公开(公告)号：US20150198840A1

公开(公告)日：2015-07-16

申请号：US14308104

申请日：2014-06-18

Applicant: Samsung Display Co., Ltd.

Inventor： Yang-Ho JUNG ,  Pil Soon HONG ,  Jun Hong PARK ,  Seung Bo SHIM ,  Jin Ho JU

IPC: G02F1/1333 ,  G02F1/1341 ,  G02F1/1368 ,  G02F1/1339 ,  G02F1/1343

CPC classification number: G02F1/133377 ,  G02F1/1341

Abstract: A liquid crystal display is provided. The liquid crystal display includes: a substrate; a thin film transistor; a pixel electrode; a roof layer; a plurality of microcavities; and a partition wall. The thin film transistor is disposed on the substrate. The pixel electrode is disposed on the thin film transistor. The roof layer faces the pixel electrode. The microcavities are between the pixel electrode and the roof layer, the microcavities include a liquid crystal material. The partition wall is between the microcavities, and the partition wall is perpendicular to the roof layer.

Abstract translation: 提供液晶显示器。 液晶显示器包括：基板; 薄膜晶体管; 像素电极; 屋顶层; 多个微腔; 和隔墙。 薄膜晶体管设置在基板上。 像素电极设置在薄膜晶体管上。 屋顶层面向像素电极。 微腔在像素电极和屋顶层之间，微腔包括液晶材料。 分隔壁在微腔之间，分隔壁垂直于屋顶层。

公开(公告)号：US20140234776A1

公开(公告)日：2014-08-21

申请号：US14161939

申请日：2014-01-23

Applicant: Samsung Display Co., Ltd.

Inventor： Jin Ho JU ,  Seung Bo SHIM ,  Jun Gi KIM ,  Yang-Ho JUNG ,  Hyang-Shik KONG ,  Byung-Uk KIM ,  Jin-Sun KIM ,  Tae-Hoon YEO ,  Hyoc-Min YOUN ,  Sang-Hoon LEE

IPC: G03C1/56 ,  G03F7/20

CPC classification number: G03F7/0233 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0226 ,  G03F7/0751 ,  G03F7/0755 ,  G03F7/322 ,  G03F7/38

Abstract: A photosensitive resin composition includes: an acrylic copolymer comprising a polymerization product of a first monomer comprising at least one selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, and a second monomer comprising an olefin-based unsaturated compound; a photosensitive component comprising at least one 1,2-quinonediazide-5-sulfonic acid ester compound selected from compounds represented by Chemical Formulae 1 to 4; a coupling agent; and a solvent, wherein a total amount of asymmetric compounds in the photosensitive component is greater than or equal to 45 area percent as determined by high performance liquid chromatography: wherein R1 is a hydroxyl group or a methyl group, and NQD is a 1,2-quinonediazide 5-sulfonyl group.

Abstract translation: 感光性树脂组合物包括：包含含有选自不饱和羧酸和不饱和羧酸酐中的至少一种的第一单体的聚合产物和包含烯烃类不饱和化合物的第二单体的丙烯酸共聚物; 包含至少一种选自化学式1至4所示化合物的1,2-醌二叠氮化物-5-磺酸酯化合物的光敏组分; 偶联剂; 和溶剂，其中通过高效液相色谱法测定的感光组分中不对称化合物的总量大于或等于45面积％：其中R1是羟基或甲基，NQD是1,2 - 醌二叠氮化物5-磺酰基。

公开(公告)号：US20140127612A1

公开(公告)日：2014-05-08

申请号：US13856477

申请日：2013-04-04

Applicant: Industry-Academic Cooperation Foundation, Yonsei University ,  SAMSUNG DISPLAY CO., LTD.

Inventor： Min KANG ,  Bong-Yeon KIM ,  Jeong Won KIM ,  Hyang-Shik KONG ,  Jin Ho JU ,  Kyoung Sik KIM ,  Seung Hwa BAEK ,  Jun Hyuk WOO ,  Hyun Joo LEE

IPC: G03F1/38 ,  G03F7/20

CPC classification number: G03F1/38 ,  G03F1/50

Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.

Abstract translation: 用于曝光的光掩模包括：透明基板; 位于所述透明基板上的遮光图案层; 位于所述遮光图案层上并包括电介质材料的第一电介质层; 以及负折射率层，其位于所述第一电介质层上并且包括金属。 用于曝光的光掩模的表面等离子体激元准结合模式与将光照射到光掩模进行曝光的光曝光器的光源的波长范围重叠。