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公开(公告)号：US08426109B2
公开(公告)日：2013-04-23
申请号：US13228135
申请日：2011-09-08
申请人： Hiromi Kanda , Haruki Inabe
发明人： Hiromi Kanda , Haruki Inabe
CPC分类号： G03F7/039 , C07C69/54 , C08F214/18 , C08F220/22 , C08F220/26 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041 , G03F7/322 , H01L21/0274 , Y10S430/106 , Y10S430/114 , Y10S430/146
摘要： A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
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32.发明授权Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin 有权用于疏水抗蚀剂表面的树脂，用于制造树脂的方法和含有树脂的正性抗蚀剂组合物公开(公告)号：US08080363B2
公开(公告)日：2011-12-20
申请号：US12207345
申请日：2008-09-09
申请人： Hiromi Kanda
发明人： Hiromi Kanda
IPC分类号： G03F7/00 , G03F7/0041 , C08G2/04
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/0758 , Y10S430/106 , Y10S430/114 , Y10T428/31794
摘要： A resin to be added to a resist composition and locally distributed on a resist film surface to hydrophobitize the resist film surface includes a residual monomer in an amount of 1 mass % or less to the resin as a whole in terms of solid content.
摘要翻译： 添加到抗蚀剂组合物上并局部分布在抗蚀剂膜表面上以使抗蚀剂膜表面疏水化的树脂包括相对于固体含量的整体上的树脂为1质量％以下的残留单体。
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公开(公告)号：US07842452B2
公开(公告)日：2010-11-30
申请号：US12331136
申请日：2008-12-09
申请人： Shinichi Kanna , Haruki Inabe , Hiromi Kanda
发明人： Shinichi Kanna , Haruki Inabe , Hiromi Kanda
IPC分类号： G03F7/30
CPC分类号： G03F7/0758 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a silicon-containing resin having at least one group selected from the group of consisting (X) an alkali-soluble group, (XI) a group capable of decomposing under action of an alkaline developer and increasing solubility of the resin (C) in an alkaline developer, and (XII) a group capable of decomposing under action of an acid and increasing solubility of the resin (C) in an alkaline developer, and (D) a solvent, the method comprising: (i) a step of applying the positive resist composition to a substrate to form a resist coating, (ii) a step of exposing the resist coating to light via an immersion liquid, (iii) a step of removing the immersion liquid remaining on the resist coating, (iv) a step of heating the resist coating, and (v) a step of developing the resist coating.
摘要翻译： 使用正性抗蚀剂组合物的图案形成方法包括：（A）能够在酸作用下增加其在碱性显影剂中的溶解度的无硅树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）具有选自（X）碱溶性基团中的至少一种的基团的含硅树脂（XI）能够在碱性显影剂的作用下分解的基团和增加树脂的溶解度（C ）和（XII）能够在酸的作用下分解并增加树脂（C）在碱性显影剂中的溶解度的基团，和（D）溶剂，该方法包括：（i）步骤 将正性抗蚀剂组合物施加到基材上以形成抗蚀剂涂层，（ii）通过浸渍液体将抗蚀剂涂层曝光于光的步骤，（iii）去除残留在抗蚀剂涂层上的浸渍液体的步骤，（iv ）加热抗蚀剂涂层的步骤，和（v）显影抗蚀涂层的步骤。
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公开(公告)号：US07790351B2
公开(公告)日：2010-09-07
申请号：US12363303
申请日：2009-01-30
申请人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
发明人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
CPC分类号： G03F7/0758 , G03F7/0392 , G03F7/2041 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/146
摘要： A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用显示在碱性显影剂中的溶解度增加的树脂; （B）当用光化射线或辐射照射时能够产生酸的化合物; （C）具有特定结构的含硅重复单元并且对酸稳定但不溶于碱显影剂的树脂; 和（D）溶剂; 和使用该图案的图案制作方法。
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35.发明授权公开(公告)号：US07785767B2
公开(公告)日：2010-08-31
申请号：US12328725
申请日：2008-12-04
申请人： Hiromi Kanda
发明人： Hiromi Kanda
CPC分类号： G03F7/0397 , G03F7/0395 , Y10S430/106 , Y10S430/114
摘要： A positive resist composition, which comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having a repeating unit represented by formula (C) as defined in the specification; and (D) a solvent, wherein a content of the resin as the component (C) is from 0.1 to 20 mass % based on a solid content of the positive resist composition, and a pattern forming method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）具有单环或多环脂环族烃结构的树脂，其在碱显影剂中的溶解度在酸的作用下增加; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有本说明书中定义的式（C）表示的重复单元的树脂; 和（D）溶剂，其中作为成分（C）的树脂的含量相对于正性抗蚀剂组合物的固体成分为0.1〜20质量％，使用该溶剂的图案形成方法。
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36.发明授权公开(公告)号：US07771912B2
公开(公告)日：2010-08-10
申请号：US11636517
申请日：2006-12-11
申请人： Kei Yamamoto , Shinichi Kanna , Hiromi Kanda
发明人： Kei Yamamoto , Shinichi Kanna , Hiromi Kanda
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/108 , Y10S430/111 , Y10S430/122
摘要： A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (C) a resin having at least one repeating unit selected from fluorine atom-containing repeating units represented by the following formulae (1-1), (1-2) and (1-3), the resin being stable to an acid and insoluble in an alkali developer, and (D) a solvent: wherein R1 represents a hydrogen atom or an alkyl group; R2 represents a fluoroalkyl group; R3 represents a hydrogen atom or a monovalent organic group; R4 to R7 each independently represents a hydrogen atom, a fluorine atom, an alkyl group, a fluoroalkyl group, an alkoxy group or a fluoroalkoxy group, provided that at least one of R4 to R7 represents a fluorine atom, and R4 and R5, or R6 and R7 may combine to form a ring; R8 represents a hydrogen atom, a fluorine atom or a monovalent organic group; Rf represents a fluorine atom or a fluorine atom-containing monovalent organic group; L represents a single bond or a divalent linking group; Q represents an alicyclic structure; and k represents an integer of 0 to 3.
摘要翻译： 正型抗蚀剂组合物包括：（A）在酸性作用下在碱性显影剂中的溶解度增加的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有 选自由下式（1-1），（1-2）和（1-3）表示的含氟原子的重复单元中的至少一种重复单元，该树脂对酸稳定且不溶于碱性显影剂， 和（D）溶剂：其中R1表示氢原子或烷基; R2表示氟代烷基; R3表示氢原子或一价有机基团; R4至R7各自独立地表示氢原子，氟原子，烷基，氟烷基，烷氧基或氟烷氧基，条件是R4至R7中的至少一个表示氟原子，R4和R5，或 R6和R7可以结合形成环; R8表示氢原子，氟原子或一价有机基团; Rf表示氟原子或含氟原子的一价有机基团; L表示单键或二价连接基团; Q表示脂环结构; k表示0〜3的整数。
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公开(公告)号：US07666574B2
公开(公告)日：2010-02-23
申请号：US12058327
申请日：2008-03-28
申请人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
发明人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
CPC分类号： G03F7/0397 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A positive photosensitive composition comprises (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound generating an acid in irradiation with actinic light or radiation; (C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and (D) a solvent, wherein each symbol represents a predetermined group.
摘要翻译： 正型光敏组合物包含（A）具有由式（I）表示的可酸分解重复单元并通过酸作用增加其在碱性显影剂中的溶解度的树脂; （B）在光化或辐射照射下产生酸的化合物; （C）既不含氟也不含硅且具有预定结构的重复单元的树脂; 和（D）溶剂，其中每个符号表示预定的基团。
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38.发明申请公开(公告)号：US20070178405A1
公开(公告)日：2007-08-02
申请号：US11492123
申请日：2006-07-25
申请人： Hiromi Kanda , Shinichi Kanna , Haruki Inabe
发明人： Hiromi Kanda , Shinichi Kanna , Haruki Inabe
IPC分类号： G03C1/00
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/091 , G03F7/16 , G03F7/168 , G03F7/2041 , G03F7/30 , G03F7/322 , G03F7/38 , G03F7/40
摘要： A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。
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39.发明申请公开(公告)号：US20070148595A1
公开(公告)日：2007-06-28
申请号：US11645780
申请日：2006-12-27
申请人： Hiromi Kanda
发明人： Hiromi Kanda
IPC分类号： G03C1/00
CPC分类号： G03F7/0397 , G03F7/0395 , Y10S430/106 , Y10S430/114
摘要： A positive resist composition, which comprises: (A) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure, of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having a repeating unit represented by formula (C) as defined in the specification; and (D) a solvent, wherein a content of the resin as the component (C) is from 0.1 to 20 mass % based on a solid content of the positive resist composition, and a pattern forming method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）具有单环或多环脂环族烃结构的树脂，其在碱显影剂中的溶解度在酸的作用下增加; （B）能够在用光化射线或辐射照射时能够产生酸的化合物; （C）具有本说明书中定义的式（C）表示的重复单元的树脂; 和（D）溶剂，其中作为成分（C）的树脂的含量相对于正性抗蚀剂组合物的固体成分为0.1〜20质量％，使用该溶剂的图案形成方法。
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公开(公告)号：US20070134590A1
公开(公告)日：2007-06-14
申请号：US11636633
申请日：2006-12-11
申请人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
发明人： Toshiaki Fukuhara , Shinichi Kanna , Hiromi Kanda
IPC分类号： G03C1/00
CPC分类号： G03F7/0758 , G03F7/0392 , G03F7/2041 , Y10S430/106 , Y10S430/114 , Y10S430/115 , Y10S430/146
摘要： A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.
摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用显示在碱性显影剂中的溶解度增加的树脂; （B）当用光化射线或辐射照射时能够产生酸的化合物; （C）具有特定结构的含硅重复单元并且对酸稳定但不溶于碱显影剂的树脂; 和（D）溶剂; 和使用该图案的图案制作方法。
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