公开(公告)号：US20150196879A1

公开(公告)日：2015-07-16

申请号：US14411623

申请日：2013-06-28

Applicant: Helmholtz-Zentrum Dresden-Rossendorf E.V. ,  13 Membrane GmbH

Inventor： Stephan Brinke-Seiferth ,  Andreas Kolitsch ,  Anatoli Rogozin

IPC: B01D67/00 ,  H01M8/02 ,  H01M2/16 ,  B01D71/02

CPC classification number: B01D67/006 ,  B01D67/0053 ,  B01D71/022 ,  B01D2323/00 ,  B01D2323/35 ,  H01M2/1646 ,  H01M8/0289

Abstract: A process for producing a porous metal membrane (pore size 10 nm and 1 um), a metal membrane of this type, the use of the metal membrane and also corresponding filter modules. The Dice is 1-20 microns. The plasma immersion ion implantation process is utilized by bombarding a very thin metal foil with noble gas ions accelerated by means of a first accelerating voltage, in particular from both sides. The ion current is selected so that supersaturation occurs in the metal foil. Pores, in particular under the metal surface, are then formed by bubble segregation after supersaturation. Opening of the pores formed under the metal surface by ion implantation is effected by atomization of the surface by means of bombardment with noble gas ions using a second accelerating voltage which is lower than the first accelerating voltage.

Abstract translation: 一种制造多孔金属膜（孔径10nm和1μm）的方法，这种金属膜，使用金属膜以及相应的过滤器模块。 骰子是1-20微米。 通过用特别是从两侧加速的惰性气体离子轰击非常薄的金属箔来利用等离子体浸入离子注入工艺。 选择离子电流使得在金属箔中发生过饱和。 然后在过饱和后通过气泡分离形成孔，特别是在金属表面下。 通过离子注入在金属表面下形成的孔的打开通过使用低于第一加速电压的第二加速电压借助惰性气体离子轰击来表面的雾化来实现。