公开(公告)号：US06292265B1

公开(公告)日：2001-09-18

申请号：US09326665

申请日：1999-06-07

Applicant: Moshe Finarov ,  David Scheiner ,  Avi Ravid

Inventor： Moshe Finarov ,  David Scheiner ,  Avi Ravid

IPC: G01B1106

CPC classification number: H01L22/34 ,  B24B37/013 ,  B24B49/02 ,  B24B49/12 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/26

Abstract: A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The article contains a plurality of stacks each formed by a plurality of different layers, thereby defining a pattern in the form of spaced-apart metal regions. The method is capable of locating at least one of residues, erosion and dishing conditions on the article. At least one predetermined site on the article is selected for control. This at least one predetermined site is illuminated, and spectral characteristics of light components reflected from this location are detected. Data representative of the detected light components is analyzed for determining at least one parameter of the article within the at least one illuminated site.

Abstract translation: 提出了一种用于光学控制由应用于具有图案化区域的制品的抛光工具执行的化学机械平面化（CMP）工艺的质量的方法。 该物品包含多个由多个不同层形成的堆叠，从而限定了间隔金属区域形式的图案。 该方法能够定位物品上的残留物，侵蚀和凹陷条件中的至少一种。 选择物品上至少一个预定的位置进行控制。 该至少一个预定位置被照亮，并且检测从该位置反射的光分量的光谱特性。 分析表示检测到的光成分的数据，以确定至少一个照明部位内的物品的至少一个参数。

公开(公告)号：US06281974B1

公开(公告)日：2001-08-28

申请号：US09590635

申请日：2000-06-08

Applicant: David Scheiner ,  Moshe Finarov

Inventor： David Scheiner ,  Moshe Finarov

IPC: G01B1106

CPC classification number: G01B11/0625 ,  G01B11/02 ,  G01J3/42 ,  H01L22/12

Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of an incident radiation. An optical model, based on at lease some of the features of the structure is provided. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is substantially larger than a surface area of the structure defined by the grid cycle, is illuminated by an incident radiation of a preset substantially wide wavelength range. Light component substantially specularly reflected from the measurement area is detected and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.

Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有至少一个周期的网格，该至少一个周期由相对于入射辐射具有不同光学特性的至少两个局部相邻元件形成。 提供了基于结构的一些特征的光学模型。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 基本上大于由栅格周期限定的结构的表面积的测量区域被预设的基本上宽的波长范围的入射辐射照射。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 测量和理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。