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公开(公告)号:US20220286541A1
公开(公告)日:2022-09-08
申请号:US17752202
申请日:2022-05-24
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seo LEE , Seungchan LEE , Jaok KOO , Jonghoon WON , Yongsang YUN , Dasom LEE , Yunjeong JI , Hoon HAN
IPC: H04M1/02 , H04M1/72454 , G06F1/16
Abstract: An electronic device is provided. The electronic device includes a foldable housing, a flexible display, at least one camera, at least one sensor and at least one processor, wherein the foldable housing includes a first housing having a first surface facing a first direction and a second surface facing a second direction opposite to the first direction, a first connecting member which is connected to a side surface of the first housing and which can be folded in a first rotating direction and unfolded in a second rotating direction, a second housing which is connected to the first connecting member and has a third surface facing the first direction and a fourth surface facing the second direction, and in which the flexible display is positioned on the third surface, a second connecting member connected to the side surface of the second housing, and a third housing which is connected to the second connecting member and has a fifth surface facing the first direction and a sixth surface facing the second direction.
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公开(公告)号:US20220155861A1
公开(公告)日:2022-05-19
申请号:US17520946
申请日:2021-11-08
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Insik MYUNG , Shinjae JUNG , Inyoung CHOI , Hoon HAN
Abstract: There is disclosed an augmented reality (AR) glasses device including: a camera, a transparent display, a communication circuit, a memory storing images of a plurality of external electronic devices, and a processor. The processor may be configured to control the AR glasses device to: acquire an image including an image of at least one external electronic device, acquire running application information of the at least one external electronic device, identify a first external electronic device corresponding to a gaze from among the at least one external electronic device from the acquired image, determine whether a specified application is running in the first external electronic device based on the running application information, and connect to the first external electronic device using a communication circuit, based on the specified application running.
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公开(公告)号:US20210254224A1
公开(公告)日:2021-08-19
申请号:US17313534
申请日:2021-05-06
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jungah KIM , Mihyun PARK , Jinwoo LEE , Keonyoung KIM , Hyosan LEE , Hoon HAN , Jin Uk LEE , Jung Hun LIM
IPC: C23F1/26 , C23F1/30 , H01L21/311 , H01L21/306
Abstract: A method of etching a metal barrier layer and a metal layer is provided. The method includes forming the metal barrier layer and the metal layer on a substrate, and using an etching composition to etch the metal barrier layer and the metal layer. The etching composition may include an oxidant selected from nitric acid, bromic acid, iodic acid, perchloric acid, perbromic acid, periodic acid, sulfuric acid, methane sulfonic acid, p-toluenesulfonic acid, benzenesulfonic acid, or a combination thereof, a metal etching inhibitor including a compound expressed by Chemical Formula 1, and a metal oxide solubilizer selected from phosphoric acid, phosphate, carboxylic acid having 3 to 20 carbon atoms, or a combination thereof.
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公开(公告)号:US20200087798A1
公开(公告)日:2020-03-19
申请号:US16574372
申请日:2019-09-18
Applicant: SAMSUNG ELECTRONICS CO., LTD. , SOULBRAIN CO., LTD.
Inventor: Jungah KIM , Mihyun PARK , Jinwoo LEE , Keonyoung KIM , Hyosan LEE , Hoon HAN , Jin Uk LEE , Jung Hun LIM
IPC: C23F1/26 , H01L21/306 , H01L21/311 , C23F1/30
Abstract: Disclosed is a method of etching a metal barrier layer and a metal layer. The method includes forming the metal barrier layer and the metal layer on a substrate, and using an etching composition to etch the metal barrier layer and the metal layer. The etching composition may include an oxidant selected from nitric acid, bromic acid, iodic acid, perchloric acid, perbromic acid, periodic acid, sulfuric acid, methane sulfonic acid, p-toluenesulfonic acid, benzenesulfonic acid, or a combination thereof, a metal etching inhibitor including a compound expressed by Chemical Formula 1, and a metal oxide solubilizer selected from phosphoric acid, phosphate, carboxylic acid having 3 to 20 carbon atoms, or a combination thereof.
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