METHODS FOR PERFORMING MODEL-BASED LITHOGRAPHY GUIDED LAYOUT DESIGN
    52.
    发明申请
    METHODS FOR PERFORMING MODEL-BASED LITHOGRAPHY GUIDED LAYOUT DESIGN 有权
    用于执行基于模型的LITHOGRAPHY指导布局设计的方法

    公开(公告)号:US20140317580A1

    公开(公告)日:2014-10-23

    申请号:US14282754

    申请日:2014-05-20

    CPC classification number: G06F17/5009 G03F1/144 G03F1/36

    Abstract: Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine-tune already-placed SRAFs. The SRAF guidance map can be used directly to place SRAFs in a mask layout. Mask layout data including SRAFs may be generated, wherein the SRAFs are placed according to the SRAF guidance map. The SRAF guidance map can comprise an image in which each pixel value indicates whether the pixel would contribute positively to edge behavior of features in the mask layout if the pixel is included as part of a sub-resolution assist feature.

    Abstract translation: 公开了创建有效的基于模型的子分辨率辅助特征(MB-SRAF)的方法。 创建SRAF指南图,其中每个设计目标边缘位置对于给定的场点投票,放置在该场点上的单像素SRAF是否将改善或降级过程窗口上的空中图像。 在一个实施例中,SRAF引导图用于确定SRAF放置规则和/或微调已经放置的SRAF。 SRAF引导图可以直接用于将SRAF放置在掩码布局中。 可以生成包括SRAF的掩模布局数据,其中根据SRAF引导图放置SRAF。 SRAF引导图可以包括图像,其中每个像素值指示如果像素被包括为子分辨率辅助特征的一部分,则像素是否将对掩模布局中的特征的边缘行为贡献积极。

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