METHOD FOR FABRICATING ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE

    公开(公告)号:US20180374762A1

    公开(公告)日:2018-12-27

    申请号:US15736972

    申请日:2017-06-14

    Abstract: A method for fabricating an array substrate, an array substrate, and a display device are disclosed. The method includes forming a whole layer of opaque film on a substrate; treating the film to form a transparent region and an opaque region in the film, wherein the opaque region corresponds with a channel region of an active layer; and forming a thin film transistor on the film which has been treated. In the method, prior to forming the thin film transistor, the whole layer of opaque film is formed to comprise the transparent region and the opaque region. When other films are deposited on the whole layer of film, no difference in height occurs, and this further avoids various defects due to difference in height.

    SPUTTERING APPARATUS AND TARGET CHANGING DEVICE THEREOF

    公开(公告)号:US20180209036A1

    公开(公告)日:2018-07-26

    申请号:US15501729

    申请日:2016-07-27

    Abstract: A sputtering apparatus and a target changing device thereof are disclosed. The target changing device includes a stand, a mounting shaft on the stand, a target mounting body sleeved on an outside of the mounting shaft and being ratable around an axis of the mounting shaft, and a first driving mechanism configured to drive the target mounting body to rotate around the axis of the mounting shaft. The target mounting body includes at least two target mounting surfaces configured to mount targets. When the target mounting body rotates around the axis of the mounting shaft, each of the target mounting surfaces may be switched between an operating state orientation and an idle orientation

Patent Agency Ranking