Abstract:
A semiconductor manufacturing apparatus according to an embodiment of the present invention comprises: an ultraviolet generating part which is disposed in an ultraviolet generating chamber and generates ultraviolet rays of a target wavelength; a substrate driving part including a chuck which is disposed in a process chamber where a substrate fed therein is treated with ultraviolet rays and supports the fed substrate, and an axis which rotates and moves up and down the chuck; and a window which is disposed between the ultraviolet generating chamber and the process chamber and transmits the generated ultraviolet rays to the process chamber.
Abstract:
A woven wire mesh member and method of manufacture are described in which the intersecting wire strands are bonded together and then etched for increasing the transmission characteristics of such mesh. The bonding of the intersecting portions of the wire strands is accomplished by electroplating and insures a strong mesh structure whose wires remain in a fixed position after such etching. The bonded mesh member is etched by electropolishing to uniformly reduce the diameter of the wires and removes the plating layer from the wires except in the regions of such bonds. This electropolishing increases the electron transmission characteristics of the wire mesh, in one example to a transmission of 85 to 90 percent. Such a mesh member may be used as a grid, a collector or a storage target electrode in an electron beam tube.