used, even a single-element sensor, provided it has a well-defined spatial extent. When practiced in connection with an X-ray source which is operable to produce an X-ray target, further, a technique for determining and controlling a width of an electron-beam at its intersection point with the target.

    摘要翻译: 一种用于间接测量包括对准装置,聚焦装置和偏转装置的电子 - 光学系统中的光束对准程度的技术。 为了进行测量,可以使用简单的传感器,即使是单元件传感器,只要它具有明确的空间范围。 当与可操作以产生X射线靶的X射线源相结合时,进一步地,用于确定和控制电子束在与目标的交点处的宽度的技术。