公开(公告)号：US20080308835A1

公开(公告)日：2008-12-18

申请号：US11761446

申请日：2007-06-12

申请人： Shaoher X. Pan

发明人： Shaoher X. Pan

IPC分类号： H01L33/00 ,  H01L21/00

CPC分类号： H01L33/007 ,  B82Y20/00 ,  H01L33/12 ,  H01S5/34333 ,  H01S2301/173

摘要： A semiconductor device includes a substrate comprising a first surface having a first orientation and a second surface having a second orientation and a plurality of III-V nitride layers on the substrate, wherein the plurality of III-V nitride layers are configured to emit light when an electric current is produced in one or more of the plurality of III-V nitride layers.

摘要翻译： 半导体器件包括：衬底，其包括具有第一取向的第一表面和具有第二取向的第二表面和在衬底上的多个III-V族氮化物层，其中所述多个III-V族氮化物层被配置为当 在多个III-V族氮化物层中的一个或多个中产生电流。

公开(公告)号：US20080272089A1

公开(公告)日：2008-11-06

申请号：US12217529

申请日：2008-07-02

申请人： Michael Grimbergen ,  Shaoher X. Pan

发明人： Michael Grimbergen ,  Shaoher X. Pan

IPC分类号： H01L21/3065

CPC分类号： H01J37/32458 ,  H01J37/32935

摘要： A substrate etching apparatus comprises a chamber having a wall with a window, substrate support pedestal, energy source, and monitoring assembly with signal sensor capable of detecting reflected radiation from the substrate from directly above the substrate after the radiation propagates through the window in the wall. An etching method comprises the steps of: providing a substrate in a chamber, etching a channel or trench in the substrate by coupling energy through the wall of the chamber to energize an etch gas in the chamber, detecting radiation reflected from the substrate from directly above the substrate after the radiation propagates through the wall and evaluating the detected radiation to monitor the depth of etching of the channel or trench being etched on the substrate.

摘要翻译： 基板蚀刻装置包括具有窗口的壁，基板支撑基座，能量源和具有信号传感器的监测组件，该信号传感器能够在辐射传播通过壁中的窗口之后从基板正上方检测来自基板的反射辐射 。 蚀刻方法包括以下步骤：在腔室中提供衬底，通过将能量通过腔室的壁耦合来蚀刻衬底中的沟道或沟槽，以激励腔室中的蚀刻气体，从正上方检测从衬底反射的辐射 辐射之后的衬底传播通过壁并评估所检测的辐射以监测被蚀刻在衬底上的通道或沟槽的蚀刻深度。

公开(公告)号：US20080186414A1

公开(公告)日：2008-08-07

申请号：US11671946

申请日：2007-02-06

申请人： Shaoher X. Pan

发明人： Shaoher X. Pan

IPC分类号： H04N9/31

CPC分类号： H04N9/317

摘要： A hand-held electronic device includes a flat-panel display device, a projector integrated in the hand-held electronic device, a data storage device configured to store data; and a display driver coupled to the flat-panel display device and the projector. The display driver can display the image data on the flat panel display device and to project a display image on a surface using the projector in accordance with the data stored in the data storage device.

摘要翻译： 手持式电子设备包括平板显示设备，集成在手持电子设备中的投影仪，被配置为存储数据的数据存储设备; 以及耦合到平板显示装置和投影仪的显示驱动器。 显示驱动器可以在平板显示装置上显示图像数据，并根据存储在数据存储装置中的数据，使用投影仪将显示图像投影在表面上。

公开(公告)号：US20080100904A1

公开(公告)日：2008-05-01

申请号：US11553914

申请日：2006-10-27

申请人： Shaoher X. Pan

发明人： Shaoher X. Pan

IPC分类号： G02B26/00

CPC分类号： G02B26/0841

摘要： A micro mirror device includes a hinge supported by a substrate and a mirror plate tiltable around the hinge. The hinge can include an alloy selected from the group consisting of a titanium-nickel alloy having a titanium composition between about 30% to 70%, a titanium-aluminum alloy having a titanium composition between about 30% to 70%, an aluminum-copper alloy having a copper composition between about 5% to 20%, and an aluminum titanium nitride having a nitrogen composition in the range of 0 to about 15%.

摘要翻译： 微镜装置包括由基板支撑的铰链和可围绕铰链倾斜的镜板。 铰链可以包括选自由钛组成在约30％至70％之间的钛 - 镍合金，钛组成在约30％至70％之间的钛 - 铝合金，铝 - 铜 铜组成在约5％至20％之间的合金和氮组成在0至约15％范围内的氮化钛。

公开(公告)号：US20080055703A1

公开(公告)日：2008-03-06

申请号：US11427327

申请日：2006-06-28

申请人： Shaoher X. Pan

发明人： Shaoher X. Pan

IPC分类号： G02B26/00

CPC分类号： G02B26/0841 ,  B81B3/0005 ,  B81C1/0096 ,  B81C2201/112

摘要： A method for applying anti-stiction material to a micro device on a substrate includes introducing anti-stiction material on a surface of an encapsulation device or a surface of the substrate and sealing at least a portion of the encapsulation device to the surface of the substrate to form a chamber to encapsulate the micro device and the anti-stiction material. The micro device includes a first component and a second component. The first component is moveable and is configured to contact the second component. The method also includes vaporizing the anti-stiction material and depositing the anti-stiction material on a surface of the first component or a surface of the second component after vaporizing the anti-stiction material to prevent stiction between the first component and the second component.

摘要翻译： 将抗静电材料施加到基板上的微器件的方法包括将抗静电材料引入到封装装置的表面或基板的表面上，并将至少一部分封装装置密封到基板的表面 以形成包封微型装置和抗静电材料的室。 微型装置包括第一部件和第二部件。 第一组件是可移动的并被配置成与第二组件接触。 该方法还包括在蒸发抗静电材料之后蒸发抗静电材料并将抗静电材料沉积在第一组分或第二组分的表面上，以防止第一组分和第二组分之间的粘结。

公开(公告)号：US20080024857A1

公开(公告)日：2008-01-31

申请号：US11461413

申请日：2006-07-31

申请人： Shaoher X. Pan

发明人： Shaoher X. Pan

IPC分类号： G02B26/08

CPC分类号： H04N9/3129 ,  G02B26/123 ,  G02B26/124 ,  G02B26/125 ,  G03B21/008 ,  G03B21/14 ,  G03B21/208 ,  G03B33/12 ,  H04N5/7458 ,  H04N9/3108 ,  H04N9/3111 ,  H04N9/3114

摘要： A display system includes a transparent tapered plate comprising a first face, a second face, and a third face. The first face is substantially smaller than the second face and the third face. The display system also includes a row of tiltable mirror plates each comprising a reflective surface. Each of the mirror plates is configured to tilt to an “on” position to reflect incident light in an “on” direction or to tilt to an “off” position to reflect incident light in an “off” direction. An optical scanning system is configured to control the direction of the light reflected by the mirror plates in the “on” direction. The row of the tiltable mirror plates, optical scanning system and the tapered plate are configured to allow the light reflected by the row of mirror plates in the “on” direction to enter the tapered plate at the first face, be reflected by the second face, and produce a line of image pixels on the third face. The optical scanning system is configured to scan the line of image pixels across the third face to produce a display image.

摘要翻译： 显示系统包括透明锥形板，包括第一面，第二面和第三面。 第一面基本上小于第二面和第三面。 显示系统还包括一排每个包括反射表面的可倾斜镜板。 每个镜板被配置为倾斜到“开”位置以将入射光反射到“开”方向或倾斜到“关”位置以将入射光反射到“关”方向。 光学扫描系统被配置为控制由“反光板”反射的光在“向”方向上的方向。 可倾斜镜板，光学扫描系统和锥形盘的行被配置为允许由“行”方向的一列反射镜反射的光在第一面进入锥形板，被第二面反射 并且在第三面上产生一行图像像素。 光学扫描系统被配置为扫描跨越第三面的图像像素线以产生显示图像。

公开(公告)号：US07245415B2

公开(公告)日：2007-07-17

申请号：US10974461

申请日：2004-10-25

申请人： Shaoher X. Pan

发明人： Shaoher X. Pan

IPC分类号： G02F26/00

CPC分类号： G02B26/0841

摘要： A high contrast spatial light modulator for display and printing is fabricated by coupling a high active reflection area fill-ratio and non-diffractive micro mirror array with a high electrostatic efficiency and low surface adhesion control substrate.

摘要翻译： 通过将高有效反射区域填充率和非衍射微镜阵列与高静电效率和低表面粘附控制基板耦合来制造用于显示和印刷的高对比度空间光调制器。

公开(公告)号：US06827869B2

公开(公告)日：2004-12-07

申请号：US10194167

申请日：2002-07-11

申请人： Dragan Podlesnik ,  Thorsten Lill ,  Jeff Chinn ,  Shaoher X. Pan ,  Anisul Khan ,  Maocheng Li ,  Yiqiong Wang

发明人： Dragan Podlesnik ,  Thorsten Lill ,  Jeff Chinn ,  Shaoher X. Pan ,  Anisul Khan ,  Maocheng Li ,  Yiqiong Wang

IPC分类号： H01L21302

CPC分类号： H01L27/1087 ,  B81B2201/052 ,  B81B2203/0315 ,  B81B2203/033 ,  B81C1/00119 ,  B81C2201/016 ,  H01L21/3065 ,  H01L21/3086

摘要： The present disclosure pertains to our discovery of a particularly efficient method for etching a multi-part cavity in a substrate. The method provides for first etching a shaped opening, depositing a protective layer over at least a portion of the inner surface of the shaped opening, and then etching a shaped cavity directly beneath and in continuous communication with the shaped opening. The protective layer protects the etch profile of the shaped opening during etching of the shaped cavity, so that the shaped opening and the shaped cavity can be etched to have different shapes, if desired. In particular embodiments of the method of the invention, lateral etch barrier layers and/or implanted etch stops are also used to direct the etching process. The method of the invention can be applied to any application where it is necessary or desirable to provide a shaped opening and an underlying shaped cavity having varying shapes. The method is also useful whenever it is necessary to maintain tight control over the dimensions of the shaped opening.

摘要翻译： 本公开涉及我们发现用于蚀刻衬底中的多部分空腔的特别有效的方法。 该方法提供了首先蚀刻成形开口，在成形开口的内表面的至少一部分上沉积保护层，然后直接在成形开口下面蚀刻成形腔，并与成形开口连续连通。 保护层在蚀刻成形腔体期间保护成形开口的蚀刻轮廓，从而如果需要，成形开口和成形腔体可以被蚀刻以具有不同的形状。 在本发明方法的特定实施例中，横向蚀刻阻挡层和/或注入的蚀刻停止点也用于引导蚀刻工艺。 本发明的方法可以应用于需要或期望提供具有不同形状的成形开口和下面的成形腔的任何应用。 只要需要对成形开口的尺寸进行严格控制，该方法也是有用的。

公开(公告)号：US06787054B2

公开(公告)日：2004-09-07

申请号：US10358086

申请日：2003-02-03

申请人： Xikun Wang ,  Scott Williams ,  Shaoher X. Pan

发明人： Xikun Wang ,  Scott Williams ,  Shaoher X. Pan

IPC分类号： C23F100

CPC分类号： H01J37/321 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/31116 ,  H01L21/32137 ,  Y10S134/902 ,  Y10S438/905 ,  Y10S438/906

摘要： A process for etching a substrate and removing etch residue deposited on the surfaces in the etching chamber has two stages. In the first stage, an energized first process gas is provided in the chamber, and in the second stage, an energized second process gas is provided in the chamber. The energized first process gas comprises SF6 and Ar, the volumetric flow ratio of SF6 to other components of the first process gas being from about 5:1 to about 1:10. The energized second process gas comprises CF4 and Ar, the volumetric flow ratio of CF4 to other components of the second process gas being from about 1:0 to about 1:10.

摘要翻译： 用于蚀刻基板并去除沉积在蚀刻室中的表面上的蚀刻残余物的方法具有两个阶段。 在第一阶段中，在腔室中设置通电的第一处理气体，在第二阶段中，在室中设置通电的第二处理气体。 通电的第一工艺气体包括SF 6和Ar，SF 6与第一工艺气体的其它组分的体积流量比为约5:1至约1:10。 通电的第二工艺气体包括CF 4和Ar，CF 4与第二工艺气体的其它组分的体积流量比为约1:0至约1:10。

公开(公告)号：US06527968B1

公开(公告)日：2003-03-04

申请号：US09536057

申请日：2000-03-27

申请人： Xikun Wang ,  Scott Williams ,  Shaoher X. Pan

发明人： Xikun Wang ,  Scott Williams ,  Shaoher X. Pan

IPC分类号： B44C122

CPC分类号： H01J37/321 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/31116 ,  H01L21/32137 ,  Y10S134/902 ,  Y10S438/905 ,  Y10S438/906

摘要： A process for etching a substrate 25 in an etching chamber 105, and simultaneously removing etch residue deposited on the surfaces of the walls 110 and components of the etching chamber 105. In one version, a two-stage method of opening a nitride mask layer on the substrate includes a first stage of providing a highly chemically reactive process gas in the chamber 105 to etch the nitride layer 32 and/or an underlying oxide layer 34, and a second stage of providing a less chemically reactive process gas in the chamber to etch the nitride layer 32 and/or the oxide layer 34 at a slower rate than the first stage. The first and second stage process gases may each comprise a fluorine containing gas, with the fluorine ratio of the first gas higher than the fluorine ratio of the second gas.

摘要翻译： 用于在蚀刻室105中蚀刻基板25并同时去除沉积在壁110的表面上的蚀刻残留物和蚀刻室105的部件的方法。在一种形式中，将氮化物掩模层打开的两阶段方法 衬底包括在室105中提供高度化学反应的工艺气体以蚀刻氮化物层32和/或下面的氧化物层34的第一阶段，以及在室中提供较少化学反应性工艺气体以蚀刻的第二阶段 氮化物层32和/或氧化物层34的速度比第一级慢。 第一和第二阶段工艺气体可以各自包含含氟气体，其中第一气体的氟比率高于第二气体的氟比率。