Abstract:
Hyperbranched polycarbonates having stabilizing groups, prepared by reaction of (a) at least one compound having at least three alcoholic hydroxyl groups per molecule with (b) at least one reagent of the general formula I (c) and at least one reagent of the general formula X3-(A1)m-X4, where the variables are defined as follows: X1, X2 are identical or different and are selected from among halogen, C1-C10-alkoxy, C6-C10-aryloxy and O—C(═O)-halogen, X3 is a functional group selected from among OH, SH, NH2, NH—C1-C4-alkyl, iso-cyanate, epoxy, COOH, COOR12, C(═O)—O—C(═O), C(═O)—Cl, R12 is C1-C4-alkyl or C6-C10-aryl, A1 is a spacer or a single bond, m is zero or one. X4 is a group selected from among phenol groups, benzophenones, aromatic amines and nitrogen-comprising heterocycles, in each case substituted or unsubstituted.
Abstract:
The polymers are prepared by using the new intermediate product which forms a polymeric precursor, and which is converted into the desired heterocyclic polymer by ring closure.
Abstract:
Thermosettable prepolymers or resins are prepared by reacting (1) a pyrazine compound containing at least two substituent groups which have a hydrogen atom attached to a carbon atom which is attached to the ring such as tetramethylpyrazine, (2) a material containing at least two aromatic aldehyde groups, and (3) at least one of (a) a nitrogen containing aromatic heterocyclic compound containing at least one hydrogen atom attached to a carbon atom attached to the ring and a polymerizable unsaturated group such as 2-methyl-5-vinylpyridine or (b) an aldehyde containing at least one polymerizable unsaturated group such as 4-isopropenyl-1-cyclohexene-1-carboxaldehyde. These prepolymers or resins are curable to thermoset products having good mechanical and thermal properties by heat and pressure or by homopolymerization or copolymerization with N,N'-bis-imides such as 1,1'-(methylenedi-4,1-phenylene)bismaleimide. The prepolymers are suitable for preparing composites.
Abstract:
Thermosettable prepolymers or resins are prepared by reacting (1) a pyrazine compound containing at least two substituent groups which have a hydrogen atom attached to a carbon atom which is attached to the ring such as tetramethylpyrazine, (2) a material containing at least two aromatic aldehyde groups, and (3) at least one of (a) a nitrogen containing aromatic heterocyclic compound containing at least one hydrogen atom attached to a carbon atom attached to the ring and a polymerizable unsaturated group such as 2-methyl-5-vinylpyridine or (b) an aldehyde containing at least one polymerizable unsaturated group such as 4-isopropenyl-1-cyclohexene-1-carboxaldehyde. These prepolymers or resins are curable to thermoset products having good mechanical and thermal properties by heat and pressure or by homopolymerization or copolymerization with N,N'-bis-imides such as 1,1'-(methylenedi-4,1-phenylene)-bismaleimide. The prepolymers are suitable for preparing composites.
Abstract:
Halovinylidene arylene polymers are prepared from the dihydrohalogenation of the polymeric reaction product of an aromatic compound containing nuclearly-bonded hydrogen and either chloral or bromal, in the presence of a strong acidic catalyst.
Abstract:
A tackifier system which includes the reaction product of oxirane bearing materials with alkyl phenol novolacs for elastomers of alpha-olefin polymers which are sulfur curable.
Abstract:
Diazo-resin-containing photoresist compositions and methods of preparing the same are provided for solving the problem that existing diazo-resins cannot be applied in LCD photoresists because the storage periods of the diazo-resins themselves and the printed boards made thereby are both short due to poor thermal stability of the diazo-resins. The diazo-resins of the present invention have excellent thermal stability and exhibit strong resistance to dry etching when being used in negative photoresists, while high resolution can be achieved. Meanwhile, during exposure, portions of the diazo-resins can crosslink with hydrogen bonds on surface of SiO or SiON film forming a barrier layer or passivation layer, such that the adhesion between the photoresists and the film layer is increased, and the photoresists would not peel during development. Thus, the utilization of tackifiers for enhancing the adhesion between a photoresist and surface of SiO or SiON film before masking can be omitted.
Abstract:
Disclosed are terminal-modified difunctional sulfur-containing polymers that are the reaction products of a sulfur-containing diol, an aldehyde or a ketone, and a compound containing a functional group. Compositions comprising the terminal-modified difunctional sulfur-containing polymers useful as sealants are also disclosed.
Abstract:
A silylated polymeric binder, which is soluble or swellable in alkali, bears a plurality of at least one of aliphatic and aromatic hydroxyl groups, at least a portion of which are derivatized by units of the formulae I and II:[(A--B.sub.n).sub.m C]--[(D.sub.o E.sub.p)BC].sub.u (I)and[(D.sub.o E.sub.p)BC].sub.v (II)which are side chains of the polymeric binder, whereinA denotes a silanyl group containing at least 2 silicon atoms in total linked to each other, but not more than 3 silicon atoms linked to each other in an unbranched chain of silicon atoms;B denotes a bridging group;C denotes a functional group which has formed a covalent bond with an aromatic, aliphatic, or cycloaliphatic hydroxyl group of the binder, the group D, or the group E;D denotes a grafted monohydric or polyhydric aliphatic alcohol;E denotes a grafted monohydric or polyhydric aromatic alcohol;n denotes 0 or 1;m denotes 1 or 2; ando, p, u and v each denote 0 or 1.Photosensitive mixtures containing this binder are resistant to plasma etching, stable on storage and have a high thermal stability.