公开(公告)号：US20060262323A1

公开(公告)日：2006-11-23

申请号：US11418990

申请日：2006-05-04

Applicant: Kazuki Yamamoto

Inventor： Kazuki Yamamoto

IPC: G01B11/02 ,  G01B9/02

CPC classification number: G03F7/706

Abstract: A measuring device for measuring a wavefront aberration of an optical system includes a first mask for defining light that enters the optical system, and a second mask having first to fourth openings. The first opening transmits a component of the light passing through the optical system without removing information about the wavefront aberration of the optical system, and the second to fourth openings transmit components of the light passing through the optical system having the information about the wavefront aberration of the optical system removed.

公开(公告)号：US20060061757A1

公开(公告)日：2006-03-23

申请号：US11228116

申请日：2005-09-16

Applicant: Kazuki Yamamoto ,  Akihiro Nakauchi

Inventor： Kazuki Yamamoto ,  Akihiro Nakauchi

IPC: G01B9/00

CPC classification number: G03F7/706

Abstract: A method for obtaining information relating to two-dimensional optical performance of a target optical system includes the steps of calculating a first correction value and/or a second correction value used to synthesize first and second measurement data with each other, the first measurement data representing optical performance of the target optical system in a first direction and providing a correct relative relationship in the first direction, the second measurement data representing optical performance of the target optical system in a second direction different from the first direction and providing a correct relative relationship in the second direction, and synthesizing the first and second measurement data with each other using the first and/or second correction values calculated by the calculating step.

Abstract translation: 一种用于获得与目标光学系统的二维光学性能相关的信息的方法包括以下步骤：计算用于将第一和第二测量数据彼此合成的第一校正值和/或第二校正值，第一测量数据表示 目标光学系统在第一方向上的光学性能并且在第一方向上提供正确的相对关系，第二测量数据表示目标光学系统在与第一方向不同的第二方向上的光学性能并且提供正确的相对关系 使用由计算步骤计算的第一和/或第二校正值来合成第一和第二测量数据。