Information recording method and medium having optimum erasing power
    44.
    发明授权
    Information recording method and medium having optimum erasing power 有权
    具有最佳擦除功率的信息记录方法和介质

    公开(公告)号:US07190647B2

    公开(公告)日:2007-03-13

    申请号:US10810568

    申请日:2004-03-29

    CPC classification number: G11B7/0062

    Abstract: An information-recording method and an information-recording medium which make it possible to improve overwrite characteristics in the high speed recording, especially archival overwrite characteristics for overwriting information after retaining the medium in a high temperature environment for a certain period of time, and an information-recording apparatus based on the use of the same are provided. The information-recording method comprises overwriting a random pattern with light beams having a predetermined recording power and a variety of erasing powers; reproducing the random pattern to determine a minimum value Pb1 and a maximum value Pb2 of the erasing power obtained when the pattern, in which a reproduction jitter exceeds a predetermined threshold value, is erased; determining an optimum erasing power Pb from the minimum value Pb1, the maximum value Pb2, and a relational expression represented by Pb=α×Pb1+(1−α)×Pb2; and recording the information with the determined optimum erasing power Pb. The value of α is previously recorded on the information-recording medium. The information-recording apparatus has a Pb-calculating control unit which reads the value of α when the optimum erasing power Pb is determined.

    Abstract translation: 一种信息记录方法和信息记录介质,其可以提高高速记录中的重写特性,特别是在将介质保持在高温环境中一段时间​​后重写信息的档案重写特性,以及 提供了基于其使用的信息记录装置。 信息记录方法包括用具有预定记录功率和各种擦除功率的光束重写随机图案; 再现随机图案以确定当再现抖动超过预定阈值的图案被擦除时获得的擦除功率的最小值Pb 1和最大值Pb 2; 从最小值Pb 1,最大值Pb 2和由Pb = alphaxPb 1 +(1-α)xPb 2表示的关系表达式确定最佳擦除功率Pb; 并以确定的最佳擦除功率Pb记录信息。 α的值先前记录在信息记录介质上。 信息记录装置具有Pb计算控制单元,其在确定最佳擦除功率Pb时读取α的值。

    Information recording apparatus
    45.
    发明授权

    公开(公告)号:US07154711B2

    公开(公告)日:2006-12-26

    申请号:US10872483

    申请日:2004-06-22

    Inventor: Makoto Miyamoto

    CPC classification number: G11B5/54 G11B21/22

    Abstract: In a state wherein an actuator is located at a shunt position, when an apparatus is subjected to an external shock, the actuator tries to swing due to a rotational moment. An inertia arm generates a rotational moment simultaneously with the actuator. Both the rotational moments competes with each other at an engaging point of the inertia arm side with the actuator side to absorb the external shock. Further the actuator tries to excessively swing exceeding the limit of the original swing range during the operation of the apparatus. In order to prevent this, the inertia arm is used.

    Head supporting device and disk drive unit using the same

    公开(公告)号:US07088557B2

    公开(公告)日:2006-08-08

    申请号:US10205003

    申请日:2002-07-25

    CPC classification number: G11B5/4813

    Abstract: A head supporting device with a loading/unloading mechanism and a disk drive unit using the head supporting device. The head supporting device and a voice coil motor (VCM) make up a head actuator of the drive system. The head actuator has i) a support arm rotatable on a bearing, moving in directions along the radius of a recording medium and vertical to the surface of the medium; ii) a magnetically levitating head on a slider facing the medium; and iii) resilient member for applying force to the arm in a direction close to the medium. The VCM has a pair of yokes, a magnet, and a coil. When the head is lead to a head retracting position, the other end of the arm is pulled by the interaction of a magnetic member and the magnet at the resting position and adjacencies. This eases the load on the VCM, contributing to a compact and slim disk drive unit with toughness and rapid data-access.

    Information recording method and optical disk unit
    48.
    发明授权
    Information recording method and optical disk unit 失效
    信息记录方法和光盘单元

    公开(公告)号:US07016282B2

    公开(公告)日:2006-03-21

    申请号:US09793633

    申请日:2001-02-27

    CPC classification number: G11B7/126 G11B7/00454 G11B7/006

    Abstract: Disclosed are an information recording method and an optical disk unit that maintain a good jitter even when a line velocity is variable in a mark edge system. In the case where an erasing power when erasing a record mark at a linear velocity v1 is Pe1(mW), a recording power when forming the record mark at the linear velocity v1 is Pw1(mW), an erasing power when erasing the record mark at a linear velocity v2 faster than v1 is Pe2(mW), and a power when forming the record mark at the linear velocity v2 is Pw2(mW), a relationship of Pw1/Pe1>Pw2/Pe2 is satisfied.

    Abstract translation: 公开了一种信息记录方法和光盘单元,即使在标记边缘系统中的线速度可变时也能保持良好的抖动。 在以线速度v 1擦除记录标记时的擦除功率为Pe1(mW)的情况下,当以线速度v 1形成记录标记时的记录功率为Pw1(mW),擦除时的擦除功率 以比v1快的线速度v 2的记录标记为Pe2(mW),并且当以线速度v 2形成记录标记时的功率为Pw2(mW),满足Pw1 / Pe1> Pw2 / Pe2的关系 。

    Method of cleaning semiconductor substrate, and method of manufacturing semiconductor device and semiconductor substrate processing apparatus for use in the same
    50.
    发明申请
    Method of cleaning semiconductor substrate, and method of manufacturing semiconductor device and semiconductor substrate processing apparatus for use in the same 审中-公开
    半导体衬底的清洗方法,半导体装置的制造方法以及使用该半导体装置的半导体衬底处理装置

    公开(公告)号:US20060046500A1

    公开(公告)日:2006-03-02

    申请号:US11210737

    申请日:2005-08-25

    Inventor: Makoto Miyamoto

    CPC classification number: H01L21/02074

    Abstract: A semiconductor substrate processing apparatus is provided with a cleaning process chamber containing a semiconductor substrate for performing a cleaning process on the semiconductor substrate. Connected to the cleaning process chamber is a cleaning liquid feeding pipe for supplying a cleaning liquid to the semiconductor substrate. A gas dissolving unit is provided in the midpoint of the cleaning liquid feeding pipe for dissolving a prescribed gas in ultrapure water. An inert gas or a reducing gas is dissolved as a prescribed gas in ultrapure water. A control unit is provided having a function of supplying the cleaning liquid with the prescribed gas dissolved therein to the semiconductor substrate subjected to the cleaning process before performing a dry process. Therefore, the surface of the semiconductor substrate is free from stains. Moreover, a metal interconnection does not elude.

    Abstract translation: 半导体衬底处理设备设置有包含用于对半导体衬底进行清洁处理的半导体衬底的清洁处理室。 连接到清洁处理室的是用于向半导体衬底供应清洁液体的清洁液体供给管。 在用于将规定气体溶解在超纯水中的清洗液供给管的中点设置有气体溶解单元。 惰性气体或还原气体作为规定的气体溶解在超纯水中。 提供控制单元,其具有在进行干燥处理之前将经过清洗处理的清洗液供给溶解有规定气体的半导体基板的功能。 因此,半导体衬底的表面没有污点。 而且,金属互连并不排除。

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