Optical patterning mask and method of fabricating display device using the same
    57.
    发明授权
    Optical patterning mask and method of fabricating display device using the same 有权
    光学图案掩模和使用其形成显示装置的方法

    公开(公告)号:US09397297B2

    公开(公告)日:2016-07-19

    申请号:US14621937

    申请日:2015-02-13

    发明人: Young Gil Kwon

    摘要: An optical patterning mask, including a base substrate, a reflective layer disposed on the base substrate, the reflective layer including a first opening, a shadow pattern disposed on the base substrate and in the first opening, a thermal insulation layer disposed on the base substrate and covering the reflective layer and the shadow pattern, an absorption layer disposed on the thermal insulation layer, a bank layer disposed on the absorption layer, the bank layer including a second opening overlapping the first opening, a thermal conduction prevention pattern disposed on the absorption layer and overlapping the shadow pattern, and a transfer layer disposed on the absorption layer, the bank layer, and the thermal conduction prevention pattern.

    摘要翻译: 一种光学图案掩模,包括基底基板,设置在基底基板上的反射层,反射层包括第一开口,阴影图案,设置在基底基板上和第一开口中,设置在基底基板上的绝热层 并且覆盖反射层和阴影图案,设置在绝热层上的吸收层,设置在吸收层上的堤层,堤层包括与第一开口重叠的第二开口,布置在吸收层上的导热防止图案 并且重叠阴影图案,以及设置在吸收层,堤层和导热防止图案上的转印层。

    Optical mask
    59.
    发明授权
    Optical mask 有权
    光学面具

    公开(公告)号:US09360748B2

    公开(公告)日:2016-06-07

    申请号:US14716667

    申请日:2015-05-19

    摘要: An optical mask including a transmissive base substrate, a reflective pattern layer, and a photothermal conversion pattern layer. The reflective pattern layer is disposed on the transmissive base substrate. The reflective pattern layer includes reflectors. The photothermal conversion pattern layer is disposed on the transmissive base substrate among the reflectors. The photothermal conversion pattern layer includes first regions with a first light absorptivity and second regions with a second light absorptivity. The second light absorptivity is greater than the first light absorptivity. The first regions are disposed among the second regions.

    摘要翻译: 一种光掩模,包括透射基底,反射图案层和光热转换图案层。 反射图案层设置在透射基底上。 反射图案层包括反射器。 光电转换图案层设置在反射器之间的透射基底基板上。 光热转换图案层包括具有第一光吸收率的第一区域和具有第二光吸收率的第二区域。 第二光吸收率大于第一光吸收率。 第一区域设置在第二区域中。

    OPTICAL PATTERNING MASK AND METHOD FOR FABRICATING DISPLAY DEVICE USING THE SAME
    60.
    发明申请
    OPTICAL PATTERNING MASK AND METHOD FOR FABRICATING DISPLAY DEVICE USING THE SAME 有权
    光学图案掩模和使用其制造显示器件的方法

    公开(公告)号:US20160118630A1

    公开(公告)日:2016-04-28

    申请号:US14680054

    申请日:2015-04-06

    IPC分类号: H01L51/56 H01L51/00

    摘要: The optical patterning mask had a protection layer on a light absorption layer. It prevents the light absorption layer from damaged by the cleaning gas when processing the used optical patterning mask for reuse. The protection layer may be made of the same material as bank layer or of material different from the bank layer. The bank layer defines the boundary of the area to be transferred in the transfer layer. The protection layer of the present invention can maintain longer the transfer efficiency of the optical patterning mask, even when the same mask is used repeatedly after cleaning, since the light absorption layer protected from cleaning process can maintain longer its heat conversion property.

    摘要翻译: 光学图案掩模在光吸收层上具有保护层。 当处理所使用的光学图案掩模以重新使用时,防止光吸收层被清洁气体损坏。 保护层可以由与堤层或不同于堤层的材料相同的材料制成。 银行层定义要在转移层中转移的区域的边界。 即使在清洁后重复使用相同的掩模,本发明的保护层可以保持更长的光学图案掩模的转印效率,因为防止清洁过程的光吸收层可以保持其热转换性能更长。