公开(公告)号：US10533245B2

公开(公告)日：2020-01-14

申请号：US15218526

申请日：2016-07-25

Applicant: Samsung Display Co., Ltd.

Inventor： Soonchul Chang ,  Seungyong Song ,  Sungsoon Im ,  Kyuhwan Hwang ,  Minho Moon ,  Youngmin Moon

IPC: C23C14/04 ,  C23C16/04 ,  B05C21/00 ,  H01L51/00 ,  C21D8/02

Abstract: A mask assembly, and an apparatus including the same are provided. The mask assembly includes a mask sheet. The mask sheet includes a pattern portion having openings, and a welding portion connected to the pattern portion. The welding portion has a grain size different from a grain size of the pattern portion.

公开(公告)号：US09695522B2

公开(公告)日：2017-07-04

申请号：US14947714

申请日：2015-11-20

Applicant: Samsung Display Co., Ltd.

Inventor： Sungsoon Im ,  Kyu H. Hwang ,  Jaesik Kim ,  Minho Moon ,  Youngmin Moon ,  Soonchul Chang ,  Taewook Kang

IPC: C25D21/12 ,  B05B15/04 ,  C25D1/10 ,  B05C21/00 ,  H01L51/00

CPC classification number: C25D1/10 ,  B05B12/20 ,  B05C21/005 ,  H01L51/0011

Abstract: A deposition mask including a mask body including a plurality of pattern holes; a plurality of protrusions protruding from the mask body; and a plurality of grooves formed in the mask body. A grain size of the mask body is in arrange of about 10 μm to about 1000 μm, and a difference between a maximum height of the plurality of protrusions and a maximum height of the plurality of grooves is equal to or less than 0.5 μm.

公开(公告)号：US09543520B1

公开(公告)日：2017-01-10

申请号：US15096820

申请日：2016-04-12

Applicant: Samsung Display Co., Ltd.

Inventor： Minho Moon ,  Youngmin Moon ,  Sungsoon Im

IPC: H01L21/44 ,  H01L51/00 ,  H01L51/56 ,  H01L21/027

CPC classification number: H01L21/0273 ,  H01L51/0011

Abstract: A manufacturing method of a mask for deposition including forming a second layer on a side of a first layer, coating a photoresist layer on a side of the second layer, forming a plurality of photoresist patterns which penetrate the photoresist layer according to an exposing and developing process, forming a plurality of pattern grooves in the second layer by etching portions of the second layer, which are exposed through the plurality of photoresist patterns, forming an electro-forming mold by removing the photoresist layer from the second layer, disposing an electrode plate to contact the second layer of the electro-forming mold, performing an electro-forming process of growing a metal layer from the electrode plate in spaces in the corresponding pattern grooves of the second layer of the electro-forming mold, to form a deposition mask, and separating the deposition mask from the electrode plate.

Abstract translation: 一种用于沉积的掩模的制造方法，包括在第一层的侧面上形成第二层，在第二层的一侧涂覆光致抗蚀剂层，根据曝光和显影形成多个光致抗蚀剂图案，其穿透光致抗蚀剂层 处理，通过蚀刻通过多个光致抗蚀剂图案曝光的第二层的部分，在第二层中形成多个图案凹槽，通过从第二层去除光致抗蚀剂层形成电铸模，将电极板 接触电铸成型模具的第二层，进行在电铸模具的第二层的相应图案槽中的空间中从电极板生长金属层的电铸工艺，以形成沉积掩模 ，并将沉积掩模与电极板分离。

公开(公告)号：US20160186100A1

公开(公告)日：2016-06-30

申请号：US14808128

申请日：2015-07-24

Applicant: Samsung Display Co., Ltd.

Inventor： Sungsoon Im ,  Kyuhwan Hwang ,  Inho Kong ,  Changsub Kim ,  Hotae Kim ,  Jaehwan Jin ,  Donguk Hwang

IPC: C11D3/20 ,  C11D3/04 ,  B08B3/08 ,  C11D1/14

CPC classification number: C11D3/2086 ,  C11D3/042 ,  C11D3/046 ,  C11D3/2075 ,  C11D11/0047 ,  H01L21/02082

Abstract: The present disclosure relates to a cleaning composition for removing an oxide including an acid selected from an organic acid, an inorganic acid, and a combination thereof; a salt selected from an organic salt, an inorganic salt, and a combination thereof; a surfactant; and water, and a method of cleaning using the cleaning composition.

Abstract translation: 本公开涉及一种用于除去包含选自有机酸，无机酸及其组合中的酸的氧化物的清洁组合物; 选自有机盐，无机盐及其组合的盐; 表面活性剂; 和水，以及使用清洁组合物进行清洁的方法。